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J

Jón Tómas Guðmundsson

uk research & innovation (ukri)

48H指数
267论文数
9.9K被引数
收录论文 95
发表时间
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High power impulse magnetron sputtering from a chromium target高功率脉冲磁控溅射铬靶材
errPlasma Sources Science and Technology
IF3.3
err2026-02-20
err0
errOAAI
errKateryna Barynova; Tetsuhide Shimizu; Rommel Paulo B Viloan; Michal Zanáška; Joel Fischer; Martin Rudolph; Daniel Lundin; Jon Tomas Gudmundsson
err分享
err收藏
An ionisation region model of reactive high-power impulse magnetron sputtering of Ti in an Ar/N2 atmosphere高功率脉冲反应磁控溅射Ti在Ar/N2气氛中的电离区域模型
errPlasma Sources Science and Technology
IF3.3
err2026-02-20
err0
errOAAI
errJ Fischer; J T Gudmundsson; M Rudolph; M A Raadu; D Lundin
err分享
err收藏
An online data analysis framework for small-scale physics experiments针对小规模物理实验的在线数据分析框架
errNUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
IF1.4
err2026-01-01
err0
errOAAI
errRamm, H.; Simon, P.; Alexaki, P.; Arran, C.; Bingham, R.; Goillot, A.; Gudmundsson, J. T.; Halliday, J. W. D.; Lloyd, B.; Los, E. E.; Stergiou, V.; Zhang, S.; Gregori, G.; Charitonidis, N.
err分享
err收藏
Striations in electronegative capacitive chlorine discharges: effects of pressure, frequency, voltage and secondary electron emission
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2025-04-01
err0
PREAI
errMahdavipour, Bahram; Gudmundsson, Jon Tomas
err分享
err收藏
On working gas rarefaction in high power impulse magnetron sputtering大功率冲动磁控溅射中工作气体的稀薄
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-06-18
err2
errOAAI
errBarynova, Kateryna; Rudolph, Martin; Suresh Babu, Swetha; Fischer, Joel; Lundin, Daniel; Raadu, Michael A.; Brenning, Nils; Gudmundsson, Jon Tomas
err分享
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On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine discharge
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-06-12
err2
errOAAI
errMahdavipour, B.; Gudmundsson, J. T.
err分享
err收藏
Laboratory realization of relativistic pair-plasma beams
errNATURE COMMUNICATIONS
IF15.7
err2024-06-12
err1
errOAAI
errArrowsmith, C. D.; Simon, P.; Bilbao, P. J.; Bott, A. F. A.; Burger, S.; Chen, H.; Cruz, F. D.; Davenne, T.; Efthymiopoulos, I.; Froula, D. H.; Goillot, A.; Gudmundsson, J. T.; Haberberger, D.; Halliday, J. W. D.; Hodge, T.; Huffman, B. T.; Iaquinta, S.; Miniati, F.; Reville, B.; Sarkar, S.; Schekochihin, A. A.; Silva, L. O.; Simpson, R.; Stergiou, V.; Trines, R. M. G. M.; Vieu, T.; Charitonidis, N.; Bingham, R.; Gregori, G.
err分享
err收藏
Field reversal in low pressure, unmagnetized radio frequency capacitively coupled argon plasma discharges低压，未磁化的射频电容耦合氩等离子体放电中的场反转
errAPPLIED PHYSICS LETTERS
IF3.6
err2023-12-27
err3
PREAI
errWen, De-Qi; Krek, Janez; Gudmundsson, Jon Tomas; Kawamura, Emi; Lieberman, Michael A.; Zhang, Peng; Verboncoeur, John P.
err分享
err收藏
Insights into the copper HiPIMS discharge: deposition rate and ionised flux fraction
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-12-18
err6
errOAAI
errFischer, J.; Renner, M.; Gudmundsson, J. T.; Rudolph, M.; Hajihoseini, H.; Brenning, N.; Lundin, D.
err分享
err收藏
Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering discharges
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-07-28
err3
PREAI
errAntunes, V. G.; Rudolph, M.; Kapran, A.; Hajihoseini, H.; Raadu, M. A.; Brenning, N.; Gudmundsson, J. T.; Lundin, D.; Minea, T.
err分享
err收藏
On the importance of excited state species in low pressure capacitively coupled plasma argon discharges关于激发态物种在低压电容耦合等离子体氩放电中的重要性
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-06-12
err18
errOAAI
errWen, De-Qi; Krek, Janez; Gudmundsson, Jon Tomas; Kawamura, Emi; Lieberman, Michael A.; Zhang, Peng; Verboncoeur, John P.
err分享
err收藏
Epitaxial growth and characterization of (001) [NiFe/M]20 (M = Cu, CuPt and Pt) superlattices(001) [NiFe/M]20 (M = Cu，CuPt和Pt) 超晶格的外延生长和表征
errSURFACES AND INTERFACES
IF6.3
err2023-06-01
err0
errOAAI
errKateb, Movaffaq; Gudmundsson, Jon Tomas; Ingvarsson, Snorri
err分享
err收藏
High power impulse magnetron sputtering of tungsten: a comparison of experimental and modelling results钨的高功率冲动磁控溅射: 实验和建模结果的比较
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-03-20
err5
errOAAI
errBabu, Swetha Suresh; Rudolph, Martin; Ryan, Peter John; Fischer, Joel; Lundin, Daniel; Bradley, James W.; Gudmundsson, Jon Tomas
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err收藏
Foundations of physical vapor deposition with plasma assistance等离子体辅助物理气相沉积的基础
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2022-09-19
err63
errOAAI
errGudmundsson, Jon Tomas; Anders, Andre; von Keudell, Achim
err分享
err收藏
Ionization region model of high power impulse magnetron sputtering of copper大功率冲动磁控溅射铜的电离区模型
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2022-07-01
err25
errOAAI
errGudmundsson, J. T.; Fischer, J.; Hinriksson, B. P.; Rudolph, M.; Lundin, D.
err分享
err收藏
Modeling of high power impulse magnetron sputtering discharges with tungsten target钨靶高功率冲动磁控溅射放电的建模
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2022-06-29
err10
errOAAI
errBabu, Swetha Suresh; Rudolph, Martin; Lundin, Daniel; Shimizu, Tetsuhide; Fischer, Joel; Raadu, Michael A.; Brenning, Nils; Gudmundsson, Jon Tomas
err分享
err收藏
Surface effects in a capacitive argon discharge in the intermediate pressure regime在中压状态下电容式氩气放电中的表面效应
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2022-01-10
err17
errOAAI
errGudmundsson, J. T.; Krek, Janez; De-Qi Wen; Kawamura, E.; Lieberman, M. A.
err分享
err收藏
Modeling of high power impulse magnetron sputtering discharges with graphite target石墨靶高功率冲动磁控溅射放电的模拟
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2021-11-30
err13
errOAAI
errEliasson, H.; Rudolph, M.; Brenning, N.; Hajihoseini, H.; Zanaska, M.; Adriaans, M. J.; Raadu, M. A.; Minea, T. M.; Gudmundsson, J. T.; Lundin, D.
err分享
err收藏
On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulation关于离子势能在低能HiPIMS沉积中的作用: 原子模拟
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2021-11-01
err9
errOAAI
errKateb, Movaffaq; Gudmundsson, Jon Tomas; Brault, Pascal; Manolescu, Andrei; Ingvarsson, Snorri
err分享
err收藏
Benchmarked and upgraded particle-in-cell simulations of a capacitive argon discharge at intermediate pressure: the role of metastable atoms在中压下电容性氩放电的基准和升级的单元内粒子模拟: 亚稳态原子的作用
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2021-10-12
err35
PREAI
errWen, De-Qi; Krek, Janez; Gudmundsson, Jon Tomas; Kawamura, Emi; Lieberman, Michael A.; Verboncoeur, John P.
err分享
err收藏

研究方向

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合作学者
合作期刊
T
T. B. Huffman
H 指数: 144 · 论文数: 2.1K
M
M. A. Lieberman
H 指数: 74 · 论文数: 500
A
André Anders
H 指数: 69 · 论文数: 558
U
Ulf Helmersson
H 指数: 59 · 论文数: 290
A
A. A. Schekochihin
H 指数: 56 · 论文数: 368
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