A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition通过流化床化学气相沉积在粉末上施加纳米氧化铝涂层的新途径CHEMICAL ENGINEERING JOURNAL ADVANCESIF7.12023-11-012OAAI
Photo-electrocatalytic performance of poly(3,4-ethylenedioxythiophene)/ TiO2 nano-tree films deposited by oCVD/CVD for H2 productionAPPLIED SURFACE SCIENCEIF6.92023-11-019OAAI
Corrosion barrier alumina/zirconia bilayer stack on low Cr steel by direct liquid injection metalorganic chemical vapor depositionSURFACE & COATINGS TECHNOLOGYIF6.12023-06-015OAAI
Secured Nanosynthesis-Deposition Aerosol Process for Composite Thin Films Incorporating Highly Dispersed NanoparticlesADVANCED SCIENCEIF14.12022-12-184OAAI
Critical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion PerformanceACS APPLIED ELECTRONIC MATERIALSIF4.72022-04-127OA
Barrier properties and hydrothermal aging of amorphous alumina coatings applied on pharmaceutical vialsSURFACE & COATINGS TECHNOLOGYIF6.12021-11-015OAAI
Direct liquid injection chemical vapor deposition of ZrO2 films from a heteroleptic Zr precursor: interplay between film characteristics and corrosion protection of stainless steelJOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&TIF6.62021-07-0119OAAI
Liquid antimony pentachloride as oxidant for robust oxidative chemical vapor deposition of poly(3,4-ethylenedioxythiophene) filmsAPPLIED SURFACE SCIENCEIF6.92021-07-0110OAAI
Network hydration, ordering and composition interplay of chemical vapor deposited amorphous silica films from tetraethyl orthosilicateJOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&TIF6.62021-07-018OAAI
In- and out-plane transport properties of chemical vapor deposited TiO2 anatase filmsJOURNAL OF MATERIALS SCIENCEIF3.92021-03-0814OAAI
Tunable SiO2 to SiOxCyH films by ozone assisted chemical vapor deposition from tetraethylorthosilicate and hexamethyldisilazane mixturesSURFACE & COATINGS TECHNOLOGYIF6.12021-02-0110OAAI
Large temperature range model for the atmospheric pressure Chemical vapor deposition of Silicon dioxide films on thermosensitive substratesCHEMICAL ENGINEERING RESEARCH & DESIGNIF3.92020-09-0110OAAI
An out of the box vision over oxidative chemical vapor deposition of PEDOT involving sublimed iron trichlorideSYNTHETIC METALSIF4.62020-08-0117OAAI
Morphological, structural, optical, and electrical study of nanostructured thin films: Charge transport mechanism of p-type Co3O4MATERIALS CHEMISTRY AND PHYSICSIF4.72020-01-0110OAAI
Efficient, durable protection of the Ti6242S titanium alloy against high-temperature oxidation through MOCVD processed amorphous alumina coatingsJOURNAL OF MATERIALS SCIENCEIF3.92019-12-127OAAI
Thermodynamic study of the formation of C60 and C70 by combustion or pyrolysisJOURNAL OF THE ELECTROCHEMICAL SOCIETYIF3.32019-12-066PREAI
Thermodynamic study, composition, and microstructure of low-pressure chemical vapor deposited silicon dioxide films grown from TEOS/N2O mixturesJOURNAL OF THE ELECTROCHEMICAL SOCIETYIF3.32019-12-0610PREAI
Low temperature metallorganic chemical vapor deposition routes to chromium metal thin films using bis(benzene)chromiumJOURNAL OF THE ELECTROCHEMICAL SOCIETYIF3.32019-12-0616PREAI
TiO2 nanotree films for the production of green H2 by solar water splitting: From microstructural and optical characteristics to the photocatalytic propertiesAPPLIED SURFACE SCIENCEIF6.92019-11-0118OAAI
Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on SiAPPLIED SURFACE SCIENCEIF6.92019-10-0162OAAI