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Shota Nunomura

National Institute of Advanced Industrial Science and Technology

30H指数
124论文数
2.6K被引数
收录论文 26
发表时间
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Atomic layer oxidation of silicon by O2 plasma: Initial oxidation and surface passivationO2等离子体对硅的原子层氧化：初始氧化和表面钝化
errApplied Surface Science
IF6.9
err2026-09-30
err1
PREAI
errNunomura, Shota; Kamataki, Kunihiro; Matsuzaki, Kosuke; Shiratani, Masaharu
err分享
err收藏
Cryogenic HF plasma etching of SiO2: Etchant penetration, reactions, and damage formation低温HF等离子体刻蚀SiO2：刻蚀剂渗透、反应及损伤形成
errApplied Surface Science
IF6.9
err2026-08-31
err0
PREAI
errShota Nunomura; Yusuke Imai; Shih-Nan Hsiao; Takayoshi Tsutsumi; Masaru Hori
err分享
err收藏
Impact of excess oxygen on electrical characteristics and bias stability in plasma-enhanced atomic layer deposition ultrathin InOx FETs过量氧气对等离子体增强原子层沉积超薄InOx FETs电学特性和偏压稳定性的影响
errJapanese Journal of Applied Physics
IF1.8
err2026-04-17
err0
PREAI
errChen, Chia-Tsong; Toprasertpong, Kasidit; Irisawa, Toshifumi; Nunomura, Shota; Migita, Shinji; Chang, Wen Hsin; Nishino, Ryutaro; Morita, Yukinori; Ota, Hiroyuki; Maeda, Tatsuro
err分享
err收藏
SiO2 etch-damage mitigation in fluorocarbon C 4F 8 plasma: CF x polymer deposition and polyatomic ion effectsSiO2刻蚀损伤缓解在氟碳C4F8等离子体中：CFx聚合物沉积和多原子离子效应
errApplied Surface Science
IF6.9
err2025-08-07
err0
PREAI
errShota Nunomura; Takayoshi Tsutsumi; Masaru Hori
err分享
err收藏
SiO2/Si stack's damage in plasma processing: Ar, O2, and H2 gas species effect on damage formation, structure, and recoverySiO2/Si堆叠结构在等离子体处理中的损伤：Ar、O2和H2气体种类对损伤形成、结构和恢复的影响
errSURFACES AND INTERFACES
IF6.3
err2025-04-01
err0
PREAI
errNunomura, Shota; Tsutsumi, Takayoshi; Kamataki, Kunihiro; Oshima, Ryuji; Shiratani, Masaharu; Hori, Masaru
err分享
err收藏
SiO2/Si interface defects in HKMG stack fabrication
errSURFACES AND INTERFACES
IF6.3
err2025-01-01
err1
PREAI
errNunomura, Shota; Morita, Yukinori
err分享
err收藏
Radical, ion, and photon's effects on defect generation at SiO2/Si interface during plasma etching
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-11-01
err5
PREAI
errNunomura, Shota; Tsutsumi, Takayoshi; Takada, Noriharu; Fukasawa, Masanaga; Hori, Masaru
err分享
err收藏
Carrier trapping in diamond Schottky barrier diode
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-02-15
err1
PREAI
errNunomura, Shota; Sakata, Isao; Nishida, Taiki; Ohmagari, Shinya
err分享
err收藏
Nanostructure and doping effects of a-Si:H and μc-Si:H anode in lithium-ion battery performanceA-si: H和 μc-si: H负极的纳米结构及其掺杂对锂离子电池性能的影响
errMATERIALS LETTERS
IF2.7
err2023-10-01
err2
PREAI
errNunomura, Shota; Uchida, Giichiro
err分享
err收藏
A review of plasma-induced defects: detection, kinetics and advanced management
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2023-06-08
err18
errOAAI
errNunomura, Shota
err分享
err收藏
Plasma Synthesis of Silicon Nanoparticles: From Molecules to Clusters and Nanoparticle Growth
errIEEE OPEN JOURNAL OF NANOTECHNOLOGY
IF1.9
err2022-01-01
err3
PREAI
errNunomura, Shota; Kamataki, Kunihiro; Nagai, Takehiko; Misawa, Tatsuya; Kawai, Shinji; Takenaka, Kosuke; Uchida, Giichiro; Koga, Kazunori
err分享
err收藏
Passivating antireflection coating of crystalline silicon using i/n a-Si:H/SiN trilayer
errJOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS
IF4.9
err2021-09-01
err10
PREAI
errNunomura, Shota; Sakata, Isao; Sato, Aiko; Lozac'h, Mickael; Misawa, Tatsuya; Itagaki, Naho; Shiratani, Masaharu
err分享
err收藏
Role of silicon surface, polished ⟨100⟩ and ⟨111⟩ or textured, on the efficiency of double-sided TOPCon solar cells
errPROGRESS IN PHOTOVOLTAICS
IF7.6
err2020-06-25
err26
PREAI
errLozac'h, Mickael; Nunomura, Shota
err分享
err收藏
Double-sided TOPCon solar cells on textured wafer with ALD SiOx layer
errSOLAR ENERGY MATERIALS AND SOLAR CELLS
IF6.3
err2020-04-01
err54
PREAI
errLozac'h, Mickael; Nunomura, Shota; Matsubara, Koji
err分享
err收藏
Plasma-Induced Electronic Defects: Generation and Annihilation Kinetics in Hydrogenated Amorphous Silicon
errPHYSICAL REVIEW APPLIED
IF4.4
err2018-11-02
err34
PREAI
errNunomura, Shota; Sakata, Isao; Matsubara, Koji
err分享
err收藏
Passivation property of ultrathin SiOx:H / a-Si:H stack layers for solar cell applications
errSOLAR ENERGY MATERIALS AND SOLAR CELLS
IF6.3
err2018-10-01
err35
PREAI
errLozac'h, Mickael; Nunomura, Shota; Sai, Hitoshi; Matsubara, Koji
err分享
err收藏
Hydrogen atom kinetics in capacitively coupled plasmas
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2017-04-05
err17
PREAI
errNunomura, Shota; Katayama, Hirotaka; Yoshida, Isao
err分享
err收藏
Impact of band tail distribution on carrier trapping in hydrogenated amorphous silicon for solar cell applications
errJOURNAL OF NON-CRYSTALLINE SOLIDS
IF3.5
err2016-03-01
err21
PREAI
errNunomura, S.; Sakata, I.; Matsubara, K.
err分享
err收藏
Charge Trapping in Mixed Organic Donor-Acceptor Semiconductor Thin Films
errADVANCED MATERIALS
IF26.8
err2014-10-22
err20
errOAAI
errNunomura, Shota; Che, Xiaozhou; Forrest, Stephen R.
err分享
err收藏
Mie scattering enhanced near-infrared light response of thin-film silicon solar cells
errAPPLIED PHYSICS LETTERS
IF3.6
err2010-08-10
err43
PREAI
errNunomura, S.; Minowa, A.; Sai, H.; Kondo, M.
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
S
Stephen R. Forrest
H 指数: 154 · 论文数: 1.3K
M
Michio Kondo
H 指数: 64 · 论文数: 845
M
Masaru Hori
H 指数: 62 · 论文数: 1.2K
K
Koji Matsubara
H 指数: 47 · 论文数: 323
Y
Yukio Watanabe
H 指数: 47 · 论文数: 911
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