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Lauri Niinistö

Aalto University

59H指数
609论文数
1.3W被引数
收录论文 50
发表时间
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Deposition of tin oxide into porous silicon by atomic layer epitaxy
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-07
err72
PREAI
errDucso, C; Khanh, NQ; Horvath, Z; Barsony, I; Utriainen, M; Lehto, S; Nieminen, M; Niinisto, L
err分享
err收藏
Controlled electrical conductivity in SnO2 thin films by oxygen or hydrocarbon assisted atomic layer epitaxy
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err63
PREAI
errUtriainen, M; Kovács, K; Campbell, JM; Niinistö, L; Réti, F
err分享
err收藏
The reduction of oxygen on Pt-TiO2 coated Ti electrodes in alkaline solution
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err55
PREAI
errTammeveski, K; Tenno, T; Rosental, A; Talonen, P; Johansson, LS; Niinistö, L
err分享
err收藏
Thermally evolved gases from thiourea complexes of CuCl in air Detailed comparisons by TG-FTIR and TG/DTA-MS for compounds poor and rich in thiourea通过tg-ftir和TG/dta-ms对空气中CuCl的硫脲络合物的热释放气体进行了详细比较
errJOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
IF3.1
err2015-03-14
err15
PREAI
errMadarasz, Janos; Krunks, Malle; Niinisto, Lauri; Pokol, Gyorgy
err分享
err收藏
Challenges of Thin Layers for SOFC Devices: From Low-Cost Chemical Bath Deposition (CBD) to Atomic Layer Deposition (ALD)
errsolid oxide fuel cells
IF0
err2011-04-25
err1
PREAI
errMedina-Lott, B.; Tasse, M.; Brahim, C.; Ringuede, A.; Niinisto, L.; Cassir, M.
err分享
err收藏
Synthesis of a Thin-Layered Ionic Conductor, CeO2-Y2O3, by Atomic Layer Deposition in View of Solid Oxide Fuel Cell Applications
errCHEMISTRY OF MATERIALS
IF7
err2009-09-01
err55
PREAI
errBallee, Elise; Ringuede, Armelle; Cassir, Michel; Putkonen, Matti; Niinisto, Lauri
err分享
err收藏
Titanium(IV) acetylacetonate xerogels for processing titania films
errJOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
IF3.1
err2009-04-27
err24
PREAI
errAcik, Ilona Oja; Madarasz, J.; Krunks, M.; Tonsuaadu, K.; Pokol, G.; Niinisto, L.
err分享
err收藏
Synthesis and surface engineering of complex nanostructures by atomic layer deposition原子层沉积法合成复杂纳米结构及其表面工程
errADVANCED MATERIALS
IF26.8
err2007-10-02
err916
errOAAI
errKnez, Mato; Niesch, Kornelius; Niinistoe, Lauri
err分享
err收藏
A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of Ta2O5
errJOURNAL OF THE AMERICAN CHEMICAL SOCIETY
IF15.6
err2007-09-26
err44
PREAI
errDezelah, Charles L., IV; Wiedmann, Monika K.; Mizohata, Kenichiro; Baird, Ronald J.; Niinisto, Lauri; Winter, Charles H.
err分享
err收藏
Atomic layer deposition of HfO2 thin films exploiting novel cyclopentadienyl precursors at high temperatures
errCHEMISTRY OF MATERIALS
IF7
err2007-06-01
err65
PREAI
errNiinisto, Jaakko; Putkonen, Matti; Niinisto, Lauri; Song, Fuquan; Williams, Paul; Heys, Peter N.; Odedra, Rajesh
err分享
err收藏
Atomic layer deposition of PbZrO3 thin films
errAPPLIED SURFACE SCIENCE
IF6.9
err2007-04-01
err20
PREAI
errHarjuoja, Jenni; Vayrynen, Samuli; Putkonen, Matti; Niinisto, Lauri; Rauhala, Eero
err分享
err收藏
Low temperature growth of ZnMnO:: A way to avoid inclusions of foreign phases and spinodal decomposition
errAPPLIED PHYSICS LETTERS
IF3.6
err2007-02-20
err35
errOAAI
errWojcik, A.; Godlewski, M.; Guziewicz, E.; Kopalko, K.; Jakiela, R.; Kiecana, M.; Sawicki, M.; Guziewicz, M.; Putkonen, M.; Niinisto, L.; Dumont, Y.; Keller, N.
err分享
err收藏
Electrical properties of thin yttria-stabilized zirconia overlayers produced by atomic layer deposition for solid oxide fuel cell applications
errAPPLIED SURFACE SCIENCE
IF6.9
err2007-02-01
err50
PREAI
errBrahim, C.; Ringuede, A.; Cassir, M.; Putkonen, M.; Niinisto, L.
err分享
err收藏
Atomic layer deposition of tungsten(III) oxide thin films from W2(NMe2)6 and water:: Precursor-based control of oxidation state in the thin film material
errJOURNAL OF THE AMERICAN CHEMICAL SOCIETY
IF15.6
err2006-07-11
err50
PREAI
errDezelah, Charles L.; El-Kadri, Oussama M.; Szilagyi, Imre M.; Campbell, Joseph M.; Arstila, Kai; Niinisto, Lauri; Winter, Charles H.
err分享
err收藏
HfO2 films grown by ALD using cyclopentadienyl-type precursors and H2O or O3 as oxygen source
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2006-01-01
err44
PREAI
errNiinistö, J; Putkonen, M; Niinistö, L; Arstila, K; Sajavaara, T; Lu, J; Kukli, K; Ritala, M; Leskelä, M
err分享
err收藏
Atomic layer deposition of Ga2O3 films from a dialkylamido-based precursor
errCHEMISTRY OF MATERIALS
IF7
err2005-12-22
err85
PREAI
errDezelah, CL; Niinistö, J; Arstila, K; Niinistö, L; Winter, CH
err分享
err收藏
Analysis of ALD-processed thin films by ion-beam techniques
errANALYTICAL AND BIOANALYTICAL CHEMISTRY
IF3.8
err2005-07-14
err66
PREAI
errPutkonen, M; Sajavaara, T; Niinistö, L; Keinonen, J
err分享
err收藏
In situ quadrupole mass spectrometry study of atomic-layer deposition of ZrO2 using Cp2Zr(CH3)2 and water
errLANGMUIR
IF3.9
err2005-07-06
err56
PREAI
errNiinistö, J; Rahtu, A; Putkonen, M; Ritala, M; Leskelä, M; Niinistö, L
err分享
err收藏
Thermoanalytical study of acetylacetonate-modified titanium(IV) isopropoxide as a precursor for TiO2 films
errJOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
IF3.1
err2005-05-01
err55
PREAI
errKrunks, M; Oja, I; Tonsuaadu, K; Es-Souni, M; Gruselle, M; Niinistö, L
err分享
err收藏
Processing of Y2O3 thin films by atomic layer deposition from cyclopentadienyl-type compounds and water as precursors
errCHEMISTRY OF MATERIALS
IF7
err2004-07-02
err120
PREAI
errNiinistö, J; Putkonen, M; Niinistö, L
err分享
err收藏

研究方向

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合作学者
合作期刊
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Markku Leskelä
H 指数: 89 · 论文数: 1.2K
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P. Carniti
H 指数: 84 · 论文数: 1.4K
M
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H 指数: 84 · 论文数: 740
J
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K
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H 指数: 76 · 论文数: 751
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