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Tokyo Electron Ltd

学者数177
论文数63
被引数0
关联论文 (63)
发表时间
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Unraveling etching mechanism for SiN film in cryogenic hydrogen-fluoride plasmas低温氢氟化物等离子体中SiN薄膜的刻蚀机理解析
errChemical Engineering Journal
IF13.2
err2026-07-15
err4
PREAI
errHsiao, Shih-Nan; Imai, Yusuke; Sekine, Makoto; Suda, Ryutaro; Kihara, Yoshihide; Ishikawa, Kenji; Hori, Masaru
err分享
err收藏
Preferential Halogen Adsorption on Si, Ge, and SiGe Surfaces for Selective Etching在Si、Ge和SiGe表面选择性刻蚀中的卤素优先吸附
errACS Applied Engineering Materials
IF3.5
err2026-05-22
err0
PREAI
errLongo, Roberto C.; Conlin, Patrick; Sridhar, Shyam; Ventzek, Peter L. G.
err分享
err收藏
Designing pulsed plasma etch processes by genetic algorithm基于遗传算法的脉冲等离子体刻蚀工艺设计
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errConlin, Patrick; Sridhar, Shyam; Ventzek, Peter
err分享
err收藏
Dependence of dissolution kinetics of poly(4-hydroxystyrene-co-4-t-butoxycarbonyloxystyrene) film on protection ratio of phenolic hydroxyl group in alkyltrimethylammonium hydroxide aqueous developers在烷基三甲基铵氢氧化物水溶液显影剂中，聚(4-羟基苯乙烯-co-4-叔丁氧羰基氧苯乙烯)薄膜的溶解动力学对其酚羟基保护比例的依赖性
errJapanese Journal of Applied Physics
IF1.8
err2026-04-17
err0
PREAI
errMasuda, Takehiro; Ito, Yuko Tsutsui; Cho, Kayoko; Kozawa, Takahiro; Sakamoto, Kazuo; Muramatsu, Makoto
err分享
err收藏
Plasma-free approach to remove SiN:H surface inhibitor (HCl) at room temperature无等离子体方法在室温下去除SiN:H表面抑制剂（HCl）
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-03-01
err0
PREAI
errYang, Tsung-Hsuan; Wang, Ting-Ya; Zhao, Jianping; Ventzek, Peter L. G.; Hwang, Gyeong S.
err分享
err收藏
Data-Driven Yield Estimation and Maximization Using Bayesian Optimization Under Uncertainty基于贝叶斯优化在不确定性下的数据驱动产量估计与最大化
errApplied Sciences-Basel
IF2.5
err2026-03-01
err0
PREAI
errSano, Kei; Kawahito, Daiki; Saito, Yukiya; Moki, Hironori; Djurdjanovic, Dragan
err分享
err收藏
Development for high-aspect-ratio hole etching with hydrogen fluoride gas based cryogenic process基于氢氟酸气体低温工艺的高深宽比孔蚀刻开发
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF1.2
err2025-12-01
err0
PREAI
errSuda, Ryutaro; Yokoi, Masahiko; Zhang, Du; Tsai, Yu-Hao; Tomura, Maju; Kihara, Yoshihide
err分享
err收藏
Dissolution kinetics of poly[4-hydroxystyrene-co-(methyl methacrylate)-co-(methacrylic acid)] in tetraalkylammonium hydroxide aqueous developers聚[4-羟基苯乙烯-co-(甲基丙烯酸甲酯)-co-(甲基丙烯酸)]在四烷基铵氢氧化物水溶液显影液中的溶解动力学
errJapanese Journal of Applied Physics
IF1.8
err2025-12-01
err0
PREAI
errIto, Yuko Tsutsui; Cho, Kayoko; Matsuoka, Kyoko; Kozawa, Takahiro; Hasebe, Takashi; Sakamoto, Kazuo; Muramatsu, Makoto
err分享
err收藏
Dissolution kinetics of polymer films in carboxylate ester developers studied by quartz crystal microbalance method石英晶体微天平法研究聚合物膜在羧酸酯显影剂中的溶解动力学
errJapanese Journal of Applied Physics
IF1.8
err2025-11-01
err0
PREAI
errIto, Yuko Tsutsui; Cho, Kayoko; Matsuoka, Kyoko; Kozawa, Takahiro; Hasebe, Takashi; Sakamoto, Kazuo; Muramatsu, Makoto
err分享
err收藏
Cryogenic-Assisted Hydrogen Fluoride Surface Reactions Enabling Reversibly Ultra-High Selectivity of Atomic Layer Etching Between SiO2 and SiN低温辅助氢氟酸表面反应实现SiO2和SiN之间原子层刻蚀的可逆超高选择性
errSMALL METHODS
IF9.1
err2025-11-01
err0
errOAAI
errHsiao, Shih-Nan; Sekine, Makoto; Suda, Ryutaro; Kihara, Yoshihide; Hori, Masaru
err分享
err收藏
Non-Contact Power Transfer Via Metal Nanoparticle-Dispersed Ionic Liquid
errIEEE Transactions on Semiconductor Manufacturing
IF2.3
err2025-11-01
err0
PREAI
errOkabe, Takao; Tanabe, Shinichi; Umeshita, Naoki; Akimoto, Toshikazu; Miyamoto, Junji; Somaya, Kei
err分享
err收藏
Effect of molecular weight on the dissolution of a thin polystyrene film in n-butyl acetate分子量对聚苯乙烯薄膜在乙酸正丁酯中溶解的影响
errJapanese Journal of Applied Physics
IF1.8
err2025-11-01
err0
PREAI
errKozawa, Mikiko; Ito, Yuko Tsutsui; Matsuoka, Kyoko; Jin, Yuqing; Cho, Kayoko; Kozawa, Takahiro; Sakamoto, Kazuo; Muramatsu, Makoto
err分享
err收藏
Non-destructive lateral cavity etch measurements of 8-superlattice layer nanowire test structures using optical Mueller matrix spectroscopic ellipsometry, x-ray diffraction, and x-ray fluorescence
errJOURNAL OF APPLIED PHYSICS
IF2.5
err2025-10-28
err0
PREAI
errPasikatan, Ezra; Antonelli, G. Andrew; Keller, Nicholas; Kuhn, Markus; Murakami, Satoshi; Kal, Subhadeep; Rednor, Matthew; Tapily, Kandabara; Hetzer, Dave; Schaefer, Mark; Musick, Kevin; Diebold, Alain C.
err分享
err收藏
Microstructural buckling in soft visco-hyperelastic laminates软粘弹性超弹性层压板的微观结构屈曲
errINTERNATIONAL JOURNAL OF SOLIDS AND STRUCTURES
IF3.8
err2025-04-01
err0
errOAAI
errLapina, Tatiana; Xiang, Yuhai; Yao, Qi; Chen, Dean; Li, Ji; Steinmann, Paul; Rudykh, Stephan
err分享
err收藏
In Situ Monitoring Surface Reactions in Cryogenic Atomic Layer Etching of Silicon Nitride by Alternating Surface Modification with Hydrogen Fluoride Dose and Ar Plasmas
errCHEMISTRY OF MATERIALS
IF7
err2024-11-07
err1
PREAI
errHsiao, Shih-Nan; Sekine, Makoto; Iijima, Yuki; Hori, Masaru
err分享
err收藏
Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO2 by Cryogenic-Assisted Surface Reactions
errSMALL METHODS
IF9.1
err2024-06-02
err3
errOAAI
errHsiao, Shih-Nan; Sekine, Makoto; Britun, Nikolay; Mo, Michael K. T.; Imai, Yusuke; Tsutsumi, Takayoshi; Ishikawa, Kenji; Iijima, Yuki; Suda, Ryutaro; Yokoi, Masahiko; Kihara, Yoshihide; Hori, Masaru
err分享
err收藏
Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2展开难以捉摸的区域选择性沉积过程: SiN与SiO2上的TiO2和TiON的原子层沉积
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2024-03-05
err2
PREAI
errMameli, Alfredo; Tapily, Kanda; Shen, Jie; Roozeboom, Fred; Lu, Mengcheng; O'Meara, David; Semproni, Scott P.; Chen, Jiun-Ruey; Clark, Robert; Leusink, Gert; Clendenning, Scott
err分享
err收藏
An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases
errAPPLIED PHYSICS LETTERS
IF3.6
err2023-11-21
err11
PREAI
errHsiao, Shih-Nan; Sekine, Makoto; Ishikawa, Kenji; Iijima, Yuki; Ohya, Yoshinobu; Hori, Masaru
err分享
err收藏
Finite temperature effects on the structural stability of Si-doped HfO2 using first-principles calculations
errAPPLIED PHYSICS LETTERS
IF3.6
err2023-06-29
err1
errOAAI
errHarashima, Y.; Koga, H.; Ni, Z.; Yonehara, T.; Katouda, M.; Notake, A.; Matsui, H.; Moriya, T.; Si, M. K.; Hasunuma, R.; Uedono, A.; Shigeta, Y.
err分享
err收藏
Optimization of uniformity in plasma ashing process using genetic programming
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2023-05-26
err0
PREAI
errMoriya, Tsuyoshi; Suzuki, Yusuke; Yonemichi, Hitoshi; Moki, Hironori
err分享
err收藏