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G

G.Y. Yeom

sungkyunkwan university

32H指数
294论文数
3.5K被引数
收录论文 77
发表时间
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Hydrogen Peroxide-Enabled High-Quality Transition Interface for Top-Gated Molybdenum Disulfide Field-Effect Transistors过氧化氢辅助的高质量过渡界面在顶栅二硫化钼场效应晶体管中的应用
errACS Nano
IF16
err2026-06-12
err0
PREAI
errMinjong Lee; Thi Thu Huong Chu; Si Eun Yu; Doo San Kim; Dan N. Le; Inhong Hwang; Dushyant M. Narayan; Soham Shirodkar; Sihoon Son; Ji Eun Kang; Hyunbin Choi; Sun Jae Jeong; Rino Choi; Taesung Kim; Geun Young Yeom; Robert M. Wallace; Jiyoung Kim
err分享
err收藏
Machine learning-guided optimization of atomic layer deposition process机器学习引导的原子层沉积工艺优化
errCommunications Materials
IF9.6
err2026-06-09
err0
errOAAI
errMinjong Lee; Doo San Kim; Thi Thu Huong Chu; Dushyant M. Narayan; Dan N. Le; Soubhik De; Soham Shirodkar; Seungbin Lee; Sihoon Son; Ji Eun Kang; Hyunbin Choi; Sun Jae Jeong; Taesung Kim; Geun Young Yeom; Si Joon Kim; Jiyoung Kim
err分享
err收藏
Nonuniform Silicon Backside Edge-to-Center Plasma Thinning Process Using Low Global Warming Potential Gas for High Bandwidth Memory (HBM)采用低全球变暖潜势气体的非均匀硅背面边缘到中心等离子体减薄工艺（用于高带宽内存HBM）
errPlasma Processes and Polymers
IF2.9
err2026-04-06
err0
errOAAI
errJong Woo Hong; Chan Ho Kim; Eun Bi Koh; Joo Hyung Lee; Min Ho Hwang; Yong Jae Song; Seon Kyu Kim; Jong Soon Park; Hyun Bong Jang; Young Woo Jeon; Jun Won Jeong; Hyeong Joon Eoh; Sung Hyun Kim; Kyung Lim Kim; Eun Koo Kim; Geun Young Yeom
err分享
err收藏
Isotropic Thermal Atomic Layer Etching of 2D MoS2 Using Formic Acid Vapor
errSurfaces and Interfaces
IF6.3
err2026-01-24
err0
PREAI
errHyewon Han; Jieun Kang; Jimin Kim; Sunjae Jeong; Siyeon Kim; Gahee Oh; Dahun Ko; Sihoon Son; Hyunbin Choi; Doosan Kim; Minjong Lee; Taesung Kim; Jiyoung Kim; Geunyoung Yeom
err分享
err收藏
SiON Etch Characteristics Using Low-GWP C2F4O as a Replacement of CF4使用低GWP C2F4O替代CF4的SiON刻蚀特性
errACS Sustainable Chemistry and Engineering
IF7.3
err2026-01-05
err0
PREAI
errSeul Ki Kim; Jun Soo Lee; Hyun Woo Tak; Akihide Sato; Chan Hyuk Choi; Myeong Ho Park; Jong Woo Hong; Bong Sun Kim; Eun Koo Kim; Sung Taek Kim; Dong Woo Kim; Yong Il Kim; Geun Young Yeom
err分享
err收藏
Fabrication of Ta/TaN diffusion-barrier thin films using DC magnetron sputtering采用直流磁控溅射法制备Ta/TaN扩散阻挡层薄膜
errTHIN SOLID FILMS
IF2
err2025-11-01
err0
PREAI
errJeong, Byeong Hwa; Kim, Dong Woo; Lee, So Hyun; Kang, Chae Hyun; Long, Wen; Oh, Do Hyun; Jang, Yong Seok; Aoyagi, Toshiya; Taura, Yasuyuki; Kokaze, Yutaka; Lee, Eung Joon; Lee, Sang Ho; Yeom, Geun Young
err分享
err收藏
From N-type doping to phase transition in large-area MoS2via controlled sulfur vacancy formation从N型掺杂到大面积mos2中的相变通过控制硫空位的形成
errNANOSCALE
IF5.1
err2025-10-01
err0
PREAI
errKim, Jimin; Kang, Jieun; Han, Hyewon; Jeong, Sunjae; Kim, Siyeon; Lee, Heesoo; Kim, Hyoungsub; Kim, Yongil; Yeom, Geunyoung
err分享
err收藏
Effect of atomic layer etching on the surface damage removal of GaN-based light emitting diodes原子层刻蚀对GaN基发光二极管表面损伤去除的影响
errApplied Surface Science
IF6.9
err2025-08-30
err0
PREAI
errChan Ho Kim; Jong Woo Hong; Woong Sun Lim; Ja Yeon Kim; Kyung Lim Kim; Jong Soon Park; Yun Jae Park; Eun Koo Kim; Hyeong Joon Eoh; Jun Won Jeong; Sung Hyun Kim; Young Woo Jeon; Geun Young Yeom; Dong Woo Kim
err分享
err收藏
Effect of showerhead electrode materials on high aspect ratio etching of SiO2喷头电极材料对高宽比SiO2刻蚀的影响
errJournal of Industrial and Engineering Chemistry
IF6
err2025-06-22
err0
PREAI
errSeong Bae Kim; Hyun Woo Tak; Chan Hyuk Choi; Jun Soo Lee; Myeong Ho Park; Akihide Sato; Sang Yeob Lee; Dong Woo Kim; Geun Young Yeom
err分享
err收藏
Effect of NF3, WF6, and MoF6 Additive Gases on High Aspect Ratio Contact SiO2 Etching in c-C4F8/C4F6/Ar/O2 Plasmas
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2025-02-19
err0
PREAI
errTak, Hyun Woo; Choi, Chan Hyuk; Kim, Seong Bae; Park, Myeong Ho; Lee, Jun Soo; Sato, Akihide; Kim, Bong Sun; Jang, Jun Ki; Kim, Eun Koo; Kim, Dong Woo; Yeom, Geun Young
err分享
err收藏
Specific molecular design of tetradentate Platinum(II) complexes for enhancing the electroluminescent performances of blue-phosphorescent organic light-emitting diodes四齿配体铂(II)配合物的特定分子设计以增强蓝光磷光有机发光二极管的光电性能
errCHEMICAL ENGINEERING JOURNAL
IF13.2
err2025-02-01
err0
PREAI
errKim, Namkyun; Moon, Jangho; Lee, Hyunjung; You, Dong Kyun; Ryu, Chan Hee; Kim, Dongwook; Park, Hyeji; Yeom, Gayeon; Bin, Jong-Kwan; Lee, Jun Yeob; Lee, Kang Mun
err分享
err收藏
Plasma Dielectric Etching with C4H2F6 Isomers of Low Global-Warming Potential
errJOURNAL OF MANUFACTURING AND MATERIALS PROCESSING
IF3.3
err2025-01-30
err0
errOAAI
errChoi, Minsu; Lee, Youngseok; Cho, Chulhee; Jeong, Wonnyoung; Seong, Inho; Haque, Jami Md Ehsanul; Choi, Byeongyeop; Seo, Seonghyun; Kim, Sijun; You, Shinjae; Yeom, Geun Young
err分享
err收藏
Selective Etching of SiO2 by Radical Recombination through NF3/H2 Pulsed RF Plasma
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2024-12-20
err1
PREAI
errKim, Dae Whan; Gil, Hong Seong; Park, Woo Chang; Lee, Ji Yeon; Kim, Doo San; Jang, Yun Jong; Kim, Kyoung Chan; Pyun, Do Seong; Kim, Ju Young; Kim, Yongil; Yeom, Geun Young
err分享
err收藏
Fabrication of TiN metal hard masks via very-high-frequency-direct-current superimposed sputtering
errMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF4.6
err2024-12-01
err1
PREAI
errJeong, Byeong Hwa; Kim, Dong Woo; Yeom, Geun-Young; Kim, Kyong Nam
err分享
err收藏
Clean SiO2 atomic layer etching based on physisorption of high boiling point perfluorocarbon
errNANOSCALE
IF5.1
err2024-01-01
err1
PREAI
errSung, Dain; Tak, Hyunwoo; Kim, Heeju; Kim, Dongwoo; Kim, Kyongnam; Yeom, Geunyoung
err分享
err收藏
Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma使用电感耦合等离子体和电容耦合等离子体产生的C6F6/Ar/O2等离子体对SiO2蚀刻特性的研究
errMATERIALS
IF3.2
err2022-02-10
err25
errOAAI
errSung, Dain; Wen, Long; Tak, Hyunwoo; Lee, Hyejoo; Kim, Dongwoo; Yeom, Geunyoung
err分享
err收藏
Radio Frequency Induction Welding of Silver Nanowire Networks for Transparent Heat Films
errMATERIALS
IF3.2
err2021-08-08
err5
errOAAI
errOh, Jisoo; Wen, Long; Tak, Hyunwoo; Kim, Heeju; Kim, Gyowun; Hong, Jongwoo; Chang, Wonjun; Kim, Dongwoo; Yeom, Geunyoung
err分享
err收藏
Universal vertical standing of block copolymer microdomains enabled by a gradient block
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2021-01-01
err7
PREAI
errSong, Seung Won; Hur, Yoon Hyung; Park, Yemin; Cho, Eugene N.; Han, Hyeuk Jin; Jang, Hanhwi; Oh, Jisoo; Yeom, Geunyoung; Lee, Jisun; Yoon, Kwang-Sub; Park, Chang-Min; Kim, Insung; Kim, YongJoo; Jung, Yeon Sik
err分享
err收藏
Study on plasma characteristics and gas analysis before and after recovery using liquid-fluorocarbon precursor
errAPPLIED SURFACE SCIENCE
IF6.9
err2020-12-01
err5
PREAI
errPark, Junyoung; Oh, Byoungmoon; Kim, Kyongnam; Sung, Dain; Yeom, Geunyoung
err分享
err收藏
Etch-induced physical damage and contamination during highly selective oxide etching using C4F8/H2 helicon wave plasmas
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err7
PREAI
errKim, HS; Lee, WJ; Yeom, GY; Kim, JH; Whang, KW
err分享
err收藏

研究方向

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合作学者
合作期刊
R
Robert M. Wallace
H 指数: 91 · 论文数: 621
韩
韩炜 (Wei Han)
H 指数: 82 · 论文数: 881
J
Jun Yeob Lee
H 指数: 80 · 论文数: 990
M
M. A. Lieberman
H 指数: 74 · 论文数: 500
J
Jong‐Wan Park
H 指数: 63 · 论文数: 538
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