Demetre J. Economou - Publications, H-index & Citations

Numerical simulation of an atmospheric pressure plasma jet with coaxial shielding gas

IF3.2

2021-07-22

PREAI

Nguyen, Tam; Lin, Peng; Economou, Demetre J.; Donnelly, Vincent M.

A two-dimensional model of chemical vapor infiltration with radio frequency heating

IF3.2

2020-11-30

PREAI

Lin, Peng; Zhang, Jiao; Nguyen, Tam; Donnelly, Vincent M.; Economou, Demetre J.

Direct simulation Monte Carlo of inductively coupled plasma and comparison with experiments

IF3.3

2019-12-06

PREAI

Midha, V; Economou, DJ

Bifurcation analysis of thermal runaway in microwave heating of ceramics

IF3.3

2019-12-06

PREAI

Johannes, J; Bartel, T; Hebner, GA; Woodworth, J; Economou, DJ

A two-dimensional model of chemical vapor infiltration with radio-frequency heating - II. Strategies to achieve complete densification

IF3.3

2019-12-06

PREAI

Gupta, N; Midha, V; Balakotaiah, V; Economou, DJ

Nearly monoenergetic positive ion beam with self-neutralized space charge extracted from a pulsed plasma 从脉冲等离子体中提取的具有自中和空间电荷的近单能正离子束

IF3.3

2019-12-06

PREAI

Midha, V; Economou, DJ

Gas flow rate dependence of the discharge characteristics of a helium atmospheric pressure plasma jet interacting with a substrate

IF3.2

2019-07-04

OAAI

Chen, Ya-Ming; Sawadichai, Ryan; Tian, Siyuan; Donnelly, Vincent M.; Ruchhoeft, Paul; Economou, Demetre J.

Atomic layer etching of silicon dioxide using alternating C4F8 and energetic Ar+ plasma beams 使用交替的C4F8和高能Ar等离子体束对二氧化硅进行原子层蚀刻

IF3.2

2017-09-21

PREAI

Yan, Wen; Economou, Demetre J.

Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry 通过定制的电压波形维持的电容耦合氢等离子体: 激发动力学和离子通量不对称性

IF3.2

2017-05-16

PREAI

Kaler, Sanbir S.; Lou, Qiaowei; Donnelly, Vincent M.; Economou, Demetre J.

Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4 气体性质对电容等离子体中电斜率不对称效应动力学的影响: Ar，H2和CF4的比较

IF3.3

2016-07-08

OAAI

Bruneau, B.; Diomede, P.; Economou, D. J.; Longo, S.; Gans, T.; O'Connell, D.; Greb, A.; Johnson, E.; Booth, J-P

Ignition delay of a pulsed inductively coupled plasma (ICP) in tandem with an auxiliary ICP 与辅助ICP串联的脉冲感应耦合等离子体 (ICP) 的点火延迟

IF3.3

2015-12-01

OAAI

Bruneau, B.; Lafleur, T.; Gans, T.; O'Connell, D.; Greb, A.; Korolov, I.; Derzsi, A.; Donko, Z.; Brandt, S.; Schuengel, E.; Schulze, J.; Diomede, P.; Economou, D. J.; Longo, S.; Johnson, E.; Booth, J-P

Sub-10nm nanopantography

APPLIED PHYSICS LETTERS

IF3.6

2015-11-13

PREAI

Tian, Siyuan; Donnelly, Vincent M.; Ruchhoeft, Paul; Economou, Demetre J.

Radio-frequency capacitively coupled plasmas in hydrogen excited by tailored voltage waveforms: comparison of simulations with experiments 由定制电压波形激发的氢中的射频电容耦合等离子体: 模拟与实验的比较

IF3.2

2015-11-03

PREAI

Liu, Lei; Sridhar, Shyam; Donnelly, Vincent M.; Economou, Demetre J.

Pulsed plasma etching for semiconductor manufacturing

IF3.3

2014-11-11

PREAI

Diomede, P.; Economou, D. J.; Lafleur, T.; Booth, J-P; Longo, S.

Measurement of absolute CO number densities in CH3F/O2 plasmas by optical emission self-actinometry

IF3.2

2014-07-01

168

PREAI

Economou, Demetre J.

Particle-in-cell simulation of electron and ion energy distributions in dc/rf hybrid capacitively-coupled plasmas

IF3.2

2014-02-07

PREAI

Karakas, Erdinc; Kaler, Sanbir; Lou, Qiaowei; Donnelly, Vincent M.; Economou, Demetre J.

AICHE JOURNAL

IF4

2013-03-01

OAAI

Diomede, Paola; Kim, Doosik; Economou, Demetre J.

Abrupt transitions in species number densities and plasma parameters in a CH3F/O2 inductively coupled plasma

APPLIED PHYSICS LETTERS

IF3.6

2013-01-24

PREAI

Karakas, Erdinc; Donnelly, Vincent M.; Economou, Demetre J.

Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

Hybrid simulation of a dc-enhanced radio-frequency capacitive discharge in hydrogen

IF3.3

2012-11-08

OAAI

Logue, Michael D.; Shin, Hyungjoo; Zhu, Weiye; Xu, Lin; Donnelly, Vincent M.; Economou, Demetre J.; Kushner, Mark J.