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Vincent M. Donnelly

university of houston system

56H指数
273论文数
9.8K被引数
收录论文 38
发表时间
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A transient site balance model for atomic layer etching
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-07-11
err1
errOAAI
errVella, Joseph R.; Hao, Qinzhen; Elgarhy, Mahmoud A., I; Donnelly, Vincent M.; Graves, David B.
err分享
err收藏
Decarbonization of the chemical industry through electrification: Barriers and opportunities通过电气化实现化学工业的脱碳: 障碍和机遇
errJOULE
IF35.4
err2023-01-01
err109
errOAAI
errMallapragada, Dharik S.; Dvorkin, Yury; Modestion, Miguel A.; V. Esposito, Daniel; Smith, Wilson A.; Hodge, Bri-Mathia; Harold, Michael P.; Donnelly, Vincent M.; Nuz, Alic; Bloomquist, Casey; Baker, Kyri; Grabow, Lars C.; Yan, Yushan; Rajput, Nav Nidhi; Hartman, Ryan L.; Biddinger, Elizabeth J.; Aydil, Eray S.; Taylor, Andre D.
err分享
err收藏
Optical emission self-actinometry for measuring absolute number densities of air species diffusing into a helium atmospheric pressure plasma jet
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2021-07-22
err5
PREAI
errNguyen, Tam; Lin, Peng; Economou, Demetre J.; Donnelly, Vincent M.
err分享
err收藏
Numerical simulation of an atmospheric pressure plasma jet with coaxial shielding gas
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2020-11-30
err24
PREAI
errLin, Peng; Zhang, Jiao; Nguyen, Tam; Donnelly, Vincent M.; Economou, Demetre J.
err分享
err收藏
Cleaning of CHF3 plasma-etched SiO2/SiN/Cu via structures with dilute hydrofluoric acid solutions
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err34
PREAI
errUeno, K; Donnelly, VM; Kikkawa, T
err分享
err收藏
Nearly monoenergetic positive ion beam with self-neutralized space charge extracted from a pulsed plasma从脉冲等离子体中提取的具有自中和空间电荷的近单能正离子束
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2019-07-04
err9
errOAAI
errChen, Ya-Ming; Sawadichai, Ryan; Tian, Siyuan; Donnelly, Vincent M.; Ruchhoeft, Paul; Economou, Demetre J.
err分享
err收藏
Complex transients in power modulated inductively-coupled chlorine plasmas功率调制电感耦合氯等离子体中的复杂瞬态
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2019-02-25
err13
PREAI
errList, Tyler; Ma, Tianyu; Arora, Priyanka; Donnelly, Vincent M.; Shannon, Steven
err分享
err收藏
Atomic layer etching of silicon dioxide using alternating C4F8 and energetic Ar+ plasma beams使用交替的C4F8和高能Ar等离子体束对二氧化硅进行原子层蚀刻
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2017-05-16
err43
PREAI
errKaler, Sanbir S.; Lou, Qiaowei; Donnelly, Vincent M.; Economou, Demetre J.
err分享
err收藏
Sub-10nm nanopantography
errAPPLIED PHYSICS LETTERS
IF3.6
err2015-11-13
err6
PREAI
errTian, Siyuan; Donnelly, Vincent M.; Ruchhoeft, Paul; Economou, Demetre J.
err分享
err收藏
Ignition delay of a pulsed inductively coupled plasma (ICP) in tandem with an auxiliary ICP与辅助ICP串联的脉冲感应耦合等离子体 (ICP) 的点火延迟
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2015-11-03
err12
PREAI
errLiu, Lei; Sridhar, Shyam; Donnelly, Vincent M.; Economou, Demetre J.
err分享
err收藏
Measurement of absolute CO number densities in CH3F/O2 plasmas by optical emission self-actinometry
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2014-02-07
err4
PREAI
errKarakas, Erdinc; Kaler, Sanbir; Lou, Qiaowei; Donnelly, Vincent M.; Economou, Demetre J.
err分享
err收藏
Abrupt transitions in species number densities and plasma parameters in a CH3F/O2 inductively coupled plasma
errAPPLIED PHYSICS LETTERS
IF3.6
err2013-01-24
err12
PREAI
errKarakas, Erdinc; Donnelly, Vincent M.; Economou, Demetre J.
err分享
err收藏
Ion energy distributions in inductively coupled plasmas having a biased boundary electrode
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2012-11-08
err26
errOAAI
errLogue, Michael D.; Shin, Hyungjoo; Zhu, Weiye; Xu, Lin; Donnelly, Vincent M.; Economou, Demetre J.; Kushner, Mark J.
err分享
err收藏
Control of ion energy distributions using a pulsed plasma with synchronous bias on a boundary electrode
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2011-08-10
err79
PREAI
errShin, Hyungjoo; Zhu, Weiye; Xu, Lin; Donnelly, Vincent M.; Economou, Demetre J.
err分享
err收藏
Time- and space-resolved measurements of Ar(1s5) metastable density in a microplasma using diode laser absorption spectroscopy
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2011-03-22
err25
PREAI
errBelostotskiy, Sergey G.; Ouk, Tola; Donnelly, Vincent M.; Economou, Demetre J.; Sadeghi, Nader
err分享
err收藏
Recombination of chlorine atoms on plasma-conditioned stainless steel surfaces in the presence of adsorbed Cl2
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2009-02-16
err34
PREAI
errStafford, Luc; Khare, Rohit; Guha, Joydeep; Donnelly, Vincent M.; Poirier, Jean-Sebastien; Margot, Joelle
err分享
err收藏
Electron energy distribution functions in low-pressure oxygen plasma columns sustained by propagating surface waves
errAPPLIED PHYSICS LETTERS
IF3.6
err2009-01-14
err15
PREAI
errStafford, L.; Khare, R.; Donnelly, V. M.; Margot, J.; Moisan, M.
err分享
err收藏
Diagnostics of ballistic electrons in a dc/rf hybrid capacitively coupled dischargedc/rf混合电容耦合放电中弹道电子的诊断
errAPPLIED PHYSICS LETTERS
IF3.6
err2008-12-31
err44
PREAI
errXu, Lin; Chen, Lee; Funk, Merritt; Ranjan, Alok; Hummel, Mike; Bravenec, Ron; Sundararajan, Radha; Economou, Demetre J.; Donnelly, Vincent M.
err分享
err收藏
Influence of gas heating on high pressure dc microdischarge I-V characteristics
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2008-09-01
err17
PREAI
errBelostotskiy, Sergey G.; Donnelly, Vincent M.; Economou, Demetre J.
err分享
err收藏
Measurement of electron temperature and density in an argon microdischarge by laser Thomson scattering
errAPPLIED PHYSICS LETTERS
IF3.6
err2008-06-06
err79
PREAI
errBelostotskiy, Sergey G.; Khandelwal, Rahul; Wang, Qiang; Donnelly, Vincent M.; Economou, Demetre J.; Sadeghi, Nader
err分享
err收藏

研究方向

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合作学者
合作期刊
Y
Yushan Yan
H 指数: 121 · 论文数: 963
M
Mark J. Kushner
H 指数: 77 · 论文数: 875
D
David B. Graves
H 指数: 75 · 论文数: 399
W
Wilson A. Smith
H 指数: 65 · 论文数: 276
徐琳 封面图
徐琳 (Lin Xu)
H 指数: 64 · 论文数: 262
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