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M

M. Niwa

University of Tokyo

30H指数
268论文数
3.1K被引数
收录论文 26
发表时间
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Deposition and integration of aluminum nitride as interlayer dielectric for heat dissipation of 3D-ICs氮化铝作为3D-ICs散热用互层介电层的沉积与集成
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF1.2
err2025-12-01
err0
PREAI
errNinomiya, T.; Takagi, T.; Komatsu, E.; Niwa, M.; Kuroda, T.
err分享
err收藏
Evidence of a reduction reaction of oxidized iron/cobalt by boron atoms diffused toward naturally oxidized surface of CoFeB layer during annealing (vol 106, 142407, 2015)
errAPPLIED PHYSICS LETTERS
IF3.6
err2015-06-16
err0
errOAAI
errSato, Soshi; Honjo, Hiroaki; Ikeda, Shoji; Ohno, Hideo; Endoh, Tetsuo; Niwa, Masaaki
err分享
err收藏
Evidence of a reduction reaction of oxidized iron/cobalt by boron atoms diffused toward naturally oxidized surface of CoFeB layer during annealing
errAPPLIED PHYSICS LETTERS
IF3.6
err2015-04-10
err16
PREAI
errSato, Soshi; Honjo, Hiroaki; Ikeda, Shoji; Ohno, Hideo; Endoh, Tetsuo; Niwa, Masaaki
err分享
err收藏
Charge-dependent oxygen vacancy diffusion in Al2O3-based resistive-random-access-memories
errAPPLIED PHYSICS LETTERS
IF3.6
err2013-08-29
err49
PREAI
errYang, Moon Young; Kamiya, Katsumasa; Magyari-Koepe, Blanka; Niwa, Masaaki; Nishi, Yoshio; Shiraishi, Kenji
err分享
err收藏
Generalized mechanism of the resistance switching in binary-oxide-based resistive random-access memories
errPHYSICAL REVIEW B
IF3.7
err2013-04-08
err57
PREAI
errKamiya, Katsumasa; Yang, Moon Young; Nagata, Takahiro; Park, Seong-Geon; Magyari-Koepe, Blanka; Chikyow, Toyohiro; Yamada, Keisaku; Niwa, Masaaki; Nishi, Yoshio; Shiraishi, Kenji
err分享
err收藏
ON-OFF switching mechanism of resistive-random-access-memories based on the formation and disruption of oxygen vacancy conducting channels
errAPPLIED PHYSICS LETTERS
IF3.6
err2012-02-13
err99
PREAI
errKamiya, Katsumasa; Yang, Moon Young; Park, Seong-Geon; Magyari-Koepe, Blanka; Nishi, Yoshio; Niwa, Masaaki; Shiraishi, Kenji
err分享
err收藏
Annealing effects of in-depth profile and band discontinuity in TiN/LaO/HfSiO/SiO2/Si gate stack structure studied by angle-resolved photoemission spectroscopy from backside
errAPPLIED PHYSICS LETTERS
IF3.6
err2010-01-29
err12
PREAI
errToyoda, S.; Kamada, H.; Tanimura, T.; Kumigashira, H.; Oshima, M.; Ohtsuka, T.; Hata, Y.; Niwa, M.
err分享
err收藏
Acidity and catalytic activity of mesoporous ZSM-5 in comparison with zeolite ZSM-5, Al-MCM-41 and silica-alumina
errCATALYSIS TODAY
IF5.3
err2008-03-01
err110
PREAI
errSuzuki, K.; Aoyagi, Y.; Katada, N.; Choi, M.; Ryoo, R.; Niwa, M.
err分享
err收藏
Activity and acidity of Nb2O5-MoO3 and Nb2O5-WO3 in the Friedel-Crafts alkylationNb2O5-MoO3和Nb2O5-WO3在friedel-crafts烷基化反应中的活性和酸度
errCATALYSIS TODAY
IF5.3
err2006-12-15
err63
PREAI
errYamashita, Katsuhiko; Hirano, Miho; Okumura, Kazu; Niwa, Miki
err分享
err收藏
A theoretical study on Bronsted acidity of WO3 clusters supported on metal oxide supports by paired interacting orbitals (PIO) analysis
errCATALYSIS TODAY
IF5.3
err2006-02-01
err4
PREAI
errShiga, A; Katada, N; Niwa, M
err分享
err收藏
Catalytic performance and elution of Pd in the Heck reaction over zeolite-supported Pd cluster catalyst
errJOURNAL OF CATALYSIS
IF6.5
err2005-04-01
err93
PREAI
errOkumura, K; Nota, K; Yoshida, K; Niwa, M
err分享
err收藏
Chemical reaction and metallic cluster formation by annealing-temperature control in ZrO2 gate dielectrics on Si
errAPPLIED PHYSICS LETTERS
IF3.6
err2004-12-13
err30
PREAI
errOkabayashi, J; Toyoda, S; Kumigashira, H; Oshima, M; Usuda, K; Niwa, M; Liu, GL
err分享
err收藏
Application of neural network to estimation of catalyst deactivation in methanol conversion
errCATALYSIS TODAY
IF5.3
err2004-10-01
err23
PREAI
errKito, S; Satsuma, A; Ishikura, T; Niwa, M; Murakami, Y; Hattori, I
err分享
err收藏
Synchrotron-radiation deep level transient spectroscopy for defect characterization of semiconductors
errAPPLIED PHYSICS LETTERS
IF3.6
err2004-07-19
err8
PREAI
errFujioka, H; Sekiya, T; Kuzuoka, Y; Oshima, M; Usuda, H; Hirashita, N; Niwa, M
err分享
err收藏
Effects of interlayer and annealing on chemical states of HfO2 gate insulators studied by photoemission spectroscopy
errAPPLIED PHYSICS LETTERS
IF3.6
err2004-03-29
err54
PREAI
errToyoda, S; Okabayashi, J; Kumigashira, H; Oshima, M; Ono, K; Niwa, M; Usuda, K; Liu, GL
err分享
err收藏
Effect of nitrogen doping into SiO2 studied by photoemission spectroscopy
errAPPLIED PHYSICS LETTERS
IF3.6
err2003-12-29
err18
PREAI
errToyoda, S; Okabayashi, J; Kumigashira, H; Oshima, M; Ono, K; Niwa, M; Usuda, K; Hirashita, N
err分享
err收藏
Chemistry and band offsets of HfO2 thin films for gate insulators
errAPPLIED PHYSICS LETTERS
IF3.6
err2003-09-15
err71
PREAI
errOshima, M; Toyoda, S; Okumura, T; Okabayashi, J; Kumigashira, H; Ono, K; Niwa, M; Usuda, K; Hirashita, N
err分享
err收藏
Electrical and physical properties of HfO2 films prepared by remote plasma oxidation of Hf metal
errAPPLIED PHYSICS LETTERS
IF3.6
err2003-09-15
err70
PREAI
errYamamoto, K; Hayashi, S; Niwa, M; Asai, M; Horii, S; Miya, H
err分享
err收藏
Comparison of thermal and plasma oxidations for HfO2/Si interface
errAPPLIED SURFACE SCIENCE
IF6.9
err2003-06-01
err15
PREAI
errHayashi, S; Yamamoto, K; Harada, Y; Mitsuhashi, R; Eriguchi, K; Kubota, M; Niwa, M
err分享
err收藏
Interfacial chemistry and structures of ultrathin Si oxynitride films超薄Si氮氧化物薄膜的界面化学和结构
errAPPLIED SURFACE SCIENCE
IF6.9
err2003-06-01
err17
PREAI
errOshima, M; Kimura, K; Ono, K; Horiba, K; Nakamura, K; Kumigashira, H; Oh, JH; Niwa, M; Usuda, K; Hirashita, N
err分享
err收藏

研究方向

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R
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K
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H 指数: 98 · 论文数: 1.2K
A
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H 指数: 65 · 论文数: 349
Y
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H 指数: 61 · 论文数: 427
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