Lawrence Overzet - Publications, H-index & Citations

Lawrence Overzet

The University of Texas at Dallas

25H指数

224论文数

2.3K被引数

收录论文 15

发表时间

Low thermal budget dopant activation in shallow junctions of implanted Si via Tunable plasma enhanced annealing 通过可调谐等离子体增强退火实现植入Si浅结区低热预算掺杂激活

Applied Surface Science

IF6.9

2026-08-23

PREAI

Zhihao Ma; Mahsa Shekarnoush; Yafen Tian; Yuanning Chen; Malcolm Bevan; Harvey Stiegler; Lawrence J. Overzet

Quantification of hemolysis rates from pulsed field ablation

EUROPEAN HEART JOURNAL

IF35.6

2024-10-28

PREAI

Montoya, M. Mercado; Bustamante, T. Gomez; Jessen, M.; Kulstad, E.; Mickelsen, S.; Overzet, L.

Direct current microhollow cathode discharges on silicon devices operating in argon and helium

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2018-02-06

PREAI

Michaud, R.; Felix, V.; Stolz, A.; Aubry, O.; Lefaucheux, P.; Dzikowski, S.; Schulz-von der Gathen, V.; Overzet, L. J.; Dussart, R.

Factors affecting the 13.56-MHz radio-frequency-mediated heating of gold nanoparticles

APPLIED SPECTROSCOPY REVIEWS

IF5.4

2017-04-04

PREAI

Pantano, Paul; Harrison, Cheri D.; Poulose, John; Urrabazo, David, Jr.; Norman, Trevor Q.; Braun, Elizabeth I.; Draper, Rockford K.; Overzet, Lawrence J.

Origin of microplasma instabilities during DC operation of silicon based microhollow cathode devices 硅基微空心阴极器件直流运行过程中微等离子体不稳定性的起源

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2016-03-04

PREAI

Felix, Valentin; Lefaucheux, Philippe; Aubry, Olivier; Golda, Judith; Schulz-von der Gathen, Volker; Overzet, Lawrence J.; Dussart, Remi

Ion induced electron emission from chemically cleaned Si and Ge

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2015-09-11

PREAI

Urrabazo, David; Veyan, Jean-Francois; Goeckner, Matthew J.; Overzet, Lawrence J.

The effects of the Fermi level on ion induced electron emission from chemically and sputter cleaned semiconductors

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2015-08-04

PREAI

Urrabazo, David; Overzet, Lawrence J.

Transparent film heaters using multi-walled carbon nanotube sheets

SENSORS AND ACTUATORS A-PHYSICAL

IF4.9

2013-09-01

141

PREAI

Jung, Daewoong; Kim, Donghyun; Lee, Kyung H.; Overzet, Lawrence J.; Lee, Gil S.

Study of dc micro-discharge arrays made in silicon using CMOS compatible technology

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2012-06-28

PREAI

Kulsreshath, M. K.; Schwaederle, L.; Overzet, L. J.; Lefaucheux, P.; Ladroue, J.; Tillocher, T.; Aubry, O.; Woytasik, M.; Schelcher, G.; Dussart, R.

Breakdown study of dc silicon micro-discharge devices

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2012-01-30

OAAI

Schwaederle, L.; Kulsreshath, M. K.; Overzet, L. J.; Lefaucheux, P.; Tillocher, T.; Dussart, R.

Synthesis and Electrochemical Properties of Spin-Capable Carbon Nanotube Sheet/MnOx Composites for High-Performance Energy Storage Devices 可自旋碳纳米管/MnOx复合材料的制备及其在高性能储能器件中的电化学性能

NANO LETTERS

IF9.1

2011-06-10

261

PREAI

Kim, Jae-Hak; Lee, Kyung H.; Overzet, Lawrence J.; Lee, Gil S.

Mask undercut in deep silicon etch

APPLIED PHYSICS LETTERS

IF3.6

2011-04-19

PREAI

Saraf, I.; Goeckner, M.; Goodlin, Brian; Kirmse, Karen; Overzet, L.

Transient effects caused by pulsed gas and liquid injections into low pressure plasmas

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2010-05-21

PREAI

Ogawa, D.; Chung, C. W.; Goeckner, M.; Overzet, L.

Two cryogenic processes involving SF6, O2, and SiF4 for silicon deep etching

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2008-01-01

PREAI

Tillocher, T.; Dussart, R.; Overzet, L. J.; Mellhaoui, X.; Lefaucheux, P.; Boufnichel, M.; Ranson, P.

Surface kinetics with low ion energy bombardment in fluorocarbon plasmas

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2007-10-15

PREAI

Nelson, C. T.; Sant, S. P.; Overzet, L. J.; Goeckner, M. J.

研究方向