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A

Adriaan J. M. Mackus

Leibniz University Hannover

36H指数
102论文数
4.5K被引数
收录论文 57
发表时间
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AdsorPy: A Python Package for Lattice-Based Random Sequential Adsorption SimulationsAdsorPy：一个基于晶格的随机顺序吸附模拟的Python软件包
errJournal of Chemical Theory and Computation
IF5.5
err2026-06-03
err0
errOAAI
errJoost F. W. Maas; Ilker Tezsevin; Marc J. M. Merkx; Tania E. Sandoval; Adriaan J. M. Mackus
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Publishing FAIR and machine-actionable reviews in materials science: The case for symbolic knowledge in neuro-symbolic artificial intelligence在材料科学中发布FAIR和机器可操作的评审：神经符号人工智能中符号知识的案例
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errD'Souza, Jennifer; Auer, Soren; Poupaki, Eleni; Watkins, Alex; Devi, Anjana; Puurunen, Riikka L.; Karasulu, Bora; Mackus, Adriaan; Kessels, Erwin
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Tailored waveform biasing in atomic and molecular plasmas for atomic scale processing原子和分子等离子体中用于原子级处理的定制波形偏置
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err1
PREAI
errFaraz, Tahsin; de Jong, Arthur A.; Verstappen, Yuri G. P.; Lopez, Javier E.; Heijdra, Erik; van Gennip, Wouter J. H.; Kessels, Wilhelmus M. M.; Mackus, Adriaan J. M.
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Designing an agentic AI workflow for structured information extraction from scientific text: A case study on atomic layer deposition of ZnO and IGZO为从科学文本中提取结构化信息设计智能体AI工作流程：ZnO和IGZO原子层沉积的案例分析
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err1
PREAI
errSadruddin, Sameer; Poupaki, Eleni; D'Souza, Jennifer; Auer, Soren; Watkins, Alex; Karasulu, Bora; Mackus, Adriaan J. M.; Kessels, Erwin
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Physical approach to enhance the selectivity of SiO2 area-selective deposition using substrate biasing通过衬底偏压增强SiO2区域选择性沉积选择性的物理方法
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-03-01
err0
PREAI
errde Jong, Arthur A.; Merkx, Marc J. M.; Kessels, Wilhelmus W. M.; Mackus, Adriaan J. M.
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Electronic Structure Descriptors for the Adsorption of Aromatic Molecules on Metals
errChemistry of Materials
IF7
err2026-01-22
err0
errOAAI
errMatías Picuntureo; Ilker Tezsevin; Marc J. M. Merkx; Scott P. Semproni; Jiun-Ruey Chen; Adriaan J. M. Mackus; Tania E. Sandoval
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Growth behavior during metalorganic chemical vapor deposition of MoS2 using di-tert-butyl sulfide as organic sulfur precursor
errNanotechnology
IF2.8
err2026-01-16
err0
errOAAI
errJ H (Sanne) Deijkers; H Medina Silva; A Manasi; S Pasko; W M M (Erwin) Kessels; A J M Mackus; B Groven; A Delabie
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Area-Selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma通过SF6/H2等离子体选择性钝化SiO2实现区域选择性原子层沉积
errChemistry of Materials
IF7
err2025-07-11
err0
errOAAI
errOlaf C. A. Bolkenbaas; Marc J. M. Merkx; Nicholas J. Chittock; Ilker Tezsevin; Wilhelmus M. M. Kessels; Tania E. Sandoval; Adriaan J. M. Mackus
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Topographically selective atomic layer deposition within trenches enabled by an amorphous carbon inhibition layer非晶碳抑制层使沟槽内的形貌选择性原子层沉积成为可能
errAPPLIED PHYSICS LETTERS
IF3.6
err2025-02-11
err0
errOAAI
errJanssen, Thijs; Vossen, Lodewijk J. P.; Verheijen, Marcel A.; Kessels, Wilhelmus M. M.; Mackus, Adriaan J. M.
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Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2025-01-01
err0
errOAAI
errChittock, Nicholas J.; Maas, Joost F. W.; Tezsevin, Ilker; Merkx, Marc J. M.; Knoops, Harm C. M.; Kessels, Wilhelmus M. M. (Erwin); Mackus, Adriaan J. M.
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Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-08-01
err12
errOAAI
errYu, Pengmei; Merkx, Marc J. M.; Tezsevin, Ilker; Lemaire, Paul C.; Hausmann, Dennis M.; Sandoval, Tania E.; Kessels, Wilhelmus M. M.; Mackus, Adriaan J. M.
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In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
errJOURNAL OF CHEMICAL PHYSICS
IF3.1
err2024-05-22
err5
errOAAI
errMerkx, Marc J. M.; Tezsevin, Ilker; Yu, Pengmei; Janssen, Thijs; Heinemans, Rik H. G. M.; Lengers, Rik J.; Chen, Jiun-Ruey; Jezewski, Christopher J.; Clendenning, Scott B.; Kessels, Wilhelmus M. M.; Sandoval, Tania E.; Mackus, Adriaan J. M.
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MoS2 Synthesized by Atomic Layer Deposition as Cu Diffusion Barrier通过原子层沉积合成的MoS2作为Cu扩散阻挡层
errADVANCED MATERIALS INTERFACES
IF4.4
err2023-03-27
err11
errOAAI
errDeijkers, Johanna (Sanne) H.; de Jong, Arthur A.; Mattinen, Miika J.; Schulpen, Jeff J. P. M.; Verheijen, Marcel A.; Sprey, Hessel; Maes, Jan Willem; Kessels, Wilhelmus (Erwin) M. M.; Bol, Ageeth A.; Mackus, Adriaan J. M.
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Computational Investigation of Precursor Blocking during Area- Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
errLANGMUIR
IF3.9
err2023-03-15
err17
errOAAI
errTezsevin, I.; Maas, J. F. W.; Merkx, M. J. M.; Lengers, R.; Kessels, W. M. M.; Sandoval, T. E.; Mackus, A. J. M.
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Foundations of atomic-level plasma processing in nanoelectronics纳米电子学原子级等离子体处理的基础
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2022-10-25
err26
errOAAI
errArts, Karsten; Hamaguchi, Satoshi; Ito, Tomoko; Karahashi, Kazuhiro; Knoops, Harm C. M.; Mackus, Adriaan J. M.; Kessels, Wilhelmus M. M. (Erwin)
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Equivalent electric circuit model of accurate ion energy control with tailored waveform biasing
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2022-03-09
err2
errOAAI
errYu, Qihao; Lemmen, Erik; Vermulst, Bas; Mackus, Adriaan J. M.; Kessels, Wilhelmus M. M. (Erwin); Wijnands, Korneel
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Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2022-03-08
err38
errOAAI
errMerkx, Marc J. M.; Angelidis, Athanasios; Mameli, Alfredo; Li, Jun; Lemaire, Paul C.; Sharma, Kashish; Hausmann, Dennis M.; Kessels, Wilhelmus M. M.; Sandoval, Tania E.; Mackus, Adriaan J. M.
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Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2022-01-31
err17
errOAAI
errVandalon, V.; Mackus, A. J. M.; Kessels, W. M. M.
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Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2021-02-10
err9
errOAAI
errVos, Martijn F. J.; Knoops, Harm C. M.; Kessels, Wilhelmus M. M.; Mackus, Adriaan J. M.
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Identification of highly active surface iron sites on Ni(OOH) for the oxygen evolution reaction by atomic layer deposition
errJOURNAL OF CATALYSIS
IF6.5
err2021-02-01
err11
errOAAI
errBaker, Jon G.; Schneider, Joel R.; de Paula, Camila; Mackus, Adriaan J. M.; Bent, Stacey F.
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研究方向

暂时未获取到该数据
合作学者
合作期刊
T
Thomas F. Jaramillo
H 指数: 111 · 论文数: 583
S
Stacey F. Bent
H 指数: 81 · 论文数: 431
W
W. M. M. Kessels
H 指数: 81 · 论文数: 617
M
M. C. M. van de Sanden
H 指数: 78 · 论文数: 986
李
李君 (Jun Li)
H 指数: 77 · 论文数: 821
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