K. L. Saenger - Publications, H-index & Citations

K. L. Saenger

international business machines (ibm)

32H指数

144论文数

3.9K被引数

收录论文 8

发表时间

Single Crystal Flexible Electronics Enabled by 3D Spalling

ADVANCED MATERIALS

IF26.8

2017-02-23

PREAI

Li, Ning; Bedell, Stephen; Hu, Huan; Han, Shu-Jen; Liu, Xiao Hu; Saenger, Katherine; Sadana, Devendra

In situ x-ray diffraction study of graphitic carbon formed during heating and cooling of amorphous-C/Ni bilayers 非晶态C/Ni双层加热和冷却过程中形成的石墨碳的原位x射线衍射研究

APPLIED PHYSICS LETTERS

IF3.6

2010-04-15

OAAI

Saenger, K. L.; Tsang, J. C.; Bol, A. A.; Chu, J. O.; Grill, A.; Lavoie, C.

Effects of patterned, stressed SiN overlayers on Si solid phase epitaxy

APPLIED PHYSICS LETTERS

IF3.6

2008-03-24

PREAI

Saenger, K. L.; Fogel, K. E.; Ott, J. A.; de Souza, J. P.; Murray, C. E.

Mixed orientation Si-Si interfaces by hydrophilic bonding and high temperature oxide dissolution

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2008-01-01

PREAI

Saenger, K. L.; de Souza, J. P.; Fogel, K.; Ott, J. A.; Reznicek, A.; Yin, H.; Sung, C. Y.; Sadana, D. K.

Amorphization/templated recrystallization method for changing the orientation of single-crystal silicon: An alternative approach to hybrid orientation substrates

APPLIED PHYSICS LETTERS

IF3.6

2005-11-23

PREAI

Saenger, KL; de Souza, JP; Fogel, KE; Ott, JA; Reznicek, A; Sung, CY; Sadana, DK; Yin, H

Submicrometer platinum electrodes by through-mask plating

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2001-01-01

PREAI

Saenger, KL; Costrini, G; Kotecki, DE; Kwietniak, KT; Andricacos, PC

Effects of annealing conditions on charge loss mechanisms in MOCVD Ba0.7Sr0.3TiO3 thin film capacitors

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY

IF6.2

1999-06-01

OAAI

Baniecki, JD; Laibowitz, RB; Shaw, TM; Saenger, KL; Duncombe, PR; Cabral, C; Kotecki, DE; Shen, H; Lian, J; Ma, QY

Low temperature formation of C54-TiSi2 using titanium alloys

APPLIED PHYSICS LETTERS

IF3.6

1997-12-15

PREAI

Cabral, C; Clevenger, LA; Harper, JME; dHeurle, FM; Roy, RA; Lavoie, C; Saenger, KL; Miles, GL; Mann, RW; Nakos, JS

研究方向