Masaru Hori

Tohoku University

H指数:62

被引数:1.7万

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Carbon-deposited hexagonal boron nitride filler orientational state evaluation in polyrotaxane composites via electron spin resonance

碳沉积六方氮化硼填料在聚轮烷复合材料中的取向状态评估通过电子顺磁共振

Chemical Physics Letters

IF3.1

2026-09-010

PRE

Thermal-cyclic etching of SiGe with selective removal over Ge using fluorocarbon-based plasma and infrared heating

使用氟碳基等离子体和红外加热对SiGe进行热循环刻蚀，并选择性去除Ge

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

IF2.1

2026-03-011

PRE

Cryogenic-Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra-High Selectivity of Atomic Layer Etching Between SiO2 and SiN

低温辅助氢氟酸表面反应实现SiO2和SiN之间原子层刻蚀的可逆超高选择性

SMALL METHODS

IF9.1

2025-11-010

OAAI

The Effect of Electrical Stimulation on the Cellular Response of Human Mesenchymal Stem Cells Grown on Silicon Carbide-Coated Carbon Nanowall Scaffolds

电刺激对生长在碳化硅涂层碳纳米墙支架上的人间充质干细胞细胞反应的影响

Bioengineering 2025, Vol. 12, Page 1073

IF3.7

2025-10-020

OAAI

Effect of Non-Thermal Plasma on the Interface Between Skin and Surface Electrodes for Biological Signal Measurement

非热等离子体对生物信号测量中皮肤与表面电极界面的影响

PLASMA PROCESSES AND POLYMERS

IF2.9

2025-09-010

PRE

SiO2 etch-damage mitigation in fluorocarbon C 4F 8 plasma: CF x polymer deposition and polyatomic ion effects

SiO2刻蚀损伤缓解在氟碳C4F8等离子体中：CFx聚合物沉积和多原子离子效应

Applied Surface Science

IF6.9

2025-08-070

PRE

SiO2/Si stack's damage in plasma processing: Ar, O2, and H2 gas species effect on damage formation, structure, and recovery

SiO2/Si堆叠结构在等离子体处理中的损伤：Ar、O2和H2气体种类对损伤形成、结构和恢复的影响

SURFACES AND INTERFACES

IF6.3

2025-04-010

PRE

New era of plasma dentistry

FREE RADICAL RESEARCH

IF2.9

2024-12-270

PRE

Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by radical-enhanced metalorganic chemical vapor deposition (vol 14, 10861, 2024)

SCIENTIFIC REPORTS

IF3.9

2024-12-200

OAAI

Direct plasma treatment of caryopses after flowering in brewer's rice cultivar Yamadanishiki enhanced those grain qualities through Smart Agriculture System

SCIENTIFIC REPORTS

IF3.9

2024-11-270

OAAI

Radical, ion, and photon's effects on defect generation at SiO2/Si interface during plasma etching

APPLIED SURFACE SCIENCE

IF6.9

2024-11-015

PRE

Sputtering deposition of dense and low-resistive amorphous In2O3: Sn films under ZONE-T conditions of Thornton's structural diagram

APPLIED PHYSICS LETTERS

IF3.6

2024-06-100

PRE

Low-temperature growth at 225 °C and characterization of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition

VACUUM

IF3.9

2024-06-012

PRE

Surface surgery on TiNb2O7 electrode via N2/Air atmospheric pressure plasma jet for high-rate lithium-ion battery anode

通过N2/Air大气压等离子体射流在TiNb2O7电极上进行表面手术，用于高倍率锂离子电池阳极

APPLIED SURFACE SCIENCE

IF6.9

2024-05-010

PRE

Elaborate cooperation of poly(rC)-binding proteins 1/2 and glutathione in ferroptosis induced by plasma-activated Ringer's lactate

FREE RADICAL BIOLOGY AND MEDICINE

IF8.2

2024-03-016

OAAI

Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching

APPLIED SURFACE SCIENCE

IF6.9

2024-02-011

OAAI

Oxygen radical irradiation transforms an organic fertilizer L-tryptophan into an environment and human-friendly bactericide

ENVIRONMENTAL TECHNOLOGY & INNOVATION

IF7.1

2024-02-012

OAAI

Hydrogen peroxide sensing with nitrogen-doped carbon nanowalls

SENSING AND BIO-SENSING RESEARCH

IF4.9

2024-02-011

OAAI

Etching Mechanism Based on Hydrogen Fluoride Interactions with Hydrogenated SiN Films Using HF/H2 and CF4/H2 Plasmas

ACS APPLIED ELECTRONIC MATERIALS

IF4.7

2023-12-1214

PRE

An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases

APPLIED PHYSICS LETTERS

IF3.6

2023-11-2111

PRE

Masaru Hori

个人简介

教育背景

工作经历

荣誉奖项

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