Jaan Aarik - Publications, H-index & Citations

Jaan Aarik

university of tartu

47H指数

211论文数

7.0K被引数

收录论文 61

发表时间

Influence of composition and structure on resistive switching properties of hafnium–titanium-oxide thin films grown by atomic layer deposition 原子层沉积法制备的锆钛氧化物薄膜的组成和结构对其电阻开关性能的影响

j. mater. chem. c

IF0

2026-05-16

PREAI

Toomas Daniel Viskus; Lauri Aarik; Tõnis Arroval; Aarne Kasikov; Joonas Merisalu; Jekaterina Kozlova; Markus Otsus; Hugo Mändar; Jaan Aarik; Guillermo Vinuesa; Salvador Dueñas; Helena Castán; Kaupo Kukli

Optical properties of Ga2O3 thin films grown by atomic layer deposition using GaI3 and O3 as precursors

JOURNAL OF MATERIALS CHEMISTRY C

IF5.1

2024-01-01

OAAI

Aarik, Lauri; Mandar, Hugo; Kasikov, Aarne; Tarre, Aivar; Aarik, Jaan

Atomic Layer Deposition of Ga2O3 from GaI3 and O3: Growth of High-Density Phases

CRYSTAL GROWTH & DESIGN

IF3.4

2023-07-13

PREAI

Aarik, Lauri; Mandar, Hugo; Kozlova, Jekaterina; Tarre, Aivar; Aarik, Jaan

Influence of Substrates on Structure Development and Concentration of Residual Impurities in Hafnium-Titanium-Oxide Films Grown by Atomic Layer Deposition

CRYSTAL GROWTH & DESIGN

IF3.4

2022-12-14

PREAI

Aarik, Lauri; Arroval, Tonis; Ritslaid, Peeter; Vask, Agnes; Maendar, Hugo; Aarik, Jaan

Engineering of atomic layer deposition process for titanium-aluminum-oxide based resistively switching medium 钛-铝氧化物基电阻开关介质的原子层沉积工艺工程化

MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS

IF4.6

2022-08-01

OAAI

Merisalu, Joonas; Arroval, Tonis; Kasikov, Aarne; Kozlova, Jekaterina; Rahn, Mihkel; Ritslaid, Peeter; Aarik, Jaan; Tamm, Aile; Kukli, Kaupo

Mechanical properties of crystalline and amorphous aluminum oxide thin films grown by atomic layer deposition

SURFACE & COATINGS TECHNOLOGY

IF6.1

2022-05-01

PREAI

Aarik, Lauri; Mandar, Hugo; Tarre, Aivar; Piirsoo, Helle-Mai; Aarik, Jaan

Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition

MATERIALS

IF3.2

2022-01-24

OAAI

Kukli, Kaupo; Aarik, Lauri; Vinuesa, Guillermo; Duenas, Salvador; Castan, Helena; Garcia, Hector; Kasikov, Aarne; Ritslaid, Peeter; Piirsoo, Helle-Mai; Aarik, Jaan

Atomic-layer design and properties of Pr-doped HfO2 thin films

JOURNAL OF ALLOYS AND COMPOUNDS

IF6.3

2021-07-01

PREAI

Aarik, Lauri; Peetermann, Karmo; Puust, Laurits; Mandar, Hugo; Kikas, Arvo; Sildos, Ilmo; Aarik, Jaan

Low-Temperature Atomic Layer Deposition of α-Al2O3 Thin Films

CRYSTAL GROWTH & DESIGN

IF3.4

2021-06-14

PREAI

Aarik, Lauri; Mandar, Hugo; Ritslaid, Peeter; Tarre, Aivar; Kozlova, Jekaterina; Aarik, Jaan

Platinum Sputtered on Nb-doped TiO2 Films Prepared by ALD: Highly Active and Durable Carbon-free ORR Electrocatalyst 通过ALD制备的Nb掺杂的TiO2薄膜上溅射的铂: 高活性和耐用的无碳ORR电催化剂

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2020-11-26

OAAI

Hussain, Sajid; Erikson, Heiki; Kongi, Nadezda; Tarre, Aivar; Ritslaid, Peeter; Kikas, Arvo; Kisand, Vambola; Kozlova, Jekaterina; Aarik, Jaan; Tamm, Aile; Sammelselg, Vaino; Tammeveski, Kaido

Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes

APPLIED SURFACE SCIENCE

IF6.9

2020-11-01

PREAI

Aarik, Lauri; Arroval, Tonis; Mandar, Hugo; Rammula, Raul; Aarik, Jaan

Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films

OPTICAL MATERIALS

IF4.2

2019-10-01

PREAI

Mols, Kristel; Aarik, Lauri; Mandar, Hugo; Kasikov, Aarne; Niilisk, Ahti; Rammula, Raul; Aarik, Jaan

Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films

ACS OMEGA

IF4.3

2017-12-11

OAAI

Tamm, Aile; Kalam, Kristjan; Seemen, Helina; Kozlova, Jekaterina; Kukli, Kaupo; Aarik, Jaan; Link, Joosep; Stern, Raivo; Duenas, Salvador; Castan, Helena

Characterization of Ar/N2/H2 middle-pressure RF discharge and application of the afterglow region for nitridation of GaAs Ar/N2/H2中压射频放电的表征及余辉区在GaAs氮化中的应用

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2017-11-21

PREAI

Raud, J.; Jogi, I; Matisen, L.; Navratil, Z.; Talviste, R.; Trunec, D.; Aarik, J.

Raman characterization of stacking in multi-layer graphene grown on Ni

CARBON

IF11.6

2016-03-01

PREAI

Niilisk, Ahti; Kozlova, Jekaterina; Alles, Harry; Aarik, Jaan; Sammelselg, Vaeino

Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2014-02-10

OAAI

Murakami, Katsuhisa; Rommel, Mathias; Hudec, Boris; Rosova, Alica; Husekova, Kristina; Dobrocka, Edmund; Rammula, Raul; Kasikov, Aarne; Han, Jeong Hwan; Lee, Woongkyu; Song, Seul Ji; Paskaleva, Albena; Bauer, Anton J.; Frey, Lothar; Froehlich, Karol; Aarik, Jaan; Hwang, Cheol Seong

Temperature induced inversion of oxygen response in CVD graphene on SiO2

SENSORS AND ACTUATORS B-CHEMICAL

IF7.7

2014-01-01

OAAI

Jaaniso, Raivo; Kahro, Tauno; Kozlova, Jekaterina; Aarik, Jaan; Aarik, Lauri; Alles, Harry; Floren, Aare; Gerst, Alar; Kasikov, Aarne; Niilisk, Ahti; Sammelselg, Vaeino

Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2013-09-04

PREAI

Hudec, Boris; Husekova, Kristina; Rosova, Alica; Soltys, Jan; Rammula, Raul; Kasikov, Aarne; Uustare, Teet; Micusik, Matej; Omastova, Maria; Aarik, Jaan; Froehlich, Karol

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2011-01-01

PREAI

Kukli, Kaupo; Kemell, Marianna; Puukilainen, Esa; Aarik, Jaan; Aidla, Aleks; Sajavaara, Timo; Laitinen, Mikko; Tallarida, Massimo; Sundqvist, Jonas; Ritala, Mikko; Leskela, Markku

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

APPLIED SURFACE SCIENCE

IF6.9

2010-11-01

PREAI

Rammula, Raul; Aarik, Jaan; Maendar, Hugo; Ritslaid, Peeter; Sammelselg, Vaeino

研究方向