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R

R. Hippler

czech academy of sciences

43H指数
376论文数
7.4K被引数
收录论文 66
发表时间
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Plasma diagnostics and deposition of functional zirconia thin films by reactive magnetron sputtering等离子体诊断及通过反应磁控溅射沉积功能化氧化锆薄膜
errVacuum
IF3.9
err2026-07-01
err0
PREAI
errNaiko, Iryna; Hippler, Rainer; Wulffb, Harm; Helm, Christiane A.; Wallis, Jan; Kruth, Angela; Chvostova, Dagmar; Nepomniashchaia, Natalia; Remes, Zdenek; Olejnicek, Jiri; Cada, Martin; Hubicka, Zdenek
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err收藏
Energy distribution of positively and negatively charged plasma ions of a pulsed magnetron sputtering discharge in an argon/oxygen gas mixture and deposition of functional ZnO films (vol 43, 053002, 2025)脉冲磁控溅射放电中，在氩氧混合气体中正负带电等离子体离子的能量分布及功能性ZnO薄膜的沉积（卷43，053002，2025）
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2025-12-01
err0
PREAI
errHippler, Rainer; Kapran, Anna; Wulff, Harm; Nepomniashchaia, Natalia; Remes, Zdenek; Olejnicek, Jiri; Cada, Martin; Hubicka, Zdenek
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Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering
errMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
IF4.6
err2025-02-01
err0
errOAAI
errPisarikova, A.; Krysova, H.; Kapran, A.; Pisarik, P.; Cada, M.; Olejnicek, J.; Hippler, R.; Hubicka, Z.
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err收藏
Generation of Ammonia in a Pulsed Hollow Cathode Discharge Operated in an Ar/H2/N2 Gas Mixture Detected by Fourier Transform Infrared在通过傅立叶变换红外检测的Ar/H2/N2气体混合物中操作的脉冲空心阴极放电中产生氨
errACS SUSTAINABLE CHEMISTRY & ENGINEERING
IF7.3
err2024-11-15
err0
errOAAI
errHippler, Rainer; Cada, Martin; Knizek, Antonin; Ferus, Martin; Hubicka, Zdenek
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Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture在氩/氧混合气体中使用钨阴极和正偏压阳极的磁控溅射放电中带负电和正电离子的能量分布
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-11-12
err1
PREAI
errHippler, Rainer; Cada, Martin; Hubicka, Zdenek
err分享
err收藏
Ultrafast UV Luminescence of ZnO Films: Sub-30 ps Decay Time with Suppressed Visible Component
errADVANCED OPTICAL MATERIALS
IF7.2
err2024-05-10
err0
PREAI
errCadatal-Raduban, Marilou; Olejnicek, Jiri; Hibino, Kota; Maruyama, Yuki; Pisarikova, Aneta; Shinohara, Keito; Asaka, Toru; Volfova, Lenka Lebedova; Kohout, Michal; Zhang, Jiaqi; Akabe, Yugo; Nakajima, Makoto; Harrison, John A.; Hippler, Rainer; Sarukura, Nobuhiko; Ono, Shingo; Hubicka, Zdenek; Yamanoi, Kohei
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The role of dimers in the efficient growth of nanoparticles
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2023-11-01
err5
PREAI
errCurda, Pavel; Hippler, Rainer; Cada, Martin; Kylian, Ondrej; Stranak, Vitezslav; Hubicka, Zdenek
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err收藏
Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films
errVACUUM
IF3.9
err2023-09-01
err6
PREAI
errKapran, Anna; Hippler, Rainer; Wulff, Harm; Olejnicek, Jiri; Pisarikova, Aneta; Cada, Martin; Hubicka, Zdenek
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Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-06-02
err5
errOAAI
errHippler, R.; Cada, M.; Mutzke, A.; Hubicka, Z.
err分享
err收藏
WO3 and WO3-x thin films prepared by DC hollow cathode discharge直流空心阴极放电制备WO3和WO3-x薄膜
errVACUUM
IF3.9
err2022-01-01
err9
PREAI
errOlejnicek, J.; Hrubantova, A.; Volfova, L.; Dvorakova, M.; Kohout, M.; Tvarog, D.; Gedeon, O.; Wulff, H.; Hippler, R.; Hubicka, Z.
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Surface Stoichiometry and Depth Profile of Tix-CuyNz Thin Films Deposited by Magnetron Sputtering
errMATERIALS
IF3.2
err2021-06-09
err8
errOAAI
errMukhopadhyay, Arun Kumar; Roy, Avishek; Bhattacharjee, Gourab; Das, Sadhan Chandra; Majumdar, Abhijit; Wulff, Harm; Hippler, Rainer
err分享
err收藏
A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge用于等离子体离子能量控制的正偏置外部阳极: 空心阴极和磁控溅射放电
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2021-04-08
err15
errOAAI
errHippler, Rainer; Cada, Martin; Hubicka, Zdenek
err分享
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Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2021-01-01
err18
PREAI
errHippler, R.; Cada, M.; Ksirova, P.; Olejnicek, J.; Jiricek, P.; Houdkova, J.; Wulff, H.; Kruth, A.; Helm, C. A.; Hubicka, Z.
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Time-resolved Langmuir probe diagnostics of a bipolar high power impulse magnetron sputtering discharge
errAPPLIED PHYSICS LETTERS
IF3.6
err2020-02-10
err39
PREAI
errHippler, Rainer; Cada, Martin; Hubicka, Zdenek
err分享
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Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target具有钴靶的氩/氧气混合物中单极和双极脉冲磁控溅射放电的时间分辨光发射光谱
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2019-11-28
err41
errOAAI
errHippler, R.; Cada, M.; Stranak, V; Hubicka, Z.
err分享
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Modified high frequency probe approach for diagnostics of highly reactive plasma
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2019-11-12
err14
PREAI
errSezemsky, Petr; Stranak, Viterslav; Kratochvil, Jiri; Cada, Martin; Hippler, Rainer; Hrabovsky, Miroslav; Hubicka, Zdenek
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Generation of positively and negatively charged molecular ions during sputtering of a copper target by low-energy Ar+ ion bombardment in a dilute argon/oxygen gas mixture在稀氩/氧气混合物中通过低能Ar离子轰击在铜靶溅射过程中产生带正电和带负电的分子离子
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2019-03-12
err5
PREAI
errHippler, Rainer; Denker, Christian
err分享
err收藏
Formation of Cun+ (n=1-3), Arn+ (n=1, 2), and ArCu+ ions during sputtering of a copper surface by low-energy Ar+ ion bombardment in a dilute argon atmosphere在稀氩气氛中通过低能Ar离子轰击在铜表面溅射过程中形成Cun (n = 1-3)，Arn (n = 1，2) 和ArCu离子
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2018-06-29
err4
PREAI
errHippler, Rainer; Denker, Christian
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err收藏
Influence of reactive oxygen species during deposition of iron oxide films by high power impulse magnetron sputtering
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2018-02-14
err13
PREAI
errStranak, V.; Hubicka, Z.; Cada, M.; Bogdanowicz, R.; Wulff, H.; Helm, C. A.; Hippler, R.
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err收藏
Pressure dependence of Ar2+, ArTi+, and Ti2+ dimer formation in a magnetron sputtering discharge
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2017-10-12
err19
PREAI
errHippler, R.; Cada, M.; Stranak, V.; Hubicka, Z.; Helm, C. A.
err分享
err收藏

研究方向

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