logo
科言猫学术研究的AI总结
language
手机端手机端
  • Phone Feature微信小程序
简体中文简体中文
notice消息通知
博客博客
delete
arrow
返回
W

Woo‐Hee Kim

tds innovation inc

33H指数
119论文数
3.1K被引数
收录论文 77
发表时间
logo
Thermal atomic layer etching of SnO2 thin films using a chlorination and ligand-addition mechanism采用氯化和配体添加机制的热原子层刻蚀SnO2薄膜
errApplied Surface Science
IF6.9
err2026-10-08
err0
PREAI
errJeongbin Lee; Woo-Hee Kim
err分享
err收藏
Spatially deterministic nucleation of 2D semiconductors by etching flux通过蚀刻流的空间确定性成核制备二维半导体
errNature
IF48.5
err2026-10-07
err0
errOAAI
errJeongwon Park; Jiyun Kim; Sumin Kang; Jieun Oh; Youngmin Sunwoo; Saeyoung Oh; Seunghye Shin; Sera Yang; Seonghwan Jo; Jaehyun Lee; Donghyeop Lee; Minsu Kim; Changhun Eom; Seohyun Jeong; Chan Lim; Gunho Moon; Mingu Kang; Min-gyu Kim; Junhyeok Kim; Chaejeong Yun; Gichang Noh; Donggeon Park; Dongyoung Kim; Seongdae Kwon; Chengyun Hong; Hyeongjin Lim; Minseok Choi; Yongjoon Lee; Joonghoon Choi; Junhyuk Tak; Guanning Shao; Seung Jae Kwak; Tae Soo Kim; Jeehwan Kim; YongJoo Kim; Young Joon Hong; Sung-Yool Choi; Heejun Yang; Jonghwan Kim; Byungjo Kim; Woo-Hee Kim; Chang-Soo Lee; Kibum Kang
err分享
err收藏
Recovering dielectric integrity in atomic layer etched ZrO2 MIM capacitors via post-etch annealing通过后刻蚀退火恢复原子层刻蚀ZrO2 MIM电容器的介电完整性
errApplied Surface Science
IF6.9
err2026-09-30
err0
PREAI
errLee, Jeongbin; Oh, Jiwoo; Kwon, Yongju; Kim, Jung-Tae; Kim, Ji Hwan; Lee, Seung Won; Park, Tae Joo; Ahn, Ji-Hoon; Kim, Woo-Hee
err分享
err收藏
Atomic layer deposition of thermally stable conductive MoOx films using a low-valent precursor for ZrO2-based capacitors使用低价态前驱体通过原子层沉积法制备用于ZrO2基电容器的热稳定导电MoOx薄膜
errApplied Surface Science
IF6.9
err2026-09-24
err0
PREAI
errYongju Kwon; Jungtae Kim; Woohyuk Kim; Donghun Shin; Yongjoo Park; Woo-Hee Kim
err分享
err收藏
High-Performance Top-Gate SnO2 Transistors Enabled by Defect Modulation and Interface Engineering Using Atomic Layer Deposition通过原子层沉积调控缺陷和界面工程实现高性能顶栅SnO2晶体管
errAdvanced Materials Technologies
IF6.2
err2026-09-11
err0
PREAI
errJung-Tae Kim; Ji Hyeon Choi; Jiyeong Yang; Jeongbin Lee; Jiwoo Oh; Ji-Hoon Ahn; Tae Joo Park; Woo-Hee Kim
err分享
err收藏
Interfacial stabilization of ZrO2/Mo2N capacitors via ultrathin Nb2O5 insertion for scaled DRAM applications通过插入超薄Nb2O5层稳定ZrO2/Mo2N电容器界面，用于缩放型DRAM应用
errSurfaces and Interfaces
IF6.3
err2026-09-03
err0
PREAI
errYeon-Ji Jeon; Yoonchul Shin; Ji Hwan Kim; Chan-Bin Hong; Seo-Young Choi; Woo-Hee Kim; Tae Joo Park; Ji-Hoon Ahn
err分享
err收藏
Enhancing oxide/nitride selectivity in area-selective atomic layer deposition via pyridine-catalyzed inhibition通过吡啶催化的抑制来增强区域选择性原子层沉积中的氧化物/氮化物选择性
errSurfaces and Interfaces
IF6.3
err2026-08-15
err0
PREAI
errOh, Jieun; Kim, Woohyuk; Lim, Hyeonggeun; Lee, Soyoung; Kim, Woo-Hee
err分享
err收藏
Catalyzed selective atomic layer deposition of SiO2 on amorphous carbon via silicon blocking by alkyltrichlorosilane self-assembled monolayers通过烷基三氯硅烷自组装单分子层硅封堵催化选择性原子层沉积SiO2于非晶碳上
errApplied Surface Science
IF6.9
err2026-04-17
err0
PREAI
errSeo-Hyun Lee; Chang Mo Yoon; Jeong-Min Lee; Woo-Hee Kim
err分享
err收藏
Atomic-layer-deposited Ru–RuOx mixed protective layer for improving ionic–electronic conductivity of sintered LiCoO2 cathodes in Li-ion batteries原子层沉积的Ru–RuOx混合保护层用于提高烧结LiCoO2正极在锂离子电池中的离子-电子导电性
errj. mater. chem. a
IF0
err2026-04-16
err0
errOAAI
errKyu Moon Kwon; Ji Won Han; Joungwon Park; Kyoung Hwan Kim; Hwi-Yeol Park; Woo-Hee Kim; Ji-Hoon Ahn; Hyo Rang Kang; Tae Joo Park
err分享
err收藏
Thermal atomic layer etching of copper via sequential chlorination and volatility-controlled hydration通过顺序氯化与挥发性控制水合作用实现铜的热原子层刻蚀
errMaterials Horizons
IF10.7
err2026-04-01
err0
PREAI
errLee, Jeongbin; Lee, Dongjun; Oh, Jiwoo; Kim, Jung-Tae; Oh, Jieun; Yoon, Chang Mo; Kim, Woo-Hee
err分享
err收藏
Atomic layer deposition of hafnium silicate thin films using a single source precursor采用单一前驱体的硅酸铪薄膜原子层沉积
errApplied Surface Science
IF6.9
err2026-03-24
err0
PREAI
errJieun Oh; Seo-Hyun Lee; Jeongbin Lee; Chang Mo Yoon; Daeyeong Kim; Yongjoo Park; Woo-Hee Kim
err分享
err收藏
Composition-controlled hafnium-based inorganic/organic hybrid dry photoresist via discrete feeding-molecular layer deposition通过离散式喂料-分子层沉积法制备的组分可控的铪基无机/有机杂化干膜光刻胶
errApplied Surface Science
IF6.9
err2026-03-14
err0
PREAI
errKyungryul Ha; Dong Geun Kim; Hyekyung Kim; Ji-Hoon Ahn; Woo-Hee Kim; Tae Joo Park
err分享
err收藏
Oxidation Dynamics and Surface Chemistry of Iridium and Iridium Oxide Films Grown by Atomic Layer Deposition Using O2 and O3采用原子层沉积法制备的铱和铱氧化物薄膜的氧化动力学与表面化学性质（使用O2和O3）
errSmall
IF12.1
err2025-10-14
err0
errOAAI
errJi Won Han; Jae Woo Jang; Ryosuke Harada; Woo-Hee Kim; Ji-Hoon Ahn; Tae Joo Park
err分享
err收藏
Atomic layer etching of high-k oxide thin films using hexafluoroacetylacetone and oxygen radicals使用六氟乙酰丙酮和氧自由基对高k氧化物薄膜进行原子层刻蚀
errCHEMICAL ENGINEERING JOURNAL
IF13.2
err2025-06-01
err0
PREAI
errLee, Jeongbin; Oh, Jieun; Kim, Jung-Tae; Oh, Jiwoo; Lee, Jeong-Min; Kim, Woo-Hee
err分享
err收藏
Selective metal passivation by vapor-dosed phosphonic acid inhibitors for area-selective atomic layer deposition of SiO2 thin films通过气相剂量的膦酸抑制剂进行选择性金属钝化，用于SiO2薄膜的区域选择性原子层沉积
errNano Convergence
IF11
err2025-05-30
err0
errOAAI
errJeong-Min Lee; Seo-Hyun Lee; Ji Hun Lee; Junghun Kwak; Jinhee Lee; Woo-Hee Kim
err分享
err收藏
Molecular layer deposition of tin-based organic-inorganic hybrid films as photoresists作为光致抗蚀剂的锡基有机-无机杂化薄膜的分子层沉积
errAPPLIED SURFACE SCIENCE
IF6.9
err2025-04-01
err0
PREAI
errKim, Dong Geun; Ha, Kyungryul; Kim, Hyekyung; Kim, Woo-Hee; Park, Tae Joo; Ahn, Ji-Hoon
err分享
err收藏
Advanced Fabrication of Ultrathin Ruthenium Films Using Synergistic Atomic Layer Deposition and Etching采用协同原子层沉积与刻蚀技术制备超薄钌薄膜
errSMALL METHODS
IF9.1
err2025-03-21
err1
PREAI
errJeongbin Lee; Jung-Tae Kim; Jieun Oh; Dongjun Lee; Seo-Hyun Lee; Hyekyung Kim; Jiwoo Oh; Younseon Wang; Woo-Hee Kim
err分享
err收藏
Area-selective deposition of mos2 using self-assembled monolayers for high-precision patterning利用自组装单分子层进行MoS2的区域选择性沉积以实现高精度图案化
errMATERIALS LETTERS
IF2.7
err2025-03-01
err0
PREAI
errChoi, Jeong-Hun; Kim, Dong Geun; Lee, Seo-Hyun; Choi, Kang; Kim, Woo-Hee; Yoon, Chang Mo; Ahn, Ji-Hoon
err分享
err收藏
High-temperature atomic layer deposition of HfO2 film with low impurity using a novel Hf precursor
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2025-01-01
err0
PREAI
errPark, Jae Chan; Choi, Chang Ik; Jeon, Woong Pyo; Van, Tran Thi Ngoc; Kim, Woo-Hee; Ahn, Ji-Hoon; Shong, Bonggeun; Park, Tae Joo
err分享
err收藏
Enhanced Deposition Selectivity of High-k Dielectrics by Vapor Dosing and Selective Removal of Phosphonic Acid Inhibitors
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2024-07-01
err0
PREAI
errLee, Jeong-Min; Lee, Seo-Hyun; Lee, Ji Hun; Kwak, Junghun; Lee, Jinhee; Kim, Woo-Hee
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
J
Jong‐Hyun Ahn
H 指数: 90 · 论文数: 396
S
Stacey F. Bent
H 指数: 81 · 论文数: 431
W
W. M. M. Kessels
H 指数: 81 · 论文数: 617
D
David Thompson
H 指数: 79 · 论文数: 1.1K
Z
Zonghoon Lee
H 指数: 66 · 论文数: 307
查看更多