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K

Koji Eriguchi

kyoto university

27H指数
280论文数
2.6K被引数
收录论文 20
发表时间
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Process design for ultra-low Si damage by suppressing diffusive point defects通过抑制扩散型点缺陷实现超低Si损伤的工艺设计
errJapanese Journal of Applied Physics
IF1.8
err2026-04-30
err0
PREAI
errKuboi, Nobuyuki; Saga, Koichiro; Miyoshi, Yasufumi; Hamano, Takashi; Kobayashi, Shoji; Hagimoto, Yoshiya; Eriguchi, Koji
err分享
err收藏
Harmonic spectroscopy based on nonlinear circuit analysis for simultaneous measurement of low-temperature plasma and material-surface parameters
errPHYSICS OF PLASMAS
IF2.2
err2025-11-01
err0
PREAI
errMorozumi, Junki; Eriguchi, Koji; Urabe, Keiichiro
err分享
err收藏
Experimental analysis and modeling of sp2-and sp3-bonded phase formation during boron nitride film deposition by a reactive plasma-assisted coating method采用反应等离子辅助涂层方法在氮化硼薄膜沉积过程中sp2和sp3键合相形成过程的实验分析与建模
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2025-05-30
err0
PREAI
errAsamoto, Yuya; Okada, Akira; Noma, Masao; Yamashita, Michiru; Hasegawa, Shigehiko; Urabe, Keiichiro; Eriguchi, Koji
err分享
err收藏
Characterization of time-dependent dielectric degradation and breakdown in bulk hexagonal BN/Si structures时间依赖性体六方BN/Si结构介电退化与击穿的表征
errJOURNAL OF APPLIED PHYSICS
IF2.5
err2025-03-10
err1
errOAAI
errAsamoto, Yuya; Hattori, Tatsuya; Noma, Masao; Yamashita, Michiru; Hasegawa, Shigehiko; Urabe, Keiichiro; Eriguchi, Koji
err分享
err收藏
Evaluation of plasma process-induced mechanical property change in SiN films using a cyclic nanoindentation technique
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2024-08-29
err0
PREAI
errGoya, Takahiro; Urabe, Keiichiro; Eriguchi, Koji
err分享
err收藏
Investigation of small-fraction molecular impurities in high-pressure helium plasmas using optical plasma diagnostic methods
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-02-09
err0
PREAI
errUrabe, Keiichiro; Toyoda, Minami; Matsuoka, Yoshinori; Eriguchi, Koji
err分享
err收藏
Spectroscopic ellipsometry characterization of boron nitride films synthesized by a reactive plasma-assisted coating method
errAPPLIED PHYSICS LETTERS
IF3.6
err2022-01-20
err5
PREAI
errHamano, Takashi; Matsuda, Takayuki; Asamoto, Yuya; Noma, Masao; Hasegawa, Shigehiko; Yamashita, Michiru; Urabe, Keiichiro; Eriguchi, Koji
err分享
err收藏
Characterization of surface modification mechanisms for boron nitride films under plasma exposure
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2019-11-01
err8
PREAI
errHiguchi, Tomoya; Noma, Masao; Yamashita, Michiru; Urabe, Keiichiro; Hasegawa, Shigehiko; Eriguchi, Koji
err分享
err收藏
Investigation of spatial and energy profiles of plasma process-induced latent defects in Si substrate using capacitance-voltage characteristics使用电容-电压特性研究等离子体过程中Si衬底中潜在缺陷的空间和能量分布
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2019-07-25
err6
PREAI
errHamano, Takashi; Urabe, Keiichiro; Eriguchi, Koji
err分享
err收藏
Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation (vol 50, 414001, 2017)
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2017-10-26
err1
PREAI
errOno, Kouichi; Nakazaki, Nobuya; Tsuda, Hirotaka; Takao, Yoshinori; Eriguchi, Koji
err分享
err收藏
Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2017-09-15
err20
PREAI
errOno, Kouichi; Nakazaki, Nobuya; Tsuda, Hirotaka; Takao, Yoshinori; Eriguchi, Koji
err分享
err收藏
Modeling of defect generation during plasma etching and its impact on electronic device performance-plasma-induced damage
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2017-07-20
err39
PREAI
errEriguchi, Koji
err分享
err收藏
Electrical characterization of carrier trapping behavior of defects created by plasma exposures
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2017-06-07
err8
errOAAI
errEriguchi, Koji; Okada, Yukimasa
err分享
err收藏
Surface smoothing during plasma etching of Si in Cl2
errAPPLIED PHYSICS LETTERS
IF3.6
err2016-11-14
err7
errOAAI
errNakazaki, Nobuya; Matsumoto, Haruka; Tsuda, Hirotaka; Takao, Yoshinori; Eriguchi, Koji; Ono, Kouichi
err分享
err收藏
Three-dimensional particle-in-cell simulation of a miniature plasma source for a microwave discharge ion thruster微波放电离子推力器微型等离子体源的三维粒子模拟
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2014-12-04
err45
errOAAI
errTakao, Yoshinori; Koizumi, Hiroyuki; Komurasaki, Kimiya; Eriguchi, Koji; Ono, Kouichi
err分享
err收藏
Plasma chemical behaviour of reactants and reaction products during inductively coupled CF4 plasma etching of SiO2
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2009-09-18
err42
PREAI
errFukumoto, Hiroshi; Fujikake, Isao; Takao, Yoshinori; Eriguchi, Koji; Ono, Kouichi
err分享
err收藏
Field and polarity dependence of time-to-resistance increase in Fe-O films studied by constant voltage stress method
errAPPLIED PHYSICS LETTERS
IF3.6
err2009-01-08
err5
errOAAI
errEriguchi, Koji; Wei, Zhiqiang; Takagi, Takeshi; Ohta, Hiroaki; Ono, Kouichi
err分享
err收藏
Microwave-excited microplasma thruster: a numerical and experimental study of the plasma generation and micronozzle flow
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2008-09-15
err19
PREAI
errTakahashi, Takeshi; Takao, Yoshinori; Eriguchi, Koji; Ono, Kouichi
err分享
err收藏
Quantitative and comparative characterizations of plasma process-induced damage in advanced metal-oxide-semiconductor devices
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2008-01-04
err104
PREAI
errEriguchi, Koji; Ono, Kouichi
err分享
err收藏
Comparison of thermal and plasma oxidations for HfO2/Si interface
errAPPLIED SURFACE SCIENCE
IF6.9
err2003-06-01
err15
PREAI
errHayashi, S; Yamamoto, K; Harada, Y; Mitsuhashi, R; Eriguchi, K; Kubota, M; Niwa, M
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
K
Kazuhiko Yamamoto
H 指数: 98 · 论文数: 1.2K
Y
Yoshihisa Harada
H 指数: 47 · 论文数: 533
T
Takeshi Takahashi
H 指数: 38 · 论文数: 650
K
Kimiya Komurasaki
H 指数: 32 · 论文数: 557
M
M. Niwa
H 指数: 30 · 论文数: 268
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