T. Höchbauer - Publications, H-index & Citations

T. Höchbauer

机构信息待补充

16H指数

48论文数

961被引数

收录论文 10

发表时间

Role of strain in the blistering of hydrogen-implanted silicon

APPLIED PHYSICS LETTERS

IF3.6

2006-09-05

OAAI

Lee, Jung-Kun; Lin, Yuan; Jia, Q. X.; Hochbauer, Tobias; Jung, Hyun Suk; Shao, Lin; Misra, Amit; Nastasi, Michael

Microwave-cut silicon layer transfer

APPLIED PHYSICS LETTERS

IF3.6

2005-11-22

PREAI

Thompson, DC; Alford, TL; Mayer, JW; Hochbauer, T; Nastasi, M; Lau, SS; Theodore, ND; Henttinen, K; Suni, I; Chu, PK

Nucleation and growth of platelets in hydrogen-ion-implanted silicon -: art. no. 154102

APPLIED PHYSICS LETTERS

IF3.6

2005-04-05

OAAI

Nastasi, M; Höchbauer, T; Lee, JK; Misra, A; Hirth, JP; Ridgway, M; Lafford, T

Investigation of plasma hydrogenation and trapping mechanism for layer transfer -: art. no. 031904

APPLIED PHYSICS LETTERS

IF3.6

2005-01-07

OAAI

Chen, P; Chu, PK; Höchbauer, T; Lee, JK; Nastasi, M; Buca, D; Mantl, S; Loo, R; Caymax, M; Alford, T; Mayer, JW; Theodore, ND; Cai, M; Schmidt, B; Lau, SS

Plasma hydrogenation of strain-relaxed SiGe/Si heterostructure for layer transfer

APPLIED PHYSICS LETTERS

IF3.6

2004-11-22

OAAI

Chen, P; Chu, PK; Höchbauer, T; Nastasi, M; Buca, D; Mantl, S; Theodore, ND; Alford, TL; Mayer, JW; Loo, R; Caymax, M; Cai, M; Lau, SS

Role of boron for defect evolution in hydrogen-implanted silicon

APPLIED PHYSICS LETTERS

IF3.6

2003-10-13

PREAI

Lee, JK; Höchbauer, T; Averitt, RD; Nastasi, M

Plasma immersion ion implantation of complex-shaped objects:: an experimental study on the treatment homogeneity

SURFACE & COATINGS TECHNOLOGY

IF6.1

2000-06-01

PREAI

Ensinger, W; Volz, K; Höchbauer, T

Three-dimensional dose uniformity of plasma immersion ion implantation shown with the example of macro-trenches

SURFACE & COATINGS TECHNOLOGY

IF6.1

1999-11-01

PREAI

Ensinger, W; Volz, K; Höchbauer, T

Treatment uniformity of plasma immersion ion implantation studied with three-dimensional model systems

SURFACE & COATINGS TECHNOLOGY

IF6.1

1998-05-01

PREAI

Ensinger, W; Hochbauer, T; Rauschenbach, B

Lateral implantation homogeneity of wedge-shaped samples treated by plasma immersion ion implantation

SURFACE & COATINGS TECHNOLOGY

IF6.1

1997-10-01

PREAI

Ensinger, W; Hochbauer, T; Rauschenbach, B

研究方向