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H

Hyo‐Chang Lee

Korea Aerospace University

23H指数
240论文数
2.0K被引数
收录论文 56
发表时间
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Plasma Knowledge-Based Polymorphic Engineering for Two-Dimensional Semiconductor Contacts基于等离子体知识的二维半导体接触多形性工程
errACS Nano
IF16
err2026-02-11
err0
PREAI
errJi Won Heo; Gwang-Seok Chae; Gyeong Deok Seo; Dong Hyun Seo; Gi Dan Shim; Han-Woong Choi; Jin-Hoo Seong; Jae-Heon Lee; Hagyoul Bae; Sungjune Park; Hyo-Chang Lee; TaeWan Kim
err分享
err收藏
Tabletop extreme ultraviolet test platform for optical property evaluation of lithography materials用于光刻材料光学特性评价的桌面式极紫外测试平台
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF1.2
err2026-01-01
err0
PREAI
errChoe, Eun-Seok; Kim, Wooram; Kim, Young-Gi; Hwang, Do-Yeon; Yeom, Hee-Jung; Seong, Jin-Hoo; Chae, Gwang-Seok; Lee, Hyo-Chang; Jeong, Hyun-Dam; Chegal, Won; Kim, Dong-Wook; Kim, Jung-Hyung
err分享
err收藏
Measurement of sheath width on the surface using flat-cutoff probe使用平面截止探头测量表面鞘层宽度
errPlasma Sources Science and Technology
IF3.3
err2025-12-17
err0
PREAI
errHee-Jung Yeom; Min Young Yoon; Wooram Kim; Jung-Hyung Kim; Hyo-Chang Lee
err分享
err收藏
Control of silver nanoparticle size and shape in RF-biased inductively coupled plasma systems在射频偏压感应耦合等离子体系统中对银纳米粒子尺寸和形状的控制
errSurfaces and Interfaces
IF6.3
err2025-10-29
err0
PREAI
errJin-Hoo Seong; Min Young Yoon; Hee-Jung Yeom; Yeo Jin Choi; Sung Jin An; TaeWan Kim; Jung-Hyung Kim; Hyo-Chang Lee
err分享
err收藏
Performance study on the low-power RF ion thruster with an optimized grid system低功耗射频离子推进器优化栅极系统的性能研究
errJOURNAL OF APPLIED PHYSICS
IF2.5
err2025-09-28
err0
errOAAI
errChai, Kil-Byoung; Park, Min; Lee, Hyo-Chang
err分享
err收藏
Effect of SiH4 fragments and H radicals on nc-Si:H film deposition in an inductively coupled plasma PECVD
errSURFACES AND INTERFACES
IF6.3
err2025-03-01
err0
errOAAI
errYoon, Min Young; Yeom, Hee-Jung; Jeong, Jong-Ryul; Lee, Hyo-Chang; Kim, Jung-Hyung
err分享
err收藏
Evaluation of H2 Plasma-Induced Damage in Materials for EUV Lithography (vol 11, 2300867, 2024)
errADVANCED MATERIALS INTERFACES
IF4.4
err2024-12-10
err0
errOAAI
errChoe, Eun-Seok; Choi, Seungwook; Kim, Ansoon; Kim, Kwan-Yong; Yeom, Hee-Jung; Yoon, Min Young; Hong, Seongwan; Kim, Dong-Wook; Kim, Jung-Hyung; Lee, Hyo-Chang
err分享
err收藏
Plasma sources for advanced semiconductor applications用于先进半导体应用的等离子体源
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-12-05
err2
errOAAI
errVersolato, Oscar; Kaganovich, Igor; Bera, Kallol; Lill, Thorsten; Lee, Hyo-Chang; Hoekstra, Ronnie; Sheil, John; Nam, Sang Ki
err分享
err收藏
Analysis of uncertainty in measurement of electron temperature in low-pressure inductively coupled plasmas using microwave cutoff probe微波截止探头测量低压电感耦合等离子体电子温度的不确定度分析
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-11-19
err0
PREAI
errYeom, Hee-Jung; Chae, Gwang-Seok; Kim, Jung-Hyung; Lee, Hyo-Chang
err分享
err收藏
Development of a flat cutoff probe covered with a dielectric layer for non-invasive plasma diagnostics开发覆盖有介电层的平面截止探针，用于非侵入性等离子体诊断
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-11-05
err0
PREAI
errChae, Gwang-Seok; Yeom, Hee-Jung; Yoon, Min Young; Kim, Jung-Hyung; Lee, Hyo-Chang
err分享
err收藏
Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing Using Tri-CycleGAN
errJOURNAL OF SENSOR AND ACTUATOR NETWORKS
IF4.2
err2024-11-04
err0
errOAAI
errKang, Minji; Jang, Sung Kyu; Kim, Jihun; Kim, Seongho; Kim, Changmin; Lee, Hyo-Chang; Kang, Wooseok; Choi, Min Sup; Kim, Hyeongkeun; Kim, Hyeong-U
err分享
err收藏
Plasma etching resistance and mechanical properties of polymorph Gd2O3-MgO nanocomposite with Zr phase stabilizer incorporation掺入Zr相稳定剂的多晶型Gd2O3-MgO纳米复合材料的耐等离子体蚀刻性和力学性能
errAPPLIED SURFACE SCIENCE
IF6.9
err2024-11-01
err1
PREAI
errHam, Su Been; Shin, Yu-Bin; Kim, Seonghyeon; Kim, Ha-Neul; Kim, Mi-Ju; Ko, Jae-Woong; Lee, Jae-Wook; Park, Young-Jo; Kim, Jung-Hyung; Lee, Hyo-Chang; Yoon, Seog-Young; Ma, Ho Jin
err分享
err收藏
Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3-Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions
errSCIENTIFIC REPORTS
IF3.9
err2024-03-25
err3
errOAAI
errMa, Ho Jin; Kim, Seonghyeon; Kim, Ha-Neul; Kim, Mi-Ju; Ko, Jae-Woong; Lee, Jae-Wook; Kim, Jung-Hyung; Lee, Hyo-Chang; Park, Young-Jo
err分享
err收藏
Low-Temperature, Universal Synthetic Route for Mesoporous Metal Oxides by Exploiting Synergistic Effect of Thermal Activation and Plasma利用热活化和等离子体协同效应制备介孔金属氧化物的低温通用合成路线
errADVANCED MATERIALS
IF26.8
err2024-01-26
err5
PREAI
errKim, Keon-Woo; Seok, Hyunho; Son, Sihoon; Park, Su-Jeong; Yang, Chanwoo; Lee, Dongho; Lee, Hyo-Chang; Mun, Jihun; Yeom, Hee-Jung; Yoon, Min Young; Park, Bomi; Kim, Se Hyun; Jo, Changshin; Moon, Hong Chul; Kim, Taesung; Kim, Jin Kon
err分享
err收藏
Evaluation of H2 Plasma-Induced Damage in Materials for EUV LithographyEUV光刻材料中H2等离子体引起的损伤评估
errADVANCED MATERIALS INTERFACES
IF4.4
err2023-12-14
err3
errOAAI
errChoe, Eun-Seok; Choi, Seungwook; Kim, Ansoon; Kim, Kwan-Yong; Yeom, Hee-Jung; Yoon, Min Young; Hong, Seongwan; Kim, Dong-Wook; Kim, Jung-Hyung; Lee, Hyo-Chang
err分享
err收藏
Unintended gas breakdowns in narrow gaps of advanced plasma sources for semiconductor fabrication industry用于半导体制造行业的先进等离子体源的狭窄间隙中的意外气体击穿
errAPPLIED PHYSICS LETTERS
IF3.6
err2023-12-05
err6
errOAAI
errSon, Sung Hyun; Go, Geunwoo; Villafana, Willca; Kaganovich, Igor D.; Khrabrov, Alexander; Lee, Hyo-Chang; Chung, Kyoung-Jae; Chae, Gwang-Seok; Shim, Seungbo; Na, Donghyeon; Kim, June Young
err分享
err收藏
Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres不同CF4/Ar/O2等离子体气氛下Y2O3-MgO纳米复合材料的理化腐蚀特性及表面分析
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-12-01
err9
PREAI
errMa, Ho Jin; Park, Young-Jo; Kim, Mi-Ju; Kim, Ha-Neul; Ko, Jae-Woong; Lee, Jae-Wook; Kim, Jung-Hyung; Lee, Hyo-Chang
err分享
err收藏
Temperature-Dependent Phase Transition in WS2 for Reinforcing Band-to-Band Tunneling and Photoreactive Random Access Memory ApplicationWS2中与温度有关的相变，用于增强带间隧穿和光反应性随机存取存储器应用
errSMALL SCIENCE
IF8.3
err2023-11-21
err2
errOAAI
errWoo, Gunhoo; Cho, Jinill; Yeom, Heejung; Yoon, Min Young; Eom, Geon Woong; Kim, Muyoung; Mun, Jihun; Lee, Hyo Chang; Kim, Hyeong-U; Yoo, Hocheon; Kim, Taesung
err分享
err收藏
Experimental validation of particle-in-cell/Monte Carlo collisions simulations in low-pressure neon capacitively coupled plasmas低压氖电容耦合等离子体中单元内粒子/蒙特卡罗碰撞模拟的实验验证
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2023-11-02
err3
errOAAI
errPark, Chan-Won; Horvath, B.; Derzsi, A.; Schulze, J.; Kim, J. H.; Donko, Z.; Lee, Hyo-Chang
err分享
err收藏
Plasma low-energy ion flux induced vertical graphene synthesis等离子体低能离子流诱导垂直石墨烯合成
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-11-01
err5
errOAAI
errYoon, Min Young; Jeong, Jong-Ryul; Lee, Hyo-Chang; Kim, Jung-Hyung
err分享
err收藏

研究方向

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