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M

Mykhailo Chundak

University of Helsinki

10H指数
49论文数
259被引数
收录论文 30
发表时间
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Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High-k Rutile Capacitors (Adv. Mater. Interfaces 14/2026)原子层沉积法制备金属二氧化钼薄膜，实现高介电常数金红石电容器 (Adv. Mater. Interfaces 14/2026)
errAdvanced Materials Interfaces
IF4.4
err2026-08-18
err0
errOAAI
errAlexey Ganzhinov; Miika Mattinen; Marko Vehkamäki; Kenichiro Mizohata; Mykhailo Chundak; Georgi Popov; Paavo Porri; Mikko Ritala; Matti Putkonen
err分享
err收藏
Atomic layer deposition of SnO2 thin films using tin(IV) acetate as a novel precursor使用醋酸锡(IV)作为新型前驱体进行SnO2薄膜的原子层沉积
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errDeb, Anjan; Mattinen, Miika; Heikkila, Mikko J.; Chundak, Mykhailo; Vihervaara, Anton; Mizohata, Kenichiro; Ritala, Mikko; Putkonen, Matti
err分享
err收藏
In vacuo investigation of atomic layer deposition of HfO2 thin films on TiN: A low energy ion scattering and x-ray photoelectron spectroscopy study of interface evolution真空中HfO2薄膜在TiN上的原子层沉积研究：界面演化的低能离子散射和X射线光电子能谱研究
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errChundak, Mykhailo; Nieminen, Heta-Elisa; Vehkamaki, Marko; Keranen, Laura; Putkonen, Matti; Ritala, Mikko
err分享
err收藏
Self-aligned patterning by area-selective etching of polymers and area-selective atomic layer deposition: Decreasing polymer flow and activating noncatalytic surface通过聚合物区域选择性刻蚀和区域选择性原子层沉积的自对准图案化：降低聚合物流动并激活非催化表面
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errLasonen, Valtteri; Liyana Pathiranage, Piyumi; Chundak, Mykhailo; Vehkamaki, Marko; Carnoy, Matthias; Borie, Benjamin; Armini, Silvia; Ritala, Mikko
err分享
err收藏
Atomic Layer Etching of Titanium Nitride With O3 and NbCl5采用O3和NbCl5对氮化钛进行原子层刻蚀
errChemNanoMat
IF2.6
err2026-04-27
err0
errOAAI
errJuha Ojala; Mykhailo Chundak; Anton Vihervaara; Mikko Ritala
err分享
err收藏
Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High-k Rutile Capacitors金属二氧化钼薄膜的原子层沉积技术实现高介电常数金红石电容器
errAdvanced Materials Interfaces
IF4.4
err2026-04-01
err0
errOAAI
errGanzhinov, Alexey; Mattinen, Miika; Vehkamaki, Marko; Mizohata, Kenichiro; Chundak, Mykhailo; Popov, Georgi; Porri, Paavo; Ritala, Mikko; Putkonen, Matti
err分享
err收藏
Area selective atomic layer deposition of ruthenium with phenol as a small molecule inhibitor以苯酚作为小分子抑制剂的区域选择性钌原子层沉积
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err0
PREAI
errIsmaeel, Sundas; Chundak, Mykhailo; Ritala, Mikko
err分享
err收藏
Atomic layer etching of molybdenum with O2 and NbCl5使用O2和NbCl5对钼进行的原子层刻蚀
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err0
PREAI
errOjala, Juha; Chundak, Mykhailo; Vihervaara, Anton; Vehkamaki, Marko; Ritala, Mikko
err分享
err收藏
Multimetal Doping and Heterostructure Engineering of RuO2 for Durable and Efficient Oxygen EvolutionRuO2的多金属掺杂和异质结构工程，用于持久有效的析氧
errSMALL SCIENCE
IF8.3
err2025-12-01
err0
errOAAI
errMofakkharulhashan, Md.; Wang, Shiqi; Santos, Hugo L. S.; Chundak, Mykhailo; Ritala, Mikko; Camargo, Pedro H. C.
err分享
err收藏
Plasmon-Enhanced CO2 Methanation over Au@Ru/TiO2 via Nanoscale Control of Ru Shell Thickness通过纳米级控制Ru壳厚度在Au @ Ru/TiO2上进行等离子体增强的CO2甲烷化
errAngewandte Chemie International Edition
IF16.9
err2025-11-03
err0
errOAAI
errFlorian Rathmann; IbrahiM Abdelsalam; Shiqi Wang; Maja M. Kubik; Sana Frindy; Tiago V. Alves; Mykhailo Chundak; Mikko Ritala; Alexander Reznichenko; Matti Reinikainen; Pedro H. C. Camargo
err分享
err收藏
Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin FilmsAgX (X = Cl，Br，I) 薄膜的原子层沉积
errACS OMEGA
IF4.3
err2025-11-01
err0
PREAI
errHeidari, Aida; Popov, Georgi; Hatanpaa, Timo; Weiss, Alexander; Chundak, Mykhailo; Mizohata, Kenichiro; Ritala, Mikko; Kemell, Marianna
err分享
err收藏
Plasmonically Enhanced Hydrogen Evolution on Anisotropic AuPt Nanowires with Submonolayer Pt Surface Coverage等离激元增强的氢气演化在具有亚单层Pt表面覆盖度的各向异性AuPt纳米线上的研究
errSmall
IF12.1
err2025-10-30
err0
errOAAI
errIbrahiM Abdelsalam; Shiqi Wang; Hugo L. S. Santos; Ella Kitching; Pranava Pakala; Mykhailo Chundak; Mikko Ritala; Sarah J. Haigh; Thomas J. A. Slater; Pedro H. C. Camargo
err分享
err收藏
Pinacolborane as a Reducing Agent in the Atomic Layer Deposition of Copper and Bismuth三乙二醇硼烷作为铜和铋原子层沉积中的还原剂
errACS Omega
IF4.3
err2025-10-26
err0
errOAAI
errAnton Vihervaara; Timo Hatanpää; Kenichiro Mizohata; Mykhailo Chundak; Mikko Ritala
err分享
err收藏
Atomic Layer Deposition of Ti x Fe2-x O3 Photoanodes and Photocurrent Response Optimization Using the Response Surface Methodology
errACS OMEGA
IF4.3
err2025-04-01
err0
errOAAI
errDeb, Anjan; Vihervaara, Anton; Popov, Georgi; Chundak, Mykhailo; Abdelaal, Ahmed O.; Santos, Hugo L. S.; Heikkila, Mikko J.; Kemell, Marianna; Camargo, Pedro H. C.; Ritala, Mikko; Putkonen, Matti
err分享
err收藏
Earth-Abundant W18O49 Coupled with Minimal Pt for Enhanced Hydrogen Evolution under Dark and Visible Light Conditions地球丰产W18O49与极少量Pt耦合以增强暗态和可见光条件下的氢气析出
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2025-03-11
err0
errOAAI
errSantos, HLS; Mofakkharulhashan, M; Wang, SQ; Formo, EV; Chundak, M; Ritala, M; Huo, WY; Camargo, PHC
err分享
err收藏
Selective gas phase pulsed etching of oxides with NbCl5用NbCl5对氧化物进行选择性气相脉冲蚀刻
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2025-01-01
err0
errOAAI
errOjala, Juha; Vehkamaeki, Marko; Chundak, Mykhailo; Vihervaara, Anton; Mizohata, Kenichiro; Ritala, Mikko
err分享
err收藏
Area-Selective Etching of Poly(lactic acid) Films via Catalytic Hydrogenolysis and Cracking通过催化氢解和裂化对聚乳酸薄膜进行区域选择性蚀刻
errCHEMISTRY OF MATERIALS
IF7
err2024-11-26
err0
errOAAI
errLasonen, Valtteri; Rajamaki, Viivi; Chundak, Mykhailo; Tois, Eva; Hietala, Sami; Ritala, Mikko
err分享
err收藏
Au@AuPd Core-Alloyed Shell Nanoparticles for Enhanced Electrocatalytic Activity and Selectivity under Visible Light ExcitationAu @ AuPd核-合金壳纳米粒子在可见光激发下增强的电催化活性和选择性
errACS NANO
IF16
err2024-08-20
err1
PREAI
errda Silva, Kaline N.; Shetty, Shwetha; Sullivan-Allsop, Sam; Cai, Rongsheng; Wang, Shiqi; Quiroz, Jhon; Chundak, Mykhailo; dos Santos, Hugo L. S.; Abdelsalam, Ibrahim; Oropeza, Freddy E.; O'shea, Victor A. de la Pena; Heikkinen, Niko; Sitta, Elton; Alves, Tiago V.; Ritala, Mikko; Huo, Wenyi; Slater, Thomas J. A.; Haigh, Sarah J.; Camargo, Pedro H. C.
err分享
err收藏
Atomic Layer Deposition of Molybdenum Carbide Thin Films碳化钼薄膜的原子层沉积
errADVANCED MATERIALS INTERFACES
IF4.4
err2024-07-01
err0
errOAAI
errKarkkainen, Paloma Ruiz; Popov, Georgi; Hatanpaa, Timo; Kemppinen, Antti; Kohopaa, Katja; Bagheri, Mohammad; Komsa, Hannu-Pekka; Heikkila, Mikko; Mizohata, Kenichiro; Chundak, Mykhailo; Deminskyi, Petro; Vihervaara, Anton; Ribeiro, Mario; Hatinen, Joel; Govenius, Joonas; Putkonen, Matti; Ritala, Mikko
err分享
err收藏
Ultralow Catalytic Loading for Optimised Electrocatalytic Performance of AuPt Nanoparticles to Produce Hydrogen and Ammonia超低催化负载量可优化AuPt纳米颗粒的电催化性能以生产氢气和氨
errANGEWANDTE CHEMIE-INTERNATIONAL EDITION
IF16.9
err2024-06-14
err4
errOAAI
errBezerra, Leticia S.; Brasseur, Paul; Sullivan-Allsop, Sam; Cai, Rongsheng; da Silva, Kaline N.; Wang, Shiqi; Singh, Harishchandra; Yadav, Ashok K.; Santos, Hugo L. S.; Chundak, Mykhailo; Abdelsalam, Ibrahim; Heczko, Vilma J.; Sitta, Elton; Ritala, Mikko; Huo, Wenyi; Slater, Thomas J. A.; Haigh, Sarah J.; Camargo, Pedro H. C.
err分享
err收藏

研究方向

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