A. Paskaleva - Publications, H-index & Citations

A. Paskaleva

bulgarian academy of sciences

26H指数

174论文数

2.3K被引数

收录论文 41

发表时间

Comparative Analysis of Annealing–Dissolution Techniques for Hollow Submicron Metal Oxide Fiber Synthesis

Materials

IF3.2

2026-01-20

OAAI

Borislava Georgieva; Blagoy Spasov Blagoev; Albena Paskaleva; Kirilka Starbova; Nikolay Starbov; Ivalina Avramova; Peter Tzvetkov; Krastyo Buchkov; Vladimir Mehandzhiev

Characterization of Submicron Ni-, Co-, and Fe-Doped ZnO Fibers Fabricated by Electrospinning and Atomic Layer Deposition 通过电纺和原子层沉积法制备的亚微米Ni-, Co-, 和 Fe-掺杂ZnO纤维的表征

Coatings 2025, Vol. 15, Page 1022

IF2.8

2025-10-01

OAAI

Blagoy Spasov Blagoev; Borislava Georgieva; Albena Paskaleva; Ivalina Avramova; Peter Tzvetkov; Kirilka Starbova; Nikolay Starbov; Krastyo Buchkov; Vladimir Mehandzhiev; Lyubomir Slavov; Penka Terziyska; Dencho Spasov

Recovery Analysis of Sequentially Irradiated and NBT-Stressed VDMOS Transistors

MICROMACHINES

IF3

2024-12-28

OAAI

Djoric-Veljkovic, Snezana; Zivanovic, Emilija; Davidovic, Vojkan; Veljkovic, Sandra; Mitrovic, Nikola; Ristic, Goran; Paskaleva, Albena; Spassov, Dencho; Dankovic, Danijel

Peculiarities of Electric and Dielectric Behavior of Ni- or Fe-Doped ZnO Thin Films Deposited by Atomic Layer Deposition

MATERIALS

IF3.2

2024-07-18

OAAI

Paskaleva, Albena; Spassov, Dencho; Blagoev, Blagoy; Terziyska, Penka

A Reliability Investigation of VDMOS Transistors: Performance and Degradation Caused by Bias Temperature Stress

MICROMACHINES

IF3

2024-04-05

OAAI

Zivanovic, Emilija; Veljkovic, Sandra; Mitrovic, Nikola; Jovanovic, Igor; Djoric-Veljkovic, Snezana; Paskaleva, Albena; Spassov, Dencho; Dankovic, Danijel

A Novel Approach to Obtaining Metal Oxide HAR Nanostructures by Electrospinning and ALD

MATERIALS

IF3.2

2023-12-03

OAAI

Blagoev, Blagoy S.; Georgieva, Borislava; Starbova, Kirilka; Starbov, Nikolay; Avramova, Ivalina; Buchkov, Krastyo; Tzvetkov, Peter; Stoykov, Rumen; Terziyska, Penka; Delibaltov, Damyan; Mehandzhiev, Vladimir; Paskaleva, Albena

Strong Magneto-Optical Kerr Effects in Ni-Doped ZnO Nanolaminate Structures Obtained by Atomic Layer Deposition

MATERIALS

IF3.2

2023-10-04

OAAI

Galluzzi, Armando; Buchkov, Krastyo; Blagoev, Blagoy S.; Paskaleva, Albena; Avramova, Ivalina; Mehandhziev, Vladimir; Tzvetkov, Peter; Terziyska, Penka; Kovacheva, Daniela; Polichetti, Massimiliano

Challenges to Optimize Charge Trapping Non-Volatile Flash Memory Cells: A Case Study of HfO2/Al2O3 Nanolaminated Stacks 优化电荷捕获非易失性闪存单元的挑战: HfO2/Al2O3纳米叠层的案例研究

NANOMATERIALS

IF4.3

2023-08-30

OAAI

Spassov, Dencho; Paskaleva, Albena

Magneto-Optical and Muliferroic Properties of Transition-Metal (Fe, Co, or Ni)-Doped ZnO Layers Deposited by ALD

ACS OMEGA

IF4.3

2022-11-14

OAAI

Paskaleva, Albena; Buchkov, Krastyo; Galluzzi, Armando; Spassov, Dencho; Blagoev, Blagoy; Ivanov, Tzvetan; Mehandzhiev, Vladimir; Avramova, Ivalina Avramova; Terzyiska, Penka; Tzvetkov, Peter; Kovacheva, Daniela; Polichetti, Massimiliano

Charge Storage and Reliability Characteristics of Nonvolatile Memory Capacitors with HfO2/Al2O3-Based Charge Trapping Layers

MATERIALS

IF3.2

2022-09-09

OAAI

Spassov, Dencho; Paskaleva, Albena; Guziewicz, Elzbieta; Wozniak, Wojciech; Stanchev, Todor; Ivanov, Tsvetan; Wojewoda-Budka, Joanna; Janusz-Skuza, Marta

Radiation Tolerance and Charge Trapping Enhancement of ALD HfO2/Al2O3 Nanolaminated Dielectrics

MATERIALS

IF3.2

2021-02-10

OAAI

Spassov, Dencho; Paskaleva, Albena; Guziewicz, Elzbieta; Davidovic, Vojkan; Stankovic, Srboljub; Djoric-Veljkovic, Snezana; Ivanov, Tzvetan; Stanchev, Todor; Stojadinovic, Ninoslav

On the Limits of Scalpel AFM for the 3D Electrical Characterization of Nanomaterials

ADVANCED FUNCTIONAL MATERIALS

IF19

2018-11-12

OAAI

Chen, Shaochuan; Jiang, Lanlan; Buckwell, Mark; Jing, Xu; Ji, Yanfeng; Grustan-Gutierrez, Enric; Hui, Fei; Shi, Yuanyuan; Rommel, Mathias; Paskaleva, Albena; Benstetter, Guenther; Ng, Wing H.; Mehonic, Adnan; Kenyon, Anthony J.; Lanza, Mario

Model based precise analysis of the injection currents in Al/ZrO2/Al2O3/ZrO2/SiO2/Si structures for use in charge trapping non-volatile memory devices

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

IF4.6

2016-03-01

PREAI

Novkovski, N.; Paskaleva, A.; Skeparovski, A.; Spassov, D.

Tailoring the Electrical Properties of HfO2 MOS-Devices by Aluminum Doping

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2015-07-30

PREAI

Paskaleva, Albena; Rommel, Mathias; Hutzler, Andreas; Spassov, Dencho; Bauer, Anton J.

Improved electrical behavior of ZrO2-based MIM structures by optimizing the O3 oxidation pulse time

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

IF4.6

2015-01-01

PREAI

Paskaleva, A.; Weinreich, W.; Bauer, A. J.; Lemberger, M.; Frey, L.

Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2014-02-10

OAAI

Murakami, Katsuhisa; Rommel, Mathias; Hudec, Boris; Rosova, Alica; Husekova, Kristina; Dobrocka, Edmund; Rammula, Raul; Kasikov, Aarne; Han, Jeong Hwan; Lee, Woongkyu; Song, Seul Ji; Paskaleva, Albena; Bauer, Anton J.; Frey, Lothar; Froehlich, Karol; Aarik, Jaan; Hwang, Cheol Seong

This is one of a series of Special Topical Issues published in Materials Science in Semiconductor Processing, focusing on Advanced Oxides for Electronics

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

IF4.6

2013-10-01

PREAI

Cheong, K. Y.; Paskaleva, A.

Influence of Hf doping on interfacial layers of Ta2O5 stacks studied by ellipsometry

APPLIED SURFACE SCIENCE

IF6.9

2013-04-01

PREAI

Karmakov, Y.; Paskaleva, A.