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C
Changhwan Choi
Dankook University
40
H指数
191
论文数
6.1K
被引数
0
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80
发表时间
发表时间
IF
被引数
The rise of co-arranged lending
共同安排贷款的兴起
Financial Innovation
IF
7.2
2026-09-03
0
OA
AI
Changhwan Choi; Chune Young Chung
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HeadLite: Compact Multi-Modal Sensor Fusion for Stride Length Estimation from Smart Insoles
HeadLite:基于智能鞋垫步长估计的紧凑型多模态传感器融合
IEEE Sensors Journal
IF
4.5
2026-08-28
0
PRE
AI
Yeonghwan Kim; Changhwan Choi; Kyunghwan Yoo; Sunoh Kim; Sang-Il Choi
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Plasma dry desmear of Ajinomoto build-up film for fine micro-via fabrication in advanced semiconductor packaging
味之素层压薄膜的等离子体干法除胶渣工艺用于先进半导体封装中的精细微通孔制造
Materials Science in Semiconductor Processing
IF
4.6
2026-06-22
0
PRE
AI
Gyulee Kim; Sunbum Kim; Kyoung Yeon Min; Young Ju Han; Soonoh Jeong; Mooseong Kim; Changhwan Choi
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Material and Electrical Characteristics of a Thin-Film Transistor Using Cationic Composition-Controlled Atomic Layer-Deposited In–Ga–Sn–O (IGTO) Thin Film
ACS Applied Electronic Materials
IF
4.7
2026-01-27
0
PRE
AI
Chanseul Lee; Sunbum Kim; Kyoung Yeon Min; Gyulee Kim; Minhyuk Kim; Yongjoo Park; Changhwan Choi
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Effect of Hydrogen Profile in Flash Memory SiNx Charge Trap Layer with Different Silicon to Nitrogen Ratios
闪存中不同硅氮比氮化硅电荷捕获层中氢分布的影响
Advanced Electronic Materials
IF
5.3
2025-07-21
0
OA
AI
Sehyeon Choi; Yunseo Lim; Sejin Kim; San Park; Boncheol Ku; Hyungjun Kim; Jaehyun Yang; Bio Kim; Youngseon Son; Hanmei Choi; Changhwan Choi
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Hydrophilic/Hydrophobic functionalization of HFBI-Graphene composite using intensity and direction of external electric field: In silico study
利用外部电场强度和方向对HFBI-Graphene复合材料进行亲水/疏水功能化的模拟研究
PROGRESS IN ORGANIC COATINGS
IF
7.3
2025-07-01
0
PRE
AI
Park, Wooboum; Yoon, Taeyoung; Choi, Changhwan; You, Juneseok; Na, Sungsoo
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The effects of inserted layers (HfO2, ZrO2, Y2O3, La2O3) on the ferroelectric and synaptic properties of Zr-doped HfO2 sandwich structure
插入层(HfO2, ZrO2, Y2O3, La2O3)对Zr掺杂HfO2三明治结构铁电和突触性能的影响
Applied Surface Science
IF
6.9
2025-06-28
0
PRE
AI
Chulwon Chung; Kyungsoo Park; Seunghyeon Yun; Junhyeok Park; Hyeon Cheol Jeong; Changhwan Choi
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Zirconium-doped hafnia (HfZrOx) ferroelectric capacitor with atomic layer deposited HfO2, ZrO2, and La2O3 interfacial layers
锆掺杂氧化铪(HfZrOx)铁电电容器,具有原子层沉积的HfO2、ZrO2和La2O3界面层
Ceramics International
IF
5.6
2025-04-16
0
PRE
AI
Chulwon Chung; Jiyeon Lim; Boncheol Ku; Kyungsoo Park; Changhwan Choi
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Enhanced electrical stability and reliability of amorphous IGZO/HfO2 thin film transistors with CF4 plasma treatment
通过CF4等离子体处理增强非晶IGZO/HfO2薄膜晶体管的电稳定性和可靠性
APPLIED SURFACE SCIENCE
IF
6.9
2025-04-01
0
PRE
AI
Kim, Gyulee; Kim, Sunbum; Kim, Minhyuk; Choi, Changhwan
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Heterogeneous monolithic 3D integration for hybrid vertical CMOS inverter using n-type IGTO TFT on p-type Si FET
在p型Si FET上使用n型IGTO TFT的混合垂直CMOS反相器的异构单片3D集成
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2025-01-01
2
PRE
AI
Lee, Chanseul; Kim, Sunbum; Kim, Gyulee; Choi, Changhwan
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Polyurethane packed graphene-coated spider silk by dip-casting for a highly stretchable strain sensor
JOURNAL OF MATERIALS CHEMISTRY B
IF
5.7
2025-01-01
0
PRE
AI
Abbas, Zaigham; Hassan, Gul; Khan, Muhammad Umair; Abbas, Haider; Ahmad, Basheer; Shuja, Ahmed; Sajid, Memoon; Bae, Jinho; Choi, Changhwan
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Hf0.5Zr0.5O2/HfO2/Hf0.5Zr0.5O2 laminated thin films and CF4 plasma passivation for improved memory and synaptic characteristics of ferroelectric field-effect transistors
NANOSCALE
IF
5.1
2025-01-01
0
OA
AI
Park, Kyungsoo; Chung, Chulwon; Ku, Boncheol; Yun, Seunghyeon; Park, Junhyeok; Choi, Changhwan
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The effect of shale gas booms on environmental CSR activity
INTERNATIONAL REVIEW OF FINANCIAL ANALYSIS
IF
9.8
2024-10-01
2
PRE
AI
Choi, Changhwan; Chung, Chune Young
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Improvement of synaptic property of GeSe based CBRAM by engineering the deposition condition of switching matrix
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2024-08-01
1
PRE
AI
Chung, Chulwon; Choi, Changhwan
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Area-selective atomic layer deposition (AS-ALD) of low temperature (300 °C) cobalt thin film using octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs)
APPLIED SURFACE SCIENCE
IF
6.9
2024-08-01
4
PRE
AI
Kim, Chaewon; Choi, Moonsuk; Sim, Jihyun; Kim, Hyungjun; Choi, Changhwan
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The 3D Monolithically Integrated Hardware Based Neural System with Enhanced Memory Window of the Volatile and Non-Volatile Devices
ADVANCED SCIENCE
IF
14.1
2024-06-17
2
OA
AI
Jeon, Yu-Rim; Seo, Donguk; Lee, Yoonmyung; Akinwande, Deji; Choi, Changhwan
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Investigation of dual work function metal (DWFM) gate stacks with ALD TaAlN and TaAlC for multi threshold voltages (VTHs) engineering in MOS device integration
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF
4.6
2024-06-01
1
PRE
AI
Choi, Moonsuk; Sim, Jihyeon; Kim, Hyeongjun; Lim, Hyun Jin; Kim, Ki Sub; Choi, Changhwan
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Synaptic Characteristics of Fully Depleted Silicon-on-Insulator Metal-Oxide-Semiconductor Field-Effect Transistors and Synapse-Neuron Arrayed Neuromorphic Hardware System
全耗尽绝缘体上硅金属氧化物半导体场效应晶体管和突触神经元阵列神经形态硬件系统的突触特性
ADVANCED INTELLIGENT SYSTEMS
IF
6.1
2024-02-22
3
OA
AI
Jeon, Yu-Rim; Kim, Jeong-Hoon; Akinwande, Deji; Choi, Changhwan
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Volatile threshold switching and synaptic properties controlled by Ag diffusion using Schottky defects
NANOSCALE HORIZONS
IF
6.6
2024-01-01
5
PRE
AI
Jeon, Yu-Rim; Akinwande, Deji; Choi, Changhwan
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Synaptic Characteristics of Atomic Layer-Deposited Ferroelectric Lanthanum-Doped HfO2 (La:HfO2) and TaN-Based Artificial Synapses
ACS APPLIED MATERIALS & INTERFACES
IF
8.2
2023-12-02
6
PRE
AI
Jeon, Yu-Rim; Kim, Duho; Ku, Boncheol; Chung, Chulwon; Choi, Changhwan
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研究方向
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合作学者
合作期刊
H
H.‐S. Philip Wong
H 指数: 106 · 论文数: 781
C
Chong Seung Yoon
H 指数: 92 · 论文数: 468
D
Deji Akinwande
H 指数: 75 · 论文数: 490
H
Hyoun Woo Kim
H 指数: 70 · 论文数: 560
J
Jin‐Seong Park
H 指数: 63 · 论文数: 552
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