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SaveShare Save Share Save Share Save Share Save Share Save Share Save Share Save Share Save Share Save Share Save Non-destructive lateral cavity etch measurements of 8-superlattice layer nanowire test structures using optical Mueller matrix spectroscopic ellipsometry, x-ray diffraction, and x-ray fluorescence
Pasikatan, Ezra; Antonelli, G. Andrew; Keller, Nicholas; Kuhn, Markus; Murakami, Satoshi; Kal, Subhadeep; Rednor, Matthew; Tapily, Kandabara; Hetzer, Dave; Schaefer, Mark; Musick, Kevin; Diebold, Alain C. Share Save Share Save Share Save Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO2 by Cryogenic-Assisted Surface ReactionsHsiao, Shih-Nan; Sekine, Makoto; Britun, Nikolay; Mo, Michael K. T.; Imai, Yusuke; Tsutsumi, Takayoshi; Ishikawa, Kenji; Iijima, Yuki; Suda, Ryutaro; Yokoi, Masahiko; Kihara, Yoshihide; Hori, Masaru Share Save Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2Mameli, Alfredo; Tapily, Kanda; Shen, Jie; Roozeboom, Fred; Lu, Mengcheng; O'Meara, David; Semproni, Scott P.; Chen, Jiun-Ruey; Clark, Robert; Leusink, Gert; Clendenning, Scott Share Save Share Save Finite temperature effects on the structural stability of Si-doped HfO2 using first-principles calculationsHarashima, Y.; Koga, H.; Ni, Z.; Yonehara, T.; Katouda, M.; Notake, A.; Matsui, H.; Moriya, T.; Si, M. K.; Hasunuma, R.; Uedono, A.; Shigeta, Y. Share Save Share Save Share Save 
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