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K

Khabib Khumaini

Sejong University

9H指数
36论文数
172被引数
收录论文 17
发表时间
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Exposure-dependent secondary surface reactions in atomic layer deposition of silicon oxide from diisopropylaminosilane and ozone: an in situ and first-principles study从二异丙氨基硅烷和臭氧中沉积硅氧化物的原子层沉积过程中，与暴露相关的二次表面反应：原位和第一性原理研究
errApplied Surface Science
IF6.9
err2026-09-24
err0
PREAI
errKhabib Khumaini; Heeju Son; Hyeonsu Roh; Okhyeon Kim; Hye-Lee Kim; Won-Jun Lee
err分享
err收藏
Ligand-exchange mechanism of ZrF4 removal by TiCl4 in isotropic atomic layer etching of ZrO2: First-principles studyZrF4被TiCl4去除在ZrO2各向同性原子层刻蚀中的配体交换机制：第一性原理研究
errSurfaces and Interfaces
IF6.3
err2026-09-19
err0
PREAI
errKhabib Khumaini; Muhammad Hasbi Ar-Raihan; Hye-Lee Kim; Won-Jun Lee
err分享
err收藏
Role of the spectator ligand in suppressing non-self-limiting growth during ZrO2 atomic layer deposition: Zr(NMe2)4 versus CpZr(NMe2)3旁观配体在抑制ZrO2原子层沉积过程中非自限制生长中的作用：Zr(NMe2)4与CpZr(NMe2)3的比较
errSurfaces and Interfaces
IF6.3
err2026-09-15
err0
PREAI
errHye-Lee Kim; Yong R. Sriwijaya; Khabib Khumaini; Tanzia Chowdhury; Won-Jun Lee
err分享
err收藏
Effect of crystalline phase on the thermal atomic layer etching of aluminum oxide: a first-principles study晶相效应对氧化铝热原子层刻蚀的影响：第一性原理研究
errComputational Materials Science
IF3.3
err2026-07-01
err0
PREAI
errAr-Raihan, Muhammad Hasbi; Khumaini, Khabib; Kim, Hye-Lee; Nam, Taewook; Lee, Won-Jun
err分享
err收藏
Dimer Formation as the Key Removal Pathway in the Isotropic Atomic Layer Etching of Al2O3: A First-Principles Study二聚体形成作为Al₂O₃各向同性原子层刻蚀的关键去除路径：一项第一性原理研究
errChemistry of Materials
IF7
err2026-03-05
err0
PREAI
errKhabib Khumaini; Hye-Lee Kim; Taewook Nam; Won-Jun Lee
err分享
err收藏
High-Temperature Atomic Layer Deposition of Thermal-Oxide-Quality SiO2 Using Methyltrichlorosilane
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2026-01-01
err0
PREAI
errKim, Okhyeon; An, Jae-Seok; Chowdhury, Tanzia; Kim, Changgyu; Khumaini, Khabib; Kim, Hye-Lee; Park, Jung-Woo; Lee, Won-Jun
err分享
err收藏
Ligand Effects in Niobium Precursors for Atomic Layer Deposition of Niobium Oxide Films铌氧化物薄膜原子层沉积中铌前驱体的配体效应
errECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
IF2.2
err2025-12-01
err0
PREAI
errKim, Cha-Hee; Khumaini, Khabib; Kim, Okhyeon; Kim, Hye-Lee; Seok, Jang-Hyeon; Park, Jung Woo; Lee, Won-Jun
err分享
err收藏
Thermal atomic layer etching mechanism of amorphous aluminum oxide by hydrogen fluoride and trimethylaluminum: First-principles study氢氟酸和三甲基铝作用下非晶氧化铝的热原子层刻蚀机制：第一性原理研究
errSurfaces and Interfaces
IF6.3
err2025-07-04
err0
PREAI
errKhabib Khumaini; Gyejun Cho; Hye-Lee Kim; Won-Jun Lee
err分享
err收藏
Reaction mechanism of atomic layer deposition of zirconium oxide using tris(dimethylamino)cyclopentadienyl zirconium: experimental and theoretical study使用三(二甲氨基)环戊二烯基锆的二氧化锆原子层沉积反应机理：实验与理论研究
errMATERIALS ADVANCES
IF4.7
err2025-01-01
err0
errOAAI
errKim, Hye-Lee; Kim, Okhyeon; Sriwijaya, Yong Richard; Khumaini, Khabib; Hidayat, Romel
err分享
err收藏
Chemisorption of tetrakis(dimethylamino)zirconium on zirconium oxide: Density functional theory study
errSURFACES AND INTERFACES
IF6.3
err2024-07-01
err1
PREAI
errHidayat, Romel; Kim, Hye-Lee; Sriwijaya, Yong R.; Khumaini, Khabib; Lee, Won-Jun
err分享
err收藏
Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)Silane and ozone ( vol 571 , 151231 , 2022)
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-07-01
err0
errOAAI
errRoh, Hyeonsu; Kim, Hye-Lee; Khumaini, Khabib; Son, Heeju; Shin, Donggeon; Lee, Won-Jun
err分享
err收藏
Etching mechanism of amorphous hydrogenated silicon nitride by hydrogen fluoride非晶态氢化氮化硅的氟化氢腐蚀机理
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-05-01
err5
PREAI
errKhumaini, Khabib; Kim, Yewon; Hidayat, Romel; Chowdhury, Tanzia; Kim, Hye-Lee; Cho, Byungchul; Park, Sangjoon; Lee, Won-Jun
err分享
err收藏
Surface reaction mechanism of atomic layer deposition of niobium oxide: In situ characterization and first-principle study
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-04-01
err6
PREAI
errKhumaini, Khabib; Roh, Hyeonsu; Han, Hyunmin; Kim, Hye-Lee; Kim, Hyo-Suk; Seok, Jang-Hyeon; Park, Jung Woo; Lee, Won-Jun
err分享
err收藏
Density functional theory study on the selective capping of cobalt on copper interconnect
errAPPLIED SURFACE SCIENCE
IF6.9
err2022-05-01
err13
PREAI
errKhumaini, Khabib; Hidayat, Romel; Mayangsari, Tirta Rona; Chowdhury, Tanzia; Kim, Hye-Lee; Lee, Sang-Ick; Lee, Won-Jun
err分享
err收藏
Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2022-01-01
err12
PREAI
errKim, Seongyoon; Hidayat, Romel; Roh, Hyeonsu; Kim, Jaemin; Kim, Hye-Lee; Khumaini, Khabib; Park, Mira; Seok, Jang-Hyeon; Park, Jung Woo; Lee, Won-Jun
err分享
err收藏
Atomic layer deposition of silicon oxide films using bis(dimethylaminomethylsilyl)trimethylsilylamine and ozone: first-principles and experimental study
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2022-01-01
err5
PREAI
errChoi, Yeongchan; Son, Heeju; Khumaini, Khabib; Han, Hyunmin; Roh, Hyeonsu; Kim, Hye-Lee; Lee, Sang-Ick; Lee, Won-Jun
err分享
err收藏
Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)silane and ozone
errAPPLIED SURFACE SCIENCE
IF6.9
err2022-01-01
err18
PREAI
errRoh, Hyeonsu; Kim, Hye-Lee; Khumaini, Khabib; Son, Heeju; Shin, Donggeon; Lee, Won-Jun
err分享
err收藏

研究方向

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