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C

Christophe Cardinaud

Nantes Université

30H指数
182论文数
3.4K被引数
收录论文 33
发表时间
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In situ XPS investigation of β-Ga2O3 surface chemistry for the development of SF6/Ar based plasma atomic layer etching processes原位XPS研究β-Ga2O3表面化学性质，用于开发SF6/Ar基等离子体原子层刻蚀工艺
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errBeji, Hiba; Pape, Thomas Le; Mbouja Signe, Tatiana Chancelle; Ginestar, Stephane; Girard, Aurelie; Cardinaud, Christophe; Mannequin, Cedric
err分享
err收藏
Production of NO in nitrogen-based active screen plasma nitriding devices, a disadvantage or an opportunity?
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2025-03-01
err0
PREAI
errCzerwiec, T.; Carrivain, O.; Masieiro, M.; Hugon, R.; Cardinaud, C.; Belmonte, T.; Noel, C.; Cardoso, R. P.; Marcos, G.
err分享
err收藏
On the low temperature limits for cryogenic etching: A quasi in situ XPS study
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-11-01
err6
errOAAI
errCemin, Felipe; Girard, Aurelie; Cardinaud, Christophe
err分享
err收藏
Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-08-08
err1
errOAAI
errMeyer, T.; Girard, A.; Bouska, M.; Baudet, E.; Baillieul, M.; Nemec, P.; Nazabal, V; Cardinaud, C.
err分享
err收藏
Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy
errAPPLIED SURFACE SCIENCE
IF6.9
err2021-11-01
err12
errOAAI
errBargiela, Pascal; Fernandez, Vincent; Cardinaud, Christophe; Walton, John; Greiner, Mark; Morgan, David; Fairley, Neal; Baltrusaitis, Jonas
err分享
err收藏
Etching of iron and iron-chromium alloys using ICP-RIE chlorine plasma
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2021-09-28
err3
errOAAI
errLe Dain, Guillaume; Laourine, Feriel; Guilet, Stephane; Czerwiec, Thierry; Marcos, Gregory; Noel, Cedric; Henrion, Gerard; Cardinaud, Christophe; Girard, Aurelie; Rhallabi, Ahmed
err分享
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Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas在SF6和SF6 /Ar等离子体中蚀刻非晶ge-sb-se薄膜期间的表面组成和微掩模效应
errAPPLIED SURFACE SCIENCE
IF6.9
err2021-05-01
err9
errOAAI
errMeyer, T.; Girard, A.; Dain, G. Le; Rhallabi, A.; Baudet, E.; Nazabal, V.; Nemec, P.; Cardinaud, C.
err分享
err收藏
Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O2 plasmas在SF6，SF6/Ar和SF6/O2等离子体中蚀刻GeSe2硫系玻璃及其脉冲激光沉积薄膜
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2020-10-15
err5
errOAAI
errMeyer, T.; LeDain, G.; Girard, A.; Rhallabi, A.; Bouska, M.; Nemec, P.; Nazabal, V; Cardinaud, C.
err分享
err收藏
Reduction of recombination velocity on GaAs surface by Ga-S and As-S bond-related surface states from (NH4)(2)S-x treatment
errJOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF3.3
err2019-12-06
err34
PREAI
errSik, H; Feurprier, Y; Cardinaud, C; Turban, G; Scavennec, A
err分享
err收藏
Modeling of C4F8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2019-08-08
err8
PREAI
errLe Dain, Guillaume; Rhallabi, Ahmed; Girard, Aurelie; Cardinaud, Christophe; Roqueta, Fabrice; Boufnichel, Mohamed
err分享
err收藏
Wide band gap kesterite absorbers for thin film solar cells: potential and challenges for their deployment in tandem devices
errSUSTAINABLE ENERGY & FUELS
IF4.1
err2019-01-01
err18
errOAAI
errVermang, Bart; Brammertz, Guy; Meuris, Marc; Schnabel, Thomas; Ahlswede, Erik; Choubrac, Leo; Harel, Sylvie; Cardinaud, Christophe; Arzel, Ludovic; Barreau, Nicolas; van Deelen, Joop; Bolt, Pieter-Jan; Bras, Patrice; Ren, Yi; Jaremalm, Eric; Khelifi, Samira; Yang, Sheng; Lauwaert, Johan; Batuk, Maria; Hadermann, Joke; Kozina, Xeniya; Handick, Evelyn; Hartmann, Claudia; Gerlach, Dominic; Matsuda, Asahiko; Ueda, Shigenori; Chikyow, Toyohiro; Felix, Roberto; Zhang, Yufeng; Wilks, Regan G.; Baer, Marcus
err分享
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Covalent functionalization of polycrystalline silicon nanoribbons applied to Pb(II) electrical detection
errSENSORS AND ACTUATORS B-CHEMICAL
IF7.7
err2018-09-01
err1
errOAAI
errLe Borgne, Brice; Girard, Aurelie; Cardinaud, Christophe; Salaun, Anne-Claire; Pichon, Laurent; Geneste, Florence
err分享
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X-ray photoelectron spectroscopy analysis of Ge-Sb-Se pulsed laser deposited thin filmsGe-sb-se脉冲激光沉积薄膜的x射线光电子能谱分析
errJOURNAL OF THE AMERICAN CERAMIC SOCIETY
IF3.8
err2018-03-09
err10
errOAAI
errBaudet, Emeline; Cardinaud, Christophe; Boidin, Remi; Girard, Aurelie; Gutwirth, Jan; Nemec, Petr; Nazabal, Virginie
err分享
err收藏
Experimental design approach for deposition optimization of RF sputtered chalcogenide thin films devoted to environmental optical sensors
errSCIENTIFIC REPORTS
IF3.9
err2017-06-14
err38
errOAAI
errBaudet, E.; Sergent, M.; Nemec, P.; Cardinaud, C.; Rinnert, E.; Michel, K.; Jouany, L.; Bureau, B.; Nazabal, V.
err分享
err收藏
Structural analysis of RF sputtered Ge-Sb-Se thin films by Raman and X-ray photoelectron spectroscopiesRF溅射ge-sb-se薄膜的拉曼和x射线光电子能谱结构分析
errJOURNAL OF NON-CRYSTALLINE SOLIDS
IF3.5
err2016-07-01
err43
errOAAI
errBaudet, E.; Cardinaud, C.; Girard, A.; Rinnert, E.; Michel, K.; Bureau, B.; Nazabal, V.
err分享
err收藏
Effect of doping on the modification of polycrystalline silicon by spontaneous reduction of diazonium salts
errAPPLIED SURFACE SCIENCE
IF6.9
err2014-09-01
err8
errOAAI
errGirard, A.; Coulon, N.; Cardinaud, C.; Mohammed-Brahim, T.; Geneste, F.
err分享
err收藏
SiGe derivatization by spontaneous reduction of aryl diazonium salts
errAPPLIED SURFACE SCIENCE
IF6.9
err2013-10-01
err10
errOAAI
errGirard, A.; Geneste, F.; Coulon, N.; Cardinaud, C.; Mohammed-Brahim, T.
err分享
err收藏
H atom surface loss kinetics in pulsed inductively coupled plasmas
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2013-08-08
err6
PREAI
errJacq, S.; Cardinaud, C.; Le Brizoual, L.; Granier, A.
err分享
err收藏
Ion energy distributions measured inside a high-voltage cathode in a BF3 pulsed dc plasma used for plasma doping: experiments and ab initio calculations
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2012-11-07
err5
PREAI
errGodet, Ludovic; Radovanov, Svetlana; Sheuer, Jay; Cardinaud, Christophe; Fernandez, Nicolas; Ferro, Yves; Cartry, Gilles
err分享
err收藏
Mechanisms of Oxygen Plasma Nanotexturing of Organic Polymer Surfaces: From Stable Super Hydrophilic to Super Hydrophobic Surfaces
errLANGMUIR
IF3.9
err2009-09-08
err339
PREAI
errTsougeni, K.; Vourdas, N.; Tserepi, A.; Gogolides, E.; Cardinaud, C.
err分享
err收藏

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