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H

Hye-Lee Kim

Sejong University

10H指数
46论文数
277被引数
收录论文 27
发表时间
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Exposure-dependent secondary surface reactions in atomic layer deposition of silicon oxide from diisopropylaminosilane and ozone: an in situ and first-principles study从二异丙氨基硅烷和臭氧中沉积硅氧化物的原子层沉积过程中，与暴露相关的二次表面反应：原位和第一性原理研究
errApplied Surface Science
IF6.9
err2026-09-24
err0
PREAI
errKhabib Khumaini; Heeju Son; Hyeonsu Roh; Okhyeon Kim; Hye-Lee Kim; Won-Jun Lee
err分享
err收藏
Ligand-exchange mechanism of ZrF4 removal by TiCl4 in isotropic atomic layer etching of ZrO2: First-principles studyZrF4被TiCl4去除在ZrO2各向同性原子层刻蚀中的配体交换机制：第一性原理研究
errSurfaces and Interfaces
IF6.3
err2026-09-19
err0
PREAI
errKhabib Khumaini; Muhammad Hasbi Ar-Raihan; Hye-Lee Kim; Won-Jun Lee
err分享
err收藏
Role of the spectator ligand in suppressing non-self-limiting growth during ZrO2 atomic layer deposition: Zr(NMe2)4 versus CpZr(NMe2)3旁观配体在抑制ZrO2原子层沉积过程中非自限制生长中的作用：Zr(NMe2)4与CpZr(NMe2)3的比较
errSurfaces and Interfaces
IF6.3
err2026-09-15
err0
PREAI
errHye-Lee Kim; Yong R. Sriwijaya; Khabib Khumaini; Tanzia Chowdhury; Won-Jun Lee
err分享
err收藏
Effect of crystalline phase on the thermal atomic layer etching of aluminum oxide: a first-principles study晶相效应对氧化铝热原子层刻蚀的影响：第一性原理研究
errComputational Materials Science
IF3.3
err2026-07-01
err0
PREAI
errAr-Raihan, Muhammad Hasbi; Khumaini, Khabib; Kim, Hye-Lee; Nam, Taewook; Lee, Won-Jun
err分享
err收藏
Low-Temperature Atomic Layer Deposition of Gallium Nitride Using Tris(dimethylamido)gallium with a Coherent Nucleation on GaN (0001)低温原子层沉积法使用三(二甲基氨基)镓在GaN (0001)上的相干成核制备氮化镓
errACS Applied Electronic Materials
IF4.7
err2026-04-20
err0
PREAI
errYerim Choi; Tanzia Chowdhury; Jian Heo; Okhyeon Kim; Hyun-Jeong Yoo; Hye-Lee Kim; Youn-Seoung Lee; Won-Jun Lee
err分享
err收藏
Dimer Formation as the Key Removal Pathway in the Isotropic Atomic Layer Etching of Al2O3: A First-Principles Study二聚体形成作为Al₂O₃各向同性原子层刻蚀的关键去除路径：一项第一性原理研究
errChemistry of Materials
IF7
err2026-03-05
err0
PREAI
errKhabib Khumaini; Hye-Lee Kim; Taewook Nam; Won-Jun Lee
err分享
err收藏
NF3 plasma-enhanced isotropic atomic layer etching of amorphous and crystalline hafnium oxide filmsNF3等离子体增强各向同性原子层刻蚀无定形和结晶氧化铪薄膜
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-03-01
err0
PREAI
errCho, Gyejun; Hong, Jehwan; Kim, Hye-Lee; Cho, Byungchul; Lee, Changkyu; Park, Juhwan; Lee, Won-Jun
err分享
err收藏
High-Temperature Atomic Layer Deposition of Thermal-Oxide-Quality SiO2 Using Methyltrichlorosilane
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2026-01-01
err0
PREAI
errKim, Okhyeon; An, Jae-Seok; Chowdhury, Tanzia; Kim, Changgyu; Khumaini, Khabib; Kim, Hye-Lee; Park, Jung-Woo; Lee, Won-Jun
err分享
err收藏
High-temperature high-growth-rate atomic layer deposition of SiO2 using hexamethyldisilylamino-dimethylamino-silane高温高生长速率原子层沉积法制备SiO2，使用六甲基二硅氮基-二甲氨基-硅烷
errApplied Surface Science
IF6.9
err2025-12-17
err0
PREAI
errChanggyu Kim; Okhyeon Kim; Tanzia Chowdhury; Mi-Soo Kim; Hye-Lee Kim; Seunggyun Hong; Byung-Kwan Kim; Jin Sik Kim; Wonyong Koh; Won-Jun Lee
err分享
err收藏
Ligand Effects in Niobium Precursors for Atomic Layer Deposition of Niobium Oxide Films铌氧化物薄膜原子层沉积中铌前驱体的配体效应
errECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
IF2.2
err2025-12-01
err0
PREAI
errKim, Cha-Hee; Khumaini, Khabib; Kim, Okhyeon; Kim, Hye-Lee; Seok, Jang-Hyeon; Park, Jung Woo; Lee, Won-Jun
err分享
err收藏
Thermal atomic layer etching mechanism of amorphous aluminum oxide by hydrogen fluoride and trimethylaluminum: First-principles study氢氟酸和三甲基铝作用下非晶氧化铝的热原子层刻蚀机制：第一性原理研究
errSurfaces and Interfaces
IF6.3
err2025-07-04
err0
PREAI
errKhabib Khumaini; Gyejun Cho; Hye-Lee Kim; Won-Jun Lee
err分享
err收藏
Reaction mechanism of atomic layer deposition of zirconium oxide using tris(dimethylamino)cyclopentadienyl zirconium: experimental and theoretical study使用三(二甲氨基)环戊二烯基锆的二氧化锆原子层沉积反应机理：实验与理论研究
errMATERIALS ADVANCES
IF4.7
err2025-01-01
err0
errOAAI
errKim, Hye-Lee; Kim, Okhyeon; Sriwijaya, Yong Richard; Khumaini, Khabib; Hidayat, Romel
err分享
err收藏
High-temperature atomic layer deposition of silicon oxide films using Tris (dimethylamino)silane and ozone使用三 (二甲基氨基) 硅烷和臭氧对氧化硅膜进行高温原子层沉积
errCERAMICS INTERNATIONAL
IF5.6
err2024-11-01
err0
PREAI
errKim, Okhyeon; Choi, Yoonho; Kim, Changgyu; Kim, Hye-Lee; Lee, Won-Jun
err分享
err收藏
Growth mechanism of Ge2Sb2Te5 thin films by atomic layer deposition supercycles of GeTe and SbTe
errSURFACES AND INTERFACES
IF6.3
err2024-10-01
err0
PREAI
errKim, Okhyeon; Kim, Yewon; Kim, Hye-Lee; Wu, Zhe; Park, Chang Yup; Ahn, Dong-Ho; Kuh, Bong Jin; Lee, Won-Jun
err分享
err收藏
Chemisorption of tetrakis(dimethylamino)zirconium on zirconium oxide: Density functional theory study
errSURFACES AND INTERFACES
IF6.3
err2024-07-01
err1
PREAI
errHidayat, Romel; Kim, Hye-Lee; Sriwijaya, Yong R.; Khumaini, Khabib; Lee, Won-Jun
err分享
err收藏
Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)Silane and ozone ( vol 571 , 151231 , 2022)
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-07-01
err0
errOAAI
errRoh, Hyeonsu; Kim, Hye-Lee; Khumaini, Khabib; Son, Heeju; Shin, Donggeon; Lee, Won-Jun
err分享
err收藏
Etching mechanism of amorphous hydrogenated silicon nitride by hydrogen fluoride非晶态氢化氮化硅的氟化氢腐蚀机理
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-05-01
err5
PREAI
errKhumaini, Khabib; Kim, Yewon; Hidayat, Romel; Chowdhury, Tanzia; Kim, Hye-Lee; Cho, Byungchul; Park, Sangjoon; Lee, Won-Jun
err分享
err收藏
Surface reaction during thermal atomic layer etching of aluminum oxide films using fluorine radicals and trimethylaluminum使用氟自由基和三甲基铝对氧化铝膜进行热原子层蚀刻期间的表面反应
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-12-01
err1
PREAI
errKim, Yewon; Kim, Okhyeon; Cho, Gyejun; Kim, Hye-Lee; Kim, Minsu; Cho, Byungchul; Park, Sangjoon; Jung, Jongwan; Lee, Won-Jun
err分享
err收藏
Surface reaction mechanism of atomic layer deposition of niobium oxide: In situ characterization and first-principle study
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-04-01
err6
PREAI
errKhumaini, Khabib; Roh, Hyeonsu; Han, Hyunmin; Kim, Hye-Lee; Kim, Hyo-Suk; Seok, Jang-Hyeon; Park, Jung Woo; Lee, Won-Jun
err分享
err收藏
Density functional theory study on the modification of silicon nitride surface by fluorine-containing molecules (vol 554, 149481, 2021)
errAPPLIED SURFACE SCIENCE
IF6.9
err2022-11-01
err0
PREAI
errChowdhury, Tanzia; Hidayat, Romel; Kim, Hye-Lee; Mayangsari, Tirta Rona; Cho, Seongjae; Park, Sangjoon; Jung, Jongwan; Lee, Won-Jun
err分享
err收藏

研究方向

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