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B

Boris Hudec

slovak academy of sciences

17H指数
63论文数
2.8K被引数
收录论文 14
发表时间
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The effect of hydrogen annealing on the electrical properties of β-Ga2O3/4H-SiC MOSFETs grown by liquid-injection MOCVD (vol 206, 110402, 2026)液相注射MOCVD生长的β-Ga2O3/4H-SiC MOSFETs经氢气退火对其电学性能的影响（卷206，110402，2026）
errMaterials Science in Semiconductor Processing
IF4.6
err2026-05-23
err0
PREAI
errHrubisak, Fedor; Tapajna, Milan; Egyenes, Fridrich; Pohorelec, Ondrej; Dobrocka, Edmund; Rosova, Alica; Husekova, Kristina; Vincze, Andrej; Noga, Pavol; Izsak, Tibor; Hudec, Boris; Scepka, Tomas; Gucmann, Filip
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The effect of hydrogen annealing on the electrical properties of β-Ga2O3/4H-SiC MOSFETs grown by liquid-injection MOCVD氢退火对采用液相注入MOCVD生长的β-Ga₂O₃/4H-SiC MOSFETs电学性质的影响
errMaterials Science in Semiconductor Processing
IF4.6
err2026-01-07
err0
PREAI
errFedor Hrubišák; Milan Ťapajna; Fridrich Egyenes; Ondrej Pohorelec; Edmund Dobročka; Alica Rosová; Kristína Hušeková; Andrej Vincze; Pavol Noga; Tibor Izsák; Boris Hudec; Tomáš Ščepka; Filip Gucmann
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Enhanced Performance of LiFePO4 Cathodes with Alumina Nanocoating by Atomic Layer Deposition: Insights from Electrochemical; Operando X-ray Diffraction; and X-ray Photoelectron Spectroscopy Analyses通过原子层沉积的氧化铝纳米涂层提高LiFePO4正极性能：电化学、原位X射线衍射和X射线光电子能谱分析的见解
errACS Applied Energy Materials
IF5.5
err2025-07-11
err0
PREAI
errPrangya P. Sahoo; Boris Hudec; Matej Mičušík; Miroslav Mikolášek; Magdaléna Precnerová; Peter Švec Jr.; Peter Nádaždy; Simon Mičky; Muhammad Zubair; Peter Siffalovic; Karol Fröhlich
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Silicon/Graphite Anode Performance Improvement: A Combination of Atomic Layer-Deposited ZnO Coatings with a Fluoroethylene Carbonate Additive硅/石墨负极性能提升：原子层沉积ZnO涂层与氟乙烯碳酸酯添加剂的组合
errACS APPLIED ENERGY MATERIALS
IF5.5
err2025-05-17
err0
PREAI
errSahoo, PP; Güneren, A; Hudec, B; Micusík, M; Svec, P Jr; Precnerová, M; Nada, A; Lencés, Z; Fröhlich, K
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Low-frequency EIS interpretation with the potential to predict the durability of protective coatings低频EIS解释具有预测保护涂层耐久性的潜力
errPROGRESS IN ORGANIC COATINGS
IF7.3
err2024-12-01
err0
PREAI
errMartinez, S.; Hudec, B.; Soic, I.
err分享
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Stabilization of the Solid-Electrolyte-Interphase Layer and Improvement of the Performance of Silicon-Graphite Anodes by Nanometer-Thick Atomic-Layer-Deposited ZnO Films通过纳米厚的原子层沉积的ZnO膜稳定固体电解质相间层并改善硅石墨阳极的性能
errACS APPLIED NANO MATERIALS
IF5.5
err2024-02-10
err1
PREAI
errSahoo, Prangya P.; Guneren, Alper; Hudec, Boris; Mikolasek, Miroslav; Nada, Ahmed; Precnerova, Magdalena; Micusik, Matej; Lences, Zoltan; Nadazdy, Peter; Frohlich, Karol
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Additive Manufacturing in Atomic Layer Processing Mode
errSMALL METHODS
IF9.1
err2022-03-11
err7
errOAAI
errKundrata, Ivan; Barr, Maissa K. S.; Tymek, Sarah; Dohler, Dirk; Hudec, Boris; Bruner, Philipp; Vanko, Gabriel; Precner, Marian; Yokosawa, Tadahiro; Spiecker, Erdmann; Plakhotnyuk, Maksym; Frohlich, Karol; Bachmann, Julien
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SLIM: Simultaneous Logic-in-Memory Computing Exploiting Bilayer Analog OxRAM Devices
errSCIENTIFIC REPORTS
IF3.9
err2020-02-13
err24
errOAAI
errKingra, Sandeep Kaur; Parmar, Vivek; Chang, Che-Chia; Hudec, Boris; Hou, Tuo-Hung; Suri, Manan
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Mitigating Asymmetric Nonlinear Weight Update Effects in Hardware Neural Network Based on Analog Resistive Synapse
errIEEE JOURNAL ON EMERGING AND SELECTED TOPICS IN CIRCUITS AND SYSTEMS
IF3.8
err2018-03-01
err111
errOAAI
errChang, Chih-Cheng; Chen, Pin-Chun; Chou, Teyuh; Wang, I-Ting; Hudec, Boris; Chang, Che-Chia; Tsai, Chia-Ming; Chang, Tian-Sheuan; Hou, Tuo-Hung
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Interface engineered HfO2-based 3D vertical ReRAM界面工程HfO2-based 3D垂直ReRAM
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2016-04-29
err28
PREAI
errHudec, Boris; Wang, I-Ting; Lai, Wei-Li; Chang, Che-Chia; Jancovic, Peter; Frohlich, Karol; Micusik, Matej; Omastova, Maria; Hou, Tuo-Hung
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3D resistive RAM cell design for high-density storage class memory-a review
errSCIENCE CHINA-INFORMATION SCIENCES
IF7.6
err2016-03-09
err50
PREAI
errHudec, Boris; Hsu, Chung-Wei; Wang, I-Ting; Lai, Wei-Li; Chang, Che-Chia; Wang, Taifang; Frohlich, Karol; Ho, Chia-Hua; Lin, Chen-Hsi; Hou, Tuo-Hung
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Resistive switching in HfO2-based atomic layer deposition grown metal insulator metal structures
errAPPLIED SURFACE SCIENCE
IF6.9
err2014-09-01
err22
PREAI
errJancovic, Peter; Hudec, Boris; Dobrocka, Edmund; Derer, Jan; Fedor, Jan; Froehlich, Karol
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Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2014-02-10
err24
errOAAI
errMurakami, Katsuhisa; Rommel, Mathias; Hudec, Boris; Rosova, Alica; Husekova, Kristina; Dobrocka, Edmund; Rammula, Raul; Kasikov, Aarne; Han, Jeong Hwan; Lee, Woongkyu; Song, Seul Ji; Paskaleva, Albena; Bauer, Anton J.; Frey, Lothar; Froehlich, Karol; Aarik, Jaan; Hwang, Cheol Seong
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Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2013-09-04
err34
PREAI
errHudec, Boris; Husekova, Kristina; Rosova, Alica; Soltys, Jan; Rammula, Raul; Kasikov, Aarne; Uustare, Teet; Micusik, Matej; Omastova, Maria; Aarik, Jaan; Froehlich, Karol
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研究方向

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