Marc J. M. Merkx - Publications, H-index & Citations

Marc J. M. Merkx

Eindhoven University of Technology

12H指数

20论文数

1.1K被引数

收录论文 16

发表时间

AdsorPy: A Python Package for Lattice-Based Random Sequential Adsorption Simulations AdsorPy：一个基于晶格的随机顺序吸附模拟的Python软件包

Journal of Chemical Theory and Computation

IF5.5

2026-06-03

OAAI

Joost F. W. Maas; Ilker Tezsevin; Marc J. M. Merkx; Tania E. Sandoval; Adriaan J. M. Mackus

Physical approach to enhance the selectivity of SiO2 area-selective deposition using substrate biasing 通过衬底偏压增强SiO2区域选择性沉积选择性的物理方法

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

IF2.1

2026-03-01

PREAI

de Jong, Arthur A.; Merkx, Marc J. M.; Kessels, Wilhelmus W. M.; Mackus, Adriaan J. M.

Electronic Structure Descriptors for the Adsorption of Aromatic Molecules on Metals

Chemistry of Materials

IF7

2026-01-22

OAAI

Matías Picuntureo; Ilker Tezsevin; Marc J. M. Merkx; Scott P. Semproni; Jiun-Ruey Chen; Adriaan J. M. Mackus; Tania E. Sandoval

Area-Selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma 通过SF6/H2等离子体选择性钝化SiO2实现区域选择性原子层沉积

Chemistry of Materials

IF7

2025-07-11

OAAI

Olaf C. A. Bolkenbaas; Marc J. M. Merkx; Nicholas J. Chittock; Ilker Tezsevin; Wilhelmus M. M. Kessels; Tania E. Sandoval; Adriaan J. M. Mackus

Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma

JOURNAL OF MATERIALS CHEMISTRY C

IF5.1

2025-01-01

OAAI

Chittock, Nicholas J.; Maas, Joost F. W.; Tezsevin, Ilker; Merkx, Marc J. M.; Knoops, Harm C. M.; Kessels, Wilhelmus M. M. (Erwin); Mackus, Adriaan J. M.

Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation

APPLIED SURFACE SCIENCE

IF6.9

2024-08-01

OAAI

Yu, Pengmei; Merkx, Marc J. M.; Tezsevin, Ilker; Lemaire, Paul C.; Hausmann, Dennis M.; Sandoval, Tania E.; Kessels, Wilhelmus M. M.; Mackus, Adriaan J. M.

In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN

JOURNAL OF CHEMICAL PHYSICS

IF3.1

2024-05-22

OAAI

Merkx, Marc J. M.; Tezsevin, Ilker; Yu, Pengmei; Janssen, Thijs; Heinemans, Rik H. G. M.; Lengers, Rik J.; Chen, Jiun-Ruey; Jezewski, Christopher J.; Clendenning, Scott B.; Kessels, Wilhelmus M. M.; Sandoval, Tania E.; Mackus, Adriaan J. M.

Ultrathin superconducting TaCxN1-x films prepared by plasma-enhanced atomic layer deposition with ion-energy control 通过离子能量控制的等离子体增强原子层沉积制备的超薄超导TaCxN1-x薄膜

APPLIED PHYSICS LETTERS

IF3.6

2023-09-26

OAAI

Peeters, Silke A.; Lennon, Ciaran T.; Merkx, Marc J. M.; Hadfield, Robert H.; Kessels, W. M. M. (Erwin); Verheijen, Marcel A.; Knoops, Harm C. M.

Computational Investigation of Precursor Blocking during Area- Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor

LANGMUIR

IF3.9

2023-03-15

OAAI

Tezsevin, I.; Maas, J. F. W.; Merkx, M. J. M.; Lengers, R.; Kessels, W. M. M.; Sandoval, T. E.; Mackus, A. J. M.

Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

JOURNAL OF PHYSICAL CHEMISTRY C

IF3.2

2022-03-08

OAAI

Merkx, Marc J. M.; Angelidis, Athanasios; Mameli, Alfredo; Li, Jun; Lemaire, Paul C.; Sharma, Kashish; Hausmann, Dennis M.; Kessels, Wilhelmus M. M.; Sandoval, Tania E.; Mackus, Adriaan J. M.

Nanoscale Encapsulation of Perovskite Nanocrystal Luminescent Films via Plasma-Enhanced SiO2 Atomic Layer Deposition

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2020-11-11

OAAI

Jing, Yao; Merkx, Marc J. M.; Cai, Jiaming; Cao, Kun; Kessels, Wilhelmus M. M.; Mackus, Adriaan J. M.; Chen, Rong

Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity

CHEMISTRY OF MATERIALS

IF7

2020-08-13

OAAI

Merkx, Marc J. M.; Vlaanderen, Sander; Faraz, Tahsin; Verheijen, Marcel A.; Kessels, Wilhelmus M. M.; Mackus, Adriaan J. M.