Chemistry in Cryogenic Etching: A Tutorial

doi:10.1007/s11090-025-10622-8

2025-12-11

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DOI：10.1007/s11090-025-10622-8

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摘要

En 中文

冷却基板以促进化学反应似乎有些反直觉。然而，这恰恰是等离子体低温刻蚀中经常观察到的一个优势。本文讨论了低温下等离子体与表面的相互作用。文章首先回顾了应用于刻蚀的吸附基本理论。随后，在文章的第二部分，通过两个不同的低温工艺来阐述这些理论概念，这些工艺是在研究计划中开发和研究：STiGer低温深硅刻蚀工艺中SiOxFy钝化层的增强，以及从物理吸附的C4F8分子对SiO2进行低温原子层刻蚀（cryo-ALE）。

Keyword:

Cryogenic etching

Physisorption

Chemisorption

BET model

Plasma-surface interaction

期刊

Plasma Chemistry and Plasma Processing

IF:

2.5

论文数:

190

被引数:

4.1K

机构

orléans university-cnrs

学者数:

论文数: 1

被引数: 0

引用论文

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