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S

Shyam Sridhar

tokyo electron ltd

8H指数
27论文数
172被引数
收录论文 6
发表时间
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Preferential Halogen Adsorption on Si, Ge, and SiGe Surfaces for Selective Etching在Si、Ge和SiGe表面选择性刻蚀中的卤素优先吸附
errACS Applied Engineering Materials
IF3.5
err2026-05-22
err0
PREAI
errLongo, Roberto C.; Conlin, Patrick; Sridhar, Shyam; Ventzek, Peter L. G.
err分享
err收藏
Designing pulsed plasma etch processes by genetic algorithm基于遗传算法的脉冲等离子体刻蚀工艺设计
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2026-05-01
err0
PREAI
errConlin, Patrick; Sridhar, Shyam; Ventzek, Peter
err分享
err收藏
Functionalization of Polymer Surfaces for Organic Photoresist Materials聚合物表面功能化用于有机光刻胶材料
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2025-01-13
err0
PREAI
errLongo, RC; Lang, XY; Sridhar, S; Cho, K; Ventzek, PLG
err分享
err收藏
Ordering of lamellar block copolymers on oxidized silane coatings
errEUROPEAN POLYMER JOURNAL
IF6.3
err2016-02-01
err4
errOAAI
errMahadevapuram, Nikhila; Mitra, Indranil; Sridhar, Shyam; Strzalka, Joseph; Stein, Gila E.
err分享
err收藏
Ignition delay of a pulsed inductively coupled plasma (ICP) in tandem with an auxiliary ICP与辅助ICP串联的脉冲感应耦合等离子体 (ICP) 的点火延迟
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2015-11-03
err12
PREAI
errLiu, Lei; Sridhar, Shyam; Donnelly, Vincent M.; Economou, Demetre J.
err分享
err收藏
Monte Carlo simulation strategies for computing the wetting properties of fluids at geometrically rough surfaces
errJOURNAL OF CHEMICAL PHYSICS
IF3.1
err2011-11-09
err53
PREAI
errKumar, Vaibhaw; Sridhar, Shyam; Errington, Jeffrey R.
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
K
Kyeongjae Cho
H 指数: 87 · 论文数: 574
V
Vincent M. Donnelly
H 指数: 56 · 论文数: 273
D
Demetre J. Economou
H 指数: 45 · 论文数: 245
J
Jeffrey R. Errington
H 指数: 44 · 论文数: 122
J
Joseph Strzalka
H 指数: 44 · 论文数: 234
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