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Electron-beam patterned calibration structures for structured illumination microscopy
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DOI：10.1038/s41598-022-24502-0.png)
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摘要
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Super-resolution fluorescence microscopy can be achieved by image reconstruction after spatially patterned illumination or sequential photo-switching and read-out. Reconstruction algorithms and microscope performance are typically tested using simulated image data, due to a lack of strategies to pattern complex fluorescent patterns with nanoscale dimension control. Here, we report direct electron-beam patterning of fluorescence nanopatterns as calibration standards for super-resolution fluorescence. Patterned regions are identified with both electron microscopy and fluorescence labelling of choice, allowing precise correlation of predefined pattern dimensions, a posteriori obtained electron images, and reconstructed super-resolution images.
Keyword:
RECONSTRUCTION ALGORITHM
IMAGE-RECONSTRUCTION
PHASE
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期刊
IF:
3.9
论文数:
28.0W
被引数:
83.5W
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