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Jin‐Seong Park

hanyang university

63H指数
552论文数
1.7W被引数
收录论文 234
发表时间
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Backbone-Length-Optimized Inhibitors Deliver Long-Retention Selectivity in Area-Selective ALD of VO2骨架长度优化的抑制剂在区域选择性ALD沉积V2O5中实现长效选择性
err2026-05-15
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errOAAI
errHae Lin Yang; Eun Chong Cho; Minchan Kim; Hye In Park; Ga-young Lee; Seunghwan Lee; Beomseok Kim; Changhwa Jung; Youngkwon Kim; Jin-Seong Park
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High-Temperature-Stable Polycrystalline ALD-InGaO Channels Enabled by Buffer-Layer Engineering高温稳定的多晶ALD-InGaO通道通过缓冲层工程实现
err2026-03-01
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PREAI
errKim, Dong-Gyu; Oh, Hye-Jin; Cho, Tae Woong; Kwag, Jae-Hyeok; Hur, Jaeseok; Choi, Sunghyun; Park, Kwangmin; Park, Jin-Seong
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High-temperature interfacial stability of In2O3 FETs with SiO2 versus Al2O3 insulators enabling 3 nm channel scalingIn₂O₃ FETs在SiO₂与Al₂O₃绝缘体下的高温界面稳定性,实现3 nm沟道缩放
err2026-02-09
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PREAI
errHye-Jin Oh; Jun-Yeoub Lee; Jun Young Beom; Ji Eun Sun; Chi-Hoon Lee; Chang-Kyun Park; Duho Kim; Minhyuk Kim; Junseok Lee; Seunghyun Cho; Donghwan Lee; Jinhyuk Yoo; Jin-Seong Park
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Cocktail Precursor Approach for Homogeneous ALD InGaO Film Growth Overcoming Limits of Mobility–Reliability Trade-Off in Oxide Semiconductors
err2026-01-22
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PREAI
errSeong-Hwan Ryu; Dong-Gyu Kim; Haklim Koo; Kyuhyun Yeom; Dae Won Ryu; Chang-Kyun Park; Jin-Seong Park
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Precursor ligand chemistry-driven engineering of SiNx gate insulators for enhanced IGZO TFTs前驱体配体化学驱动的SiNx栅绝缘体工程,用于增强IGZO TFTs
err2025-10-27
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PREAI
errTae Heon Kim; Sang-Hyun Kim; YuJin Yang; Ji Min Kim; Tae-Kyung Kim; Ki-Cheol Song; Yeonhee Lee; Jin-Seong Park
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Precursor-driven nucleation and texture control governing resistivity in low-temperature In2O3 films前驱体驱动的成核与织构控制对低温In₂O₃薄膜电阻率的调控
err2025-10-19
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PREAI
errTae-Kyung Kim; Ji-Hyun Gwoen; Ju-Hwan Han; Hae-Dam Kim; Ji Min Kim; Tae-Heon Kim; Sang-Hyun Kim; Ki-Cheol Song; Jin-Seong Park
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Atomic layer deposition原子层沉积
err2025-10-16
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PREAI
errErwin Kessels; Anjana Devi; Jin-Seong Park; Mikko Ritala; Angel Yanguas-Gil; Claudia Wiemer
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Unlocking the synergy of ALD and ALE: tailoring crystallinity and etch rates in ZnO thin films at the atomic scale解锁ALD与ALE的协同作用:在原子尺度上调控ZnO薄膜的结晶度和蚀刻速率
err2025-09-26
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PREAI
errJi Hyun Gwoen; Hae Lin Yang; Min Chan Kim; Gyeong Min Jeong; Tae Kyung Kim; Cas Visser; Wilhelmus M.M. (Erwin) Kessels; Jin-Seong Park
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