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H

Hyeonsu Roh

Sejong University

5H指数
11论文数
67被引数
收录论文 4
发表时间
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Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)Silane and ozone ( vol 571 , 151231 , 2022)
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-07-01
err0
errOAAI
errRoh, Hyeonsu; Kim, Hye-Lee; Khumaini, Khabib; Son, Heeju; Shin, Donggeon; Lee, Won-Jun
err分享
err收藏
Preparation of tungsten-based thin films using a F-free W precursor and tert-butyl hydrazine via 2-and 3-step atomic layer deposition process
errAPPLIED SURFACE SCIENCE
IF6.9
err2022-03-01
err4
PREAI
errLee, Jin-Hyeok; Hidayat, Romel; Ramesh, Rahul; Roh, Hyeonsu; Nandi, Dip K.; Lee, Won-Jun; Kim, Soo-Hyun
err分享
err收藏
Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2022-01-01
err12
PREAI
errKim, Seongyoon; Hidayat, Romel; Roh, Hyeonsu; Kim, Jaemin; Kim, Hye-Lee; Khumaini, Khabib; Park, Mira; Seok, Jang-Hyeon; Park, Jung Woo; Lee, Won-Jun
err分享
err收藏
Atomic layer deposition of silicon oxide films using bis(dimethylaminomethylsilyl)trimethylsilylamine and ozone: first-principles and experimental study
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2022-01-01
err5
PREAI
errChoi, Yeongchan; Son, Heeju; Khumaini, Khabib; Han, Hyunmin; Roh, Hyeonsu; Kim, Hye-Lee; Lee, Sang-Ick; Lee, Won-Jun
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
M
Mira Park
H 指数: 58 · 论文数: 328
S
Soo‐Hyun Kim
H 指数: 51 · 论文数: 459
W
Won‐Jun Lee
H 指数: 32 · 论文数: 275
J
Jung‐Woo Park
H 指数: 29 · 论文数: 155
D
Dip K. Nandi
H 指数: 23 · 论文数: 75
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