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M

Mikko Ritala

University of Helsinki

84H指数
740论文数
3.1W被引数
收录论文 273
发表时间
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Charge Redistribution at NiO/Co3O4 Junctions Activates Interfacial Iridium for Alkaline Oxygen EvolutionNiO/Co3O4界面处的电荷重分布激活了界面处的铱用于碱性氧析出
errACS Applied Energy Materials
IF5.5
err2026-06-12
err0
errOAAI
errParisa Talebi; Shiqi Wang; Hugo L. S. dos Santos; Sami Saukko; Heta-Elisa Nieminen; Mikko Ritala; Pedro H. C. Camargo
err分享
err收藏
Atomic layer deposition of SnO2 thin films using tin(IV) acetate as a novel precursor使用醋酸锡(IV)作为新型前驱体进行SnO2薄膜的原子层沉积
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errDeb, Anjan; Mattinen, Miika; Heikkila, Mikko J.; Chundak, Mykhailo; Vihervaara, Anton; Mizohata, Kenichiro; Ritala, Mikko; Putkonen, Matti
err分享
err收藏
In vacuo investigation of atomic layer deposition of HfO2 thin films on TiN: A low energy ion scattering and x-ray photoelectron spectroscopy study of interface evolution真空中HfO2薄膜在TiN上的原子层沉积研究：界面演化的低能离子散射和X射线光电子能谱研究
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errChundak, Mykhailo; Nieminen, Heta-Elisa; Vehkamaki, Marko; Keranen, Laura; Putkonen, Matti; Ritala, Mikko
err分享
err收藏
Self-aligned patterning by area-selective etching of polymers and area-selective atomic layer deposition: Decreasing polymer flow and activating noncatalytic surface通过聚合物区域选择性刻蚀和区域选择性原子层沉积的自对准图案化：降低聚合物流动并激活非催化表面
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errLasonen, Valtteri; Liyana Pathiranage, Piyumi; Chundak, Mykhailo; Vehkamaki, Marko; Carnoy, Matthias; Borie, Benjamin; Armini, Silvia; Ritala, Mikko
err分享
err收藏
Atomic Layer Etching of Titanium Nitride With O3 and NbCl5采用O3和NbCl5对氮化钛进行原子层刻蚀
errChemNanoMat
IF2.6
err2026-04-27
err0
errOAAI
errJuha Ojala; Mykhailo Chundak; Anton Vihervaara; Mikko Ritala
err分享
err收藏
Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High-k Rutile Capacitors金属二氧化钼薄膜的原子层沉积技术实现高介电常数金红石电容器
errAdvanced Materials Interfaces
IF4.4
err2026-04-01
err0
errOAAI
errGanzhinov, Alexey; Mattinen, Miika; Vehkamaki, Marko; Mizohata, Kenichiro; Chundak, Mykhailo; Popov, Georgi; Porri, Paavo; Ritala, Mikko; Putkonen, Matti
err分享
err收藏
Activin-A has dual roles in osteoclast formation and foreign body giant cell differentiation from human CD14+ monocytes激活素A在破骨细胞形成和人CD14单核细胞的异物巨细胞分化中具有双重作用
errBone
IF3.6
err2026-02-04
err0
PREAI
errElina Kylmäoja; Sami Kauppinen; Faleh Abushahba; Mikko Finnilä; Mikko Ritala; Petri Lehenkari; Juha Tuukkanen; Teun J. de Vries; Ton Schoenmaker
err分享
err收藏
Area selective atomic layer deposition of ruthenium with phenol as a small molecule inhibitor以苯酚作为小分子抑制剂的区域选择性钌原子层沉积
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err0
PREAI
errIsmaeel, Sundas; Chundak, Mykhailo; Ritala, Mikko
err分享
err收藏
Atomic layer etching of molybdenum with O2 and NbCl5使用O2和NbCl5对钼进行的原子层刻蚀
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err0
PREAI
errOjala, Juha; Chundak, Mykhailo; Vihervaara, Anton; Vehkamaki, Marko; Ritala, Mikko
err分享
err收藏
Multimetal Doping and Heterostructure Engineering of RuO2 for Durable and Efficient Oxygen EvolutionRuO2的多金属掺杂和异质结构工程，用于持久有效的析氧
errSMALL SCIENCE
IF8.3
err2025-12-01
err0
errOAAI
errMofakkharulhashan, Md.; Wang, Shiqi; Santos, Hugo L. S.; Chundak, Mykhailo; Ritala, Mikko; Camargo, Pedro H. C.
err分享
err收藏
Plasmon-Enhanced CO2 Methanation over Au@Ru/TiO2 via Nanoscale Control of Ru Shell Thickness通过纳米级控制Ru壳厚度在Au @ Ru/TiO2上进行等离子体增强的CO2甲烷化
errAngewandte Chemie International Edition
IF16.9
err2025-11-03
err0
errOAAI
errFlorian Rathmann; IbrahiM Abdelsalam; Shiqi Wang; Maja M. Kubik; Sana Frindy; Tiago V. Alves; Mykhailo Chundak; Mikko Ritala; Alexander Reznichenko; Matti Reinikainen; Pedro H. C. Camargo
err分享
err收藏
Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin FilmsAgX (X = Cl，Br，I) 薄膜的原子层沉积
errACS OMEGA
IF4.3
err2025-11-01
err0
PREAI
errHeidari, Aida; Popov, Georgi; Hatanpaa, Timo; Weiss, Alexander; Chundak, Mykhailo; Mizohata, Kenichiro; Ritala, Mikko; Kemell, Marianna
err分享
err收藏
Plasmonically Enhanced Hydrogen Evolution on Anisotropic AuPt Nanowires with Submonolayer Pt Surface Coverage等离激元增强的氢气演化在具有亚单层Pt表面覆盖度的各向异性AuPt纳米线上的研究
errSmall
IF12.1
err2025-10-30
err0
errOAAI
errIbrahiM Abdelsalam; Shiqi Wang; Hugo L. S. Santos; Ella Kitching; Pranava Pakala; Mykhailo Chundak; Mikko Ritala; Sarah J. Haigh; Thomas J. A. Slater; Pedro H. C. Camargo
err分享
err收藏
Pinacolborane as a Reducing Agent in the Atomic Layer Deposition of Copper and Bismuth三乙二醇硼烷作为铜和铋原子层沉积中的还原剂
errACS Omega
IF4.3
err2025-10-26
err0
errOAAI
errAnton Vihervaara; Timo Hatanpää; Kenichiro Mizohata; Mykhailo Chundak; Mikko Ritala
err分享
err收藏
Electroblowing of poly(vinylidene fluoride) fibres-effect of hydroxyapatite precursors聚偏氟乙烯纤维的电纺吹研究——羟基磷灰石前驱体的影响
errJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ENGINEERING
IF4.5
err2025-10-16
err0
errOAAI
errPasqual, Junio A. R.; Ritala, Mikko; Schmitt, Carla C.
err分享
err收藏
Atomic layer deposition原子层沉积
errNature Reviews Methods Primers
IF56
err2025-10-16
err0
PREAI
errErwin Kessels; Anjana Devi; Jin-Seong Park; Mikko Ritala; Angel Yanguas-Gil; Claudia Wiemer
err分享
err收藏
Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability硫化镍薄膜的原子层沉积及其热稳定性和电化学稳定性
errJ. Mater. Chem. A
IF9.5
err2025-08-05
err0
errOAAI
errMiika Mattinen; Johanna Schröder ‡; Timo Hatanpää; Georgi Popov; Kenichiro Mizohata; Markku Leskelä; Thomas F. Jaramillo; Michaela Burke Stevens; Stacey F. Bent; Mikko Ritala
err分享
err收藏
Atomic Layer Deposition of Ti x Fe2-x O3 Photoanodes and Photocurrent Response Optimization Using the Response Surface Methodology
errACS OMEGA
IF4.3
err2025-04-01
err0
errOAAI
errDeb, Anjan; Vihervaara, Anton; Popov, Georgi; Chundak, Mykhailo; Abdelaal, Ahmed O.; Santos, Hugo L. S.; Heikkila, Mikko J.; Kemell, Marianna; Camargo, Pedro H. C.; Ritala, Mikko; Putkonen, Matti
err分享
err收藏
Earth-Abundant W18O49 Coupled with Minimal Pt for Enhanced Hydrogen Evolution under Dark and Visible Light Conditions地球丰产W18O49与极少量Pt耦合以增强暗态和可见光条件下的氢气析出
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2025-03-11
err0
errOAAI
errSantos, HLS; Mofakkharulhashan, M; Wang, SQ; Formo, EV; Chundak, M; Ritala, M; Huo, WY; Camargo, PHC
err分享
err收藏
Selective gas phase pulsed etching of oxides with NbCl5用NbCl5对氧化物进行选择性气相脉冲蚀刻
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2025-01-01
err0
errOAAI
errOjala, Juha; Vehkamaeki, Marko; Chundak, Mykhailo; Vihervaara, Anton; Mizohata, Kenichiro; Ritala, Mikko
err分享
err收藏

研究方向

暂无研究方向
合作学者
合作期刊
T
Thomas F. Jaramillo
H 指数: 111 · 论文数: 582
A
Alireza Khataee
H 指数: 106 · 论文数: 841
P
PlssonLars-Olof (Olli Ikkala)
H 指数: 95 · 论文数: 619
M
Markku Leskelä
H 指数: 89 · 论文数: 1.2K
J
Jouni Hirvonen
H 指数: 85 · 论文数: 422
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