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H

Hyeong-U Kim

Korea Institute of Machinery and Materials
H指数:19
被引数:1,447

个人简介

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教育背景

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工作经历

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荣誉奖项

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Thickness‐Programmable Opto‐Memristive Dynamics in 6‐In Wafer‐Scale Atomic‐Layer‐Controlled WS 2 for Reservoir Computing

厚度可编程的光忆阻器动态特性：用于计算器芯片的6英寸晶圆级原子层控制的WS<sub>2</sub>

Advanced Functional Materials
IF19
2026-10-290
OAAI
Seongho Kim; Muyoung Kim; Junhyung Cho; Yeonho Choi; Gunhyoung Kim; Eunseo Go; Sooji Byun; Minchul Roh; Hyunwoo Shim; Jinhyoung Lee; Byeong‐Seon An; Ki Seok Kim; Seungwoo Song; Min Sup Choi; Taesung Kim; Taehyun Park; Hocheon Yoo; Hyeong‐U Kim
Artificial Room-Temperature Ferromagnetism of Bulk van der Waals VSe2 (Adv. Sci. 34/2025)

块体范德瓦尔斯VSe2的人工室温铁磁性 (Adv. Sci. 34/2025)

Advanced Science
IF14.1
2025-09-160
OAAI
Jinhyoung Lee; Gunhyoung Kim; Hyunho Seok; Hyunbin Choi; Hyeonjeong Lee; Seokchan Lee; Geonwook Kim; Hyunho Kim; Seowoo Son; Sihoon Son; Dongho Lee; Hosin Hwang; Hyelim Shin; Sujeong Han; Geumji Back; Alexina Ollier; Yeon-Ji Kim; Lei Fang; Gyuho Han; Goo-Eun Jung; Youngi Lee; Hyeong-U Kim; Kenji Watanabe; Takashi Taniguchi; Wonjun Shin; Suraj Cheema; Andreas Heinrich; Won-Jun Jang; Taesung Kim
Monolithically-Integrated van der Waals Synaptic Memory via Bulk Nano-Crystallization

单片集成范德华突触存储器，通过体纳米晶化实现

ADVANCED SCIENCE
IF14.1
2025-08-010
OAAI
Lee, Jinhyoung; Kim, Gunhyoung; Seok, Hyunho; Han, Sujeong; Shim, Hyunwoo; Cha, Yoonmi; Son, Sihoon; Choi, Hyunbin; Grzeszczyk, Magdalena; Bogucki, Aleksander; Choi, Yunseok; Kim, Seungil; Lee, Hyeonjeong; Park, Chaerin; Kim, Geonwook; Hwang, Hosin; Kim, Hyunho; Lee, Dongho; Son, Seowoo; Back, Geumji; Shin, Hyelim; Choi, Donghwan; Ollier, Alexina; Kim, Yeon-Ji; Fang, Lei; Han, Gyuho; Jung, Goo-Eun; Lee, Youngi; Kim, Hyeong-U; Watanabe, Kenji; Taniguchi, Takashi; Bae, Sanghoon; Heinrich, Andreas; Jang, Won-Jun; Kim, Taesung
Artificial Room-Temperature Ferromagnetism of Bulk van der Waals VSe2

块体范德瓦尔斯VSe2的人工室温铁磁性

Advanced Science
IF14.1
2025-05-300
OAAI
Jinhyoung Lee; Gunhyoung Kim; Hyunho Seok; Hyunbin Choi; Hyeonjeong Lee; Seokchan Lee; Geonwook Kim; Hyunho Kim; Seowoo Son; Sihoon Son; Dongho Lee; Hosin Hwang; Hyelim Shin; Sujeong Han; Geumji Back; Alexina Ollier; Yeon-Ji Kim; Lei Fang; Gyuho Han; Goo-Eun Jung; Youngi Lee; Hyeong-U Kim; Kenji Watanabe; Takashi Taniguchi; Wonjun Shin; Suraj Cheema; Andreas Heinrich; Won-Jun Jang; Taesung Kim
Development of industrial-scale L-shaped dielectric barrier discharge reactor for improving capacity retention of graphite anode using plasma pretreatment

等离子体预处理提高石墨阳极容量保持率的工业规模L型介质阻挡放电反应器的研制

JOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
2025-02-280
PRE
Eom, Geon Woong; Hur, Min; Shim, Hyung-chul; Hyun, Seungmin; So, Hye-Mi; Oh, Minsub; Kim, Areum; Jang, Yunseon; Kang, Woo Seok; Kim, Dae-Woong; Kim, Hyeong-U; Lee, Sang Ho; Park, In Yong; Jang, Eui-chan; Ahn, Jisu; Yun, Dong-hyun; Kim, Jae-hyeon; You, Shinjae; Lee, Jin Young

研究方向

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T
Taesung Kim
H 指数:45论文数:691被引数:9,307
H
Hyunho Seok
H 指数:18论文数:88被引数:1,144
N
Nari Jeon
H 指数:16论文数:53被引数:1,036
M
Muyoung Kim
H 指数:10论文数:27被引数:260
S
Sihoon Son
H 指数:6论文数:32被引数:217
J
Jinill Cho
H 指数:9论文数:41被引数:280
H
Hocheon Yoo
H 指数:30论文数:230被引数:3,692
V
Vinit Kanade
H 指数:8论文数:18被引数:377
W
Woo Seok Kang
H 指数:15论文数:79被引数:895
D
Dongmok Whang
H 指数:36论文数:171被引数:1.0万