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J

Ji‐Hoon Ahn

hanyang university

26H指数
153论文数
2.5K被引数
收录论文 83
发表时间
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Recovering dielectric integrity in atomic layer etched ZrO2 MIM capacitors via post-etch annealing通过后刻蚀退火恢复原子层刻蚀ZrO2 MIM电容器的介电完整性
errApplied Surface Science
IF6.9
err2026-09-30
err0
PREAI
errLee, Jeongbin; Oh, Jiwoo; Kwon, Yongju; Kim, Jung-Tae; Kim, Ji Hwan; Lee, Seung Won; Park, Tae Joo; Ahn, Ji-Hoon; Kim, Woo-Hee
err分享
err收藏
High-Performance Top-Gate SnO2 Transistors Enabled by Defect Modulation and Interface Engineering Using Atomic Layer Deposition通过原子层沉积调控缺陷和界面工程实现高性能顶栅SnO2晶体管
errAdvanced Materials Technologies
IF6.2
err2026-09-11
err0
PREAI
errJung-Tae Kim; Ji Hyeon Choi; Jiyeong Yang; Jeongbin Lee; Jiwoo Oh; Ji-Hoon Ahn; Tae Joo Park; Woo-Hee Kim
err分享
err收藏
Composition engineering for hysteresis suppression and enhanced electrical characteristics in ALD-Grown Indium–Gallium oxide thin-film transistorsALD生长的铟-镓氧化物薄膜晶体管的组分工程以抑制迟滞现象并增强电学特性
errApplied Surface Science
IF6.9
err2026-09-05
err0
PREAI
errKang Choi; Dong-Geun Kim; Su-Jin Sim; Ji-Hoon Ahn
err分享
err收藏
Interfacial stabilization of ZrO2/Mo2N capacitors via ultrathin Nb2O5 insertion for scaled DRAM applications通过插入超薄Nb2O5层稳定ZrO2/Mo2N电容器界面，用于缩放型DRAM应用
errSurfaces and Interfaces
IF6.3
err2026-09-03
err0
PREAI
errYeon-Ji Jeon; Yoonchul Shin; Ji Hwan Kim; Chan-Bin Hong; Seo-Young Choi; Woo-Hee Kim; Tae Joo Park; Ji-Hoon Ahn
err分享
err收藏
Deposition-Driven Phase Evolution in Hf1–xZrxO2 Enabled by a Thermally Stabilized Cyclopentadienyl Precursor System热稳定环戊二烯基前驱体体系驱动的Hf1–xZrxO2沉积过程相演化
errChemistry of Materials
IF7
err2026-05-14
err0
PREAI
errHye-Won Cho; Hyo-Bae Kim; Gunho Kim; Hyungseok Lee; Jin Sik Kim; Byung-Kwan Kim; Chang Mo Yoon; Ji-Hoon Ahn
err分享
err收藏
Thickness-dependent shift of the ferroelectric composition window in ultrathin Hf1-xZrxO2 thin films超薄Hf1-xZrxO2薄膜中 ferroelectric 组成窗口的厚度依赖性偏移
errApplied Surface Science
IF6.9
err2026-05-04
err0
PREAI
errGunho Kim; Hyo-Bae Kim; Hye-Won Cho; Hyungseok Lee; Wonwoo Kho; Seung-Eon Ahn; Ji-Hoon Ahn
err分享
err收藏
Atomic-layer-deposited Ru–RuOx mixed protective layer for improving ionic–electronic conductivity of sintered LiCoO2 cathodes in Li-ion batteries原子层沉积的Ru–RuOx混合保护层用于提高烧结LiCoO2正极在锂离子电池中的离子-电子导电性
errj. mater. chem. a
IF0
err2026-04-16
err0
errOAAI
errKyu Moon Kwon; Ji Won Han; Joungwon Park; Kyoung Hwan Kim; Hwi-Yeol Park; Woo-Hee Kim; Ji-Hoon Ahn; Hyo Rang Kang; Tae Joo Park
err分享
err收藏
Timing-Dependent Spiking Neural Network: Board-Level Hardware Implementation with Photoelectroactive Van der Waals Synapses时序依赖脉冲神经网络：基于光电活性范德华突触的板级硬件实现
errAdvanced Materials
IF26.8
err2025-12-08
err0
PREAI
errSeongjun Kim; Jeong-Ick Cho; Sungsoo Lee; Yoonchul Shin; Je-Jun Lee; Taehyuk Jang; Hyeonjung Kim; Junhwa Oh; Sanghyun Lee; Kwanghee Ko; Juncheol Kang; Junseo Lee; Matthew T. Flavin; Dong-Ho Kang; Byung Chul Jang; Ji-Hoon Ahn; Yoonmyung Lee; Sang Min Won; Jin-Hong Park; Seyong Oh
err分享
err收藏
Atomic Layer Deposition of Ru Using a New Zero-Valent Ru Precursor with a Ligand System Combining Open and Closed Ligands使用一种新型零价钌前驱体及其结合开放型和封闭型配体的配体系统进行钌的原子层沉积
errJ. Mater. Chem. C
IF0
err2025-11-26
err0
PREAI
errNa-Gyeong Kang; Min-Ji Ha; Eun-Su Chung; Chang Mo Yoon; Jin-Sik Kim; Yoon-A Park; Ji-Hoon Ahn
err分享
err收藏
Investigating potential use of TiO2 as conductive-like layer in DRAM capacitors研究TiO2作为DRAM电容器中类导电层的潜在应用
errApplied Surface Science
IF6.9
err2025-11-08
err0
PREAI
errYoonchul Shin; Yeon-Ji Jeon; Ji Hwan Kim; Chan-Bin Hong; Chang Mo Yoon; Ji-Hoon Ahn
err分享
err收藏
Effect of increasing deposition temperature of atomic-layer–deposited ZrO2 thin films: improvement of leakage-current properties
errCeramics International
IF5.6
err2025-10-28
err0
PREAI
errJi Hwan Kim; Seung Won Lee; Yoonchul Shin; Yeon-Ji Jeon; Hyo Yeon Kim; Hong Seok Jang; Hyung Soon Park; Tae Joo Park; Ji-Hoon Ahn
err分享
err收藏
Oxidation Dynamics and Surface Chemistry of Iridium and Iridium Oxide Films Grown by Atomic Layer Deposition Using O2 and O3采用原子层沉积法制备的铱和铱氧化物薄膜的氧化动力学与表面化学性质（使用O2和O3）
errSmall
IF12.1
err2025-10-14
err0
errOAAI
errJi Won Han; Jae Woo Jang; Ryosuke Harada; Woo-Hee Kim; Ji-Hoon Ahn; Tae Joo Park
err分享
err收藏
Role of carbon nanotube film interlayer for Li-free all-solid-state battery碳纳米管薄膜中间层在无锂全固态电池中的作用
errELECTROCHIMICA ACTA
IF5.6
err2025-07-01
err0
PREAI
errLee, Niluefer Cakmakci; Kim, Gyosik; Moon, Jo; Ahn, Jihoon; Lee, Hosin; Kim, Hyemin; Bang, Junki; Sun, Jiwon; Kim, Ji Young; Bae, Ki Yoon; Son, Samick; Min, Kyoungmin; Jeong, Youngjin
err分享
err收藏
Copper superfilling of carbon nanotube assembly with long-tortuous pore via one-step electroplating通过一步电镀法对具有长曲孔结构的碳纳米管组装体进行铜超填充
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2025-06-01
err0
PREAI
errShin, Myunggyu; Lee, Nilufer Cakmakci; Jung, Huiyeon; Lee, Jeongyun; Lee, Hosin; Kim, Hyemin; Ahn, Jihoon; Bang, Junki; Song, Hyeonjun; Han, Joong Tark; Park, Joung-Hu; Ahmed, Ashraf; Ehab, Muhammad; Munir, Muhammad Umair
err分享
err收藏
High-Performance Negative Capacitance Field-Effect Transistors with Synthetic Monolayer MoS2具有合成单层MoS2的高性能负电容场效应晶体管
errACS NANO
IF16
err2025-05-02
err0
PREAI
errJung, M; Kim, HB; Park, Y; Park, J; Lee, H; Oh, S; Kim, KK; Ahn, JH; Lee, Y; Na, J; Suh, D
err分享
err收藏
Unintended Soft Breakdown Mechanism Limiting Ultrathin Ferroelectric HZO Films Scaling非预期软击穿机制限制超薄铁电HZO薄膜的缩放
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2025-04-18
err0
PREAI
errKho, W; Hwang, H; Kim, HB; Kim, G; Ahn, JH; Ahn, SE
err分享
err收藏
Molecular layer deposition of tin-based organic-inorganic hybrid films as photoresists作为光致抗蚀剂的锡基有机-无机杂化薄膜的分子层沉积
errAPPLIED SURFACE SCIENCE
IF6.9
err2025-04-01
err0
PREAI
errKim, Dong Geun; Ha, Kyungryul; Kim, Hyekyung; Kim, Woo-Hee; Park, Tae Joo; Ahn, Ji-Hoon
err分享
err收藏
Area-selective deposition of mos2 using self-assembled monolayers for high-precision patterning利用自组装单分子层进行MoS2的区域选择性沉积以实现高精度图案化
errMATERIALS LETTERS
IF2.7
err2025-03-01
err0
PREAI
errChoi, Jeong-Hun; Kim, Dong Geun; Lee, Seo-Hyun; Choi, Kang; Kim, Woo-Hee; Yoon, Chang Mo; Ahn, Ji-Hoon
err分享
err收藏
Polarization dynamics of the ferroelectric hafnium zirconium oxide thin-film capacitor during the relaxation process
errAPPLIED PHYSICS LETTERS
IF3.6
err2025-03-01
err0
PREAI
errKim, Cheol Jun; Ku, Minkyung; Kim, Tae Hoon; Noh, Taehee; Kang, Minu; Seong, Hyeon Su; Kang, Seung Jin; Shin, Yoonchul; Ahn, Ji-Hoon; Kang, Bo Soo
err分享
err收藏
High-temperature atomic layer deposition of HfO2 film with low impurity using a novel Hf precursor
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2025-01-01
err0
PREAI
errPark, Jae Chan; Choi, Chang Ik; Jeon, Woong Pyo; Van, Tran Thi Ngoc; Kim, Woo-Hee; Ahn, Ji-Hoon; Shong, Bonggeun; Park, Tae Joo
err分享
err收藏

研究方向

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合作学者
合作期刊
J
Jin‐Seong Park
H 指数: 63 · 论文数: 552
J
Jin‐Hong Park
H 指数: 63 · 论文数: 457
N
Nae‐Eung Lee
H 指数: 62 · 论文数: 367
C
Chang‐Soo Lee
H 指数: 61 · 论文数: 1.6K
M
Moon‐Ho Jo
H 指数: 59 · 论文数: 287
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