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M

Masaru Hori

Nagoya University

62H指数
1.2K论文数
1.8W被引数
收录论文 155
发表时间
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Thermal-cyclic etching of SiGe with selective removal over Ge using fluorocarbon-based plasma and infrared heating使用氟碳基等离子体和红外加热对SiGe进行热循环刻蚀，并选择性去除Ge
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-03-01
err1
PREAI
errShinoda, Kazunori; Nguyen, Thi-Thuy-Nga; Yokogawa, Kenetsu; Izawa, Masaru; Ishikawa, Kenji; Hori, Masaru
err分享
err收藏
Cryogenic-Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra-High Selectivity of Atomic Layer Etching Between SiO2 and SiN低温辅助氢氟酸表面反应实现SiO2和SiN之间原子层刻蚀的可逆超高选择性
errSMALL METHODS
IF9.1
err2025-11-01
err0
errOAAI
errHsiao, Shih-Nan; Sekine, Makoto; Suda, Ryutaro; Kihara, Yoshihide; Hori, Masaru
err分享
err收藏
The Effect of Electrical Stimulation on the Cellular Response of Human Mesenchymal Stem Cells Grown on Silicon Carbide-Coated Carbon Nanowall Scaffolds电刺激对生长在碳化硅涂层碳纳米墙支架上的人间充质干细胞细胞反应的影响
errBioengineering 2025, Vol. 12, Page 1073
IF3.7
err2025-10-02
err0
errOAAI
errKoki Ono; Ayako Tanaka; Kenji Ishikawa; Wakana Takeuchi; Kenichi Uehara; Shigeo Yasuhara; Masaru Hori; Hiromasa Tanaka
err分享
err收藏
Effect of Non-Thermal Plasma on the Interface Between Skin and Surface Electrodes for Biological Signal Measurement非热等离子体对生物信号测量中皮肤与表面电极界面的影响
errPLASMA PROCESSES AND POLYMERS
IF2.9
err2025-09-01
err0
PREAI
errEsaki, Tatsuhiro; Suzuki, Akane; Shinozaki, Yukino; Nomura, Kenichi; Kagawa, Yuki; Yamada, Maho; Nakamura, Kae; Tanaka, Hiromasa; Toyokuni, Shinya; Hori, Masaru; Mizuno, Masaaki
err分享
err收藏
SiO2 etch-damage mitigation in fluorocarbon C 4F 8 plasma: CF x polymer deposition and polyatomic ion effectsSiO2刻蚀损伤缓解在氟碳C4F8等离子体中：CFx聚合物沉积和多原子离子效应
errApplied Surface Science
IF6.9
err2025-08-07
err0
PREAI
errShota Nunomura; Takayoshi Tsutsumi; Masaru Hori
err分享
err收藏
SiO2/Si stack's damage in plasma processing: Ar, O2, and H2 gas species effect on damage formation, structure, and recoverySiO2/Si堆叠结构在等离子体处理中的损伤：Ar、O2和H2气体种类对损伤形成、结构和恢复的影响
errSURFACES AND INTERFACES
IF6.3
err2025-04-01
err0
PREAI
errNunomura, Shota; Tsutsumi, Takayoshi; Kamataki, Kunihiro; Oshima, Ryuji; Shiratani, Masaharu; Hori, Masaru
err分享
err收藏
New era of plasma dentistry
errFREE RADICAL RESEARCH
IF2.9
err2024-12-27
err0
PREAI
errSato, Kotaro; Tanaka, Hiromasa; Okazaki, Yasumasa; Hori, Masaru; Hibi, Hideharu; Toyokuni, Shinya
err分享
err收藏
Epitaxial growth of high-quality GaN with a high growth rate at low temperatures by radical-enhanced metalorganic chemical vapor deposition (vol 14, 10861, 2024)
errSCIENTIFIC REPORTS
IF3.9
err2024-12-20
err0
errOAAI
errDhasiyan, Arun Kumar; Amalraj, Frank Wilson; Jayaprasad, Swathy; Shimizu, Naohiro; Oda, Osamu; Ishikawa, Kenji; Hori, Masaru
err分享
err收藏
Direct plasma treatment of caryopses after flowering in brewer's rice cultivar Yamadanishiki enhanced those grain qualities through Smart Agriculture System
errSCIENTIFIC REPORTS
IF3.9
err2024-11-27
err0
errOAAI
errHashizume, Hiroshi; Kitano, Hidemi; Mizuno, Hiroko; Abe, Akiko; Hsiao, Shih-Nan; Yuasa, Genki; Tohno, Satoe; Tanaka, Hiromasa; Matsumoto, Shogo; Sakakibara, Hitoshi; Kita, Eisuke; Hirosue, Yoji; Maeshima, Masayoshi; Mizuno, Masaaki; Hori, Masaru
err分享
err收藏
Radical, ion, and photon's effects on defect generation at SiO2/Si interface during plasma etching
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-11-01
err5
PREAI
errNunomura, Shota; Tsutsumi, Takayoshi; Takada, Noriharu; Fukasawa, Masanaga; Hori, Masaru
err分享
err收藏
Sputtering deposition of dense and low-resistive amorphous In2O3: Sn films under ZONE-T conditions of Thornton's structural diagram
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-06-10
err0
PREAI
errWada, Yoshiharu; Magdy, Wafaa; Takeda, Keigo; Mido, Yuta; Yamashita, Naoto; Okumura, Takamasa; Kamataki, Kunihiro; Koga, Kazunori; Hori, Masaru; Shiratani, Masaharu; Itagaki, Naho
err分享
err收藏
Low-temperature growth at 225 °C and characterization of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition
errVACUUM
IF3.9
err2024-06-01
err2
PREAI
errMinh, Ngo Quang; Van Nong, Ngo; Oda, Osamu; Ishikawa, Kenji; Hori, Masaru
err分享
err收藏
Surface surgery on TiNb2O7 electrode via N2/Air atmospheric pressure plasma jet for high-rate lithium-ion battery anode通过N2/Air大气压等离子体射流在TiNb2O7电极上进行表面手术，用于高倍率锂离子电池阳极
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-05-01
err0
PREAI
errWu, Che-Ya; Hsiao, Shih-Nan; Kuo, Rui-Tung; Chen, Yu -Ching; Lin, Tzu-Ying; Hori, Masaru; Duh, Jenq-Gong
err分享
err收藏
Elaborate cooperation of poly(rC)-binding proteins 1/2 and glutathione in ferroptosis induced by plasma-activated Ringer's lactate
errFREE RADICAL BIOLOGY AND MEDICINE
IF8.2
err2024-03-01
err6
errOAAI
errJiang, Li; Zheng, Hao; Ishida, Moe; Lyu, Qinying; Akatsuka, Shinya; Motooka, Yashiro; Sato, Kotaro; Sekido, Yoshitaka; Nakamura, Kae; Tanaka, Hiromasa; Ishikawa, Kenji; Kajiyama, Hiroaki; Mizuno, Masaaki; Hori, Masaru; Toyokuni, Shinya
err分享
err收藏
Surface sulfurization of amorphous carbon films in the chemistry of oxygen plasma added with SO2 or OCS for high-aspect-ratio etching
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-02-01
err1
errOAAI
errIshikawa, Kenji; Nguyen, Thi-Thuy-Nga; Aoki, Yuta; Sato, Hiroyasu; Kawakami, Junichi; Tsuno, Shuji; Hsiao, Shih-Nan; Hori, Masaru
err分享
err收藏
Oxygen radical irradiation transforms an organic fertilizer L-tryptophan into an environment and human-friendly bactericide
errENVIRONMENTAL TECHNOLOGY & INNOVATION
IF7.1
err2024-02-01
err2
errOAAI
errIwata, Naoyuki; Ishikawa, Kenji; Nishikawa, Yasuhiro; Kato, Hiroyuki; Shimizu, Motoyuki; Kato, Masashi; Tanaka, Hiromasa; Ito, Masafumi; Hori, Masaru
err分享
err收藏
Hydrogen peroxide sensing with nitrogen-doped carbon nanowalls
errSENSING AND BIO-SENSING RESEARCH
IF4.9
err2024-02-01
err1
errOAAI
errZhumadilov, Rakhymzhan Ye.; Yerlanuly, Yerassyl; Kondo, Hiroki; Nemkayeva, Renata R.; Ramazanov, Tlekkabul S.; Hori, Masaru; Gabdullin, Maratbek T.
err分享
err收藏
Etching Mechanism Based on Hydrogen Fluoride Interactions with Hydrogenated SiN Films Using HF/H2 and CF4/H2 Plasmas
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2023-12-12
err14
PREAI
errHsiao, Shih-Nan; Britun, Nikolay; Nguyen, Thi-Thuy-Nga; Sekine, Makoto; Hori, Masaru
err分享
err收藏
An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases
errAPPLIED PHYSICS LETTERS
IF3.6
err2023-11-21
err11
PREAI
errHsiao, Shih-Nan; Sekine, Makoto; Ishikawa, Kenji; Iijima, Yuki; Ohya, Yoshinobu; Hori, Masaru
err分享
err收藏
Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF6根据交替注入C4F8和SF6的Ar等离子体中硅沟槽蚀刻的纵横比依赖性定制的偏置电源时序
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-11-01
err4
errOAAI
errYoshie, Taito; Ishikawa, Kenji; Nguyen, Thi-Thuy-Nga; Hsiao, Shih-Nan; Tsutsumi, Takayoshi; Sekine, Makoto; Hori, Masaru
err分享
err收藏

研究方向

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合作学者
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Annemie Bogaerts
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