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S

Silvia Armini

semiconductor technology and system

25H指数
189论文数
2.3K被引数
收录论文 56
发表时间
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Self-aligned patterning by area-selective etching of polymers and area-selective atomic layer deposition: Decreasing polymer flow and activating noncatalytic surface通过聚合物区域选择性刻蚀和区域选择性原子层沉积的自对准图案化：降低聚合物流动并激活非催化表面
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errLasonen, Valtteri; Liyana Pathiranage, Piyumi; Chundak, Mykhailo; Vehkamaki, Marko; Carnoy, Matthias; Borie, Benjamin; Armini, Silvia; Ritala, Mikko
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Photocatalytic TiO2 surface combined with lithography defined area-selective deposition of Ru: Selectivity and defect formation mechanisms光催化TiO2表面结合光刻定义的区域选择性沉积Ru：选择性与缺陷形成机制
errSurfaces and Interfaces
IF6.3
err2025-11-29
err0
PREAI
errJayant K. Lodha; Stefan De Gendt; Silvia Armini
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Wet-Chemical Etching of Metals for Advanced Semiconductor Technology Nodes: Cu Recess Etching and Electrochemistry of Nanopatterned Metal Electrodes
errADVANCED ENGINEERING MATERIALS
IF3.3
err2025-03-01
err0
PREAI
errPhilipsen, Harold; Pasquali, Mattia; Geraerts, Niel; Armini, Silvia
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Oriented and Area-Selective Growth of Zeolitic Imidazolate Framework-8 Films by Molecular Layer Deposition
errCHEMISTRY OF MATERIALS
IF7
err2025-01-03
err0
PREAI
errSmets, Jorid; Rubio-Gimenez, Victor; Gandara-Loe, Jesus; Adriaenssens, Jonas; Fratschko, Mario; Gasser, Fabian; Resel, Roland; Brady-Boyd, Anita; Ninakanti, Rajeshreddy; De Feyter, Steven; Armini, Silvia; Ameloot, Rob
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Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light (vol 14, 982, 2024)
errNANOMATERIALS
IF4.3
err2024-09-18
err0
errOAAI
errKirby, Lauren Colbeck; Lodha, Jayant K.; Astley, Simon; Skelton, Dave; Armini, Silvia; Evans, Andrew; Brady-Boyd, Anita
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Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
errNANOMATERIALS
IF4.3
err2024-07-16
err0
errOAAI
errLodha, Jayant Kumar; Meersschaut, Johan; Pasquali, Mattia; Billington, Hans; Gendt, Stefan De; Armini, Silvia
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Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light
errNANOMATERIALS
IF4.3
err2024-06-05
err1
errOAAI
errColbeck Kirby, Lauren; Lodha, Jayant K.; Astley, Simon; Skelton, Dave; Armini, Silvia; Evans, Andrew; Brady-Boyd, Anita
err分享
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A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2023-05-22
err4
errOAAI
errKaneda, Yukio; Nye, Rachel A. A.; Marques, Esteban A. A.; Armini, Silvia; Delabie, Annelies; van Setten, Michiel J. J.; Pourtois, Geoffrey
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Area-Selective Deposition of AlOx and Al-Silicate for Fully Self- Aligned Via IntegrationAlOx和Al-硅酸盐的区域选择性沉积，以实现完全自对准的通孔集成
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2023-01-17
err5
PREAI
errPasquali, Mattia; Brady-Boyd, Anita; Lesniewska, Alicja; Carolan, Patrick; Conard, Thierry; O'Connor, Robert; De Gendt, Stefan; Armini, Silvia
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Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography自组装单分子层作为区域选择性沉积的抑制剂: 无抗蚀剂EUV光刻的新方法
errAPPLIED SURFACE SCIENCE
IF6.9
err2022-12-01
err8
errOAAI
errLodha, Jayant K.; Pollentier, Ivan; Conard, Thierry; Vallat, Remi; De Gendt, Stefan; Armini, Silvia
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The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition在区域选择性原子层沉积过程中，原子氧在自组装单层分解中的作用
errAPPLIED SURFACE SCIENCE
IF6.9
err2022-06-01
err8
PREAI
errBrady-Boyd, A.; O'Connor, R.; Armini, S.; Selvaraju, V; Pasquali, M.; Hughes, G.; Bogan, J.
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Understanding Selectivity Loss Mechanisms in Selective Material Deposition by Area Deactivation on 10 nm Cu/SiO2 Patterns通过10 nm Cu/SiO2图案上的区域失活来了解选择性材料沉积中的选择性损失机理
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2022-03-29
err10
PREAI
errPasquali, Mattia; Carolan, Patrick; Sergeant, Stefanie; Meersschaut, Johan; Spampinato, Valentina; Conard, Thierry; Viva, Alessandro; De Gendt, Stefan; Armini, Silvia
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Cyclic Plasma Halogenation of Amorphous Carbon for Defect-Free Area-Selective Atomic Layer Deposition of Titanium Oxide
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2021-06-23
err11
errOAAI
errKrishtab, Mikhail; Armini, Silvia; Meersschaut, Johan; De Gendt, Stefan; Ameloot, Rob
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Nanomechanical Characterization of Organic Surface Passivation Films on 50 nm Patterns during Area-Selective Deposition
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2021-06-10
err8
PREAI
errPasquali, Mattia; Sergeant, Stefanie; Conard, Thierry; Spampinato, Valentina; Viva, Alessandro; De Gendt, Stefan; Armini, Silvia
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Understanding the impact of Cu surface pre-treatment on Octadecanethiol-derived self-assembled monolayer as a mask for area-selective deposition
errAPPLIED SURFACE SCIENCE
IF6.9
err2021-02-01
err16
PREAI
errPasquali, Mattia; De Gendt, Stefan; Armini, Silvia
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Enabling bottom-up nanoelectronics fabrication by selective sol-gel dielectric-on-dielectric deposition
errMATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS
IF4.6
err2021-01-01
err0
PREAI
errRedzheb, M.; Armini, S.
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Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer
errLANGMUIR
IF3.9
err2020-10-26
err14
PREAI
errZheng, Li; He, Wei; Spampinato, Valentina; Franquet, Alexis; Sergeant, Stefanie; De Gendt, Stefan; Armini, Silvia
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Hydroquinone oriented growth control to achieve high-quality copper coating at high rate for electronics interconnection
errJOURNAL OF THE TAIWAN INSTITUTE OF CHEMICAL ENGINEERS
IF6.3
err2020-07-01
err17
PREAI
errZheng, Li; Wang, Chong; Cai, Deng'an; Huang, Yunzhong; Adi, Kegu; Hong, Yan; Chen, Yuanming; Zhou, Guoyun; Armini, Silvia; De Gendt, Stefan; Wang, Shouxu; He, Wei
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Structural Phases of Alkanethiolate Self-Assembled Monolayers (C1-12) on Cu[100] by Density Functional Theory密度泛函理论研究Cu[100] 上烷基硫醇自组装膜 (C1-12) 的结构相
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2020-01-23
err6
errOAAI
errClerix, J. J.; Sanz-Matias, A.; Armini, S.; Harvey, J. N.; Delabie, A.
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Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films通过氨基官能化烷氧基硅烷钝化膜的二聚化在纳米级Cu线上进行Ru的区域选择性ALD
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2020-01-08
err27
PREAI
errZyulkov, Ivan; Madhiwala, Viraj; Voronina, Ekaterina; Snelgrove, Matthew; Bogan, Justin; O'Connor, Robert; De Gendt, Stefan; Armini, Silvia
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研究方向

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合作学者
合作期刊
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Mikko Ritala
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J
Jeremy N. Harvey
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P
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H 指数: 79 · 论文数: 794
S
Steven De Feyter
H 指数: 78 · 论文数: 717
A
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H 指数: 64 · 论文数: 765
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