未登录

Y

Yoshinori Takao

Yokohama National University

H指数:24

被引数:1,865

个人简介

暂无内容

教育背景

暂无内容

工作经历

暂无内容

荣誉奖项

暂无内容

High-density nano-capillary ionic liquid electrospray thrusters with improved emitter uniformity and extended operating voltage range

高密度纳米毛细管离子液体电喷雾推进器，具有改进的发射器均匀性和扩展的工作电压范围

Acta Astronautica

IF3.4

2026-08-010

OAAI

Electrospray Characteristics of High-Energetic Ionic Liquids: Ammonium Dinitramide and Hydroxyethylhydrazinium Nitrate

Journal of Propulsion and Power

IF2.4

2025-11-010

PRE

Variability trend and geometry effect of a single emitter on ion emission in passively fed porous ionic liquid electrospray thrusters

被动供液的孔隙离子液体电喷雾推进器中单个发射体对离子发射的变异性趋势与几何效应

Journal of Physics D: Applied Physics

IF3.2

2025-10-300

OAAI

Magnetic field configuration effects on a miniature DC ion thruster with an inverted potential structure

磁场配置对具有反向电势结构的微型直流离子推力器的影响

ACTA ASTRONAUTICA

IF3.4

2024-06-010

PRE

Oxidation Resistance Improvement of Graphene-Oxide-Semiconductor Planar-Type Electron Sources Using h-BN as an Oxygen-Resistant, Electron-Transmissive Coating

IF4.3

2022-09-063

OAAI

Experimental study on the performance characteristics of a miniature microwave discharge cathode

微型微波放电阴极性能特性的实验研究

ACTA ASTRONAUTICA

IF3.4

2022-07-018

OAAI

Axial momentum gains of ions and electrons in magnetic nozzle acceleration

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2021-11-259

OA

Low-power-consumption, high-current-density, and propellantless cathode using graphene-oxide-semiconductor structure array

ACTA ASTRONAUTICA

IF3.4

2020-09-017

OAAI

Mechanism of Highly Efficient Electron Emission from a Graphene/Oxide/Semiconductor Structure

ACS APPLIED ELECTRONIC MATERIALS

IF4.7

2020-07-0625

PREAI

Low-magnetic-field enhancement of thrust imparted by a stepped-diameter and downstream-gas-injected rf plasma thruster

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2019-08-2112

PREAI

High-performance planar-type electron source based on a graphene-oxide-semiconductor structure

APPLIED PHYSICS LETTERS

IF3.6

2019-05-3028

OAAI

Thrust imparted by a stepped-diameter magnetic nozzle rf plasma thruster

APPLIED PHYSICS LETTERS

IF3.6

2018-07-1714

OAAI

Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation (vol 50, 414001, 2017)

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2017-10-261

PREAI

Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2017-09-1520

PREAI

Surface smoothing during plasma etching of Si in Cl2

APPLIED PHYSICS LETTERS

IF3.6

2016-11-147

OAAI

Modifications of plasma density profile and thrust by neutral injection in a helicon plasma thruster

APPLIED PHYSICS LETTERS

IF3.6

2016-11-0733

OAAI

Neutral-depletion-induced axially asymmetric density in a helicon source and imparted thrust

APPLIED PHYSICS LETTERS

IF3.6

2016-02-1835

OAAI

Three-dimensional particle-in-cell simulation of a miniature plasma source for a microwave discharge ion thruster

微波放电离子推力器微型等离子体源的三维粒子模拟

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2014-12-0445

OAAI

Plasma chemical behaviour of reactants and reaction products during inductively coupled CF4 plasma etching of SiO2

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2009-09-1842

PRE

Microwave-excited microplasma thruster: a numerical and experimental study of the plasma generation and micronozzle flow

JOURNAL OF PHYSICS D-APPLIED PHYSICS

IF3.2

2008-09-1519

PREAI