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H

Hyoungsub Kim

sungkyunkwan university (skku)

39H指数
240论文数
8.4K被引数
收录论文 95
发表时间
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Lateral Leakage Suppression Using H2 Plasma-Treated SiNx for High-Resolution Organic Displays利用H2等离子体处理的SiNx抑制横向泄漏以实现高分辨率有机显示
errIEEE Electron Device Letters
IF4.5
err2026-01-19
err0
PREAI
errJoohee Oh; Moonchurl Kim; Changyu Park; Byeongjun Joo; Sangho Park; Jongwook Jeon; Hyoungsub Kim
err分享
err收藏
From N-type doping to phase transition in large-area MoS2via controlled sulfur vacancy formation从N型掺杂到大面积mos2中的相变通过控制硫空位的形成
errNANOSCALE
IF5.1
err2025-10-01
err0
PREAI
errKim, Jimin; Kang, Jieun; Han, Hyewon; Jeong, Sunjae; Kim, Siyeon; Lee, Heesoo; Kim, Hyoungsub; Kim, Yongil; Yeom, Geunyoung
err分享
err收藏
Novel p-Type Bulk-Inserted Bitline Pad Structure for Efficient Erase Operation in Vertical NAND Flash Memory新型p型体插入位线垫结构，用于垂直NAND闪存的高效擦除操作
errIEEE Transactions on Electron Devices
IF3.2
err2025-08-01
err0
PREAI
errChoasub Kim; Jiwook Hong; Moonchurl Kim; Hyoungsub Kim; Jongwook Jeon
err分享
err收藏
Post-Treatment of Monolayer MoS2 Field-Effect Transistors with H2O Vapor: Alleviation of Remote Channel DopingH2O蒸汽后处理单层MoS2场效应晶体管：缓解远程通道掺杂
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2025-01-07
err0
PREAI
errLee, H; Kim, B; Jang, M; Kwon, S; Lee, D; Kang, S; Park, J; Kang, K; Kim, H
err分享
err收藏
Ultrathin Al2O3 interfacial layer for Hf0.5Zr0.5O2-based ferroelectric field-effect transistors
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2023-12-22
err1
PREAI
errLee, Jehoon; Eom, Deokjoon; Lee, Heesoo; Lee, Woohui; Oh, Joohee; Park, Changyu; Kim, Hyoungsub
err分享
err收藏
Direct growth and interface reactions of ferroelectric Hf0.5Zr0.5O2 films on MoS2MoS2上铁电Hf0.5Zr0.5O2薄膜的直接生长和界面反应
errAPPLIED SURFACE SCIENCE
IF6.9
err2023-08-01
err0
PREAI
errLeem, Mirine; Eom, Deokjoon; Lee, Heesoo; Park, Kwangwuk; Jeong, Kwangsik; Kim, Hyoungsub
err分享
err收藏
Wafer-Scale Epitaxial Growth of an Atomically Thin Single-Crystal Insulator as a Substrate of Two-Dimensional Material Field-Effect Transistors
errNANO LETTERS
IF9.1
err2023-03-17
err1
PREAI
errKim, Eun Hye; Lee, Do Hee; Gu, Tae Jun; Yoo, Hyobin; Jang, Yamujin; Jeong, Jaemo; Kim, Hyun-Woo; Kang, Seog-Gyun; Kim, Hoijoon; Lee, Heesoo; Jo, Kyu-Jin; Kim, Beom Ju; Kim, Jin Wook; Im, Seong Hyun; Oh, Chang Seok; Lee, Changgu; Kim, Ki Kang; Yang, Cheol-Woong; Kim, Hyoungsub; Kim, Youngkuk; Kim, Philip; Whang, Dongmok; Ahn, Joung Real
err分享
err收藏
Electrical Properties of HfO2 on Si1-XGeX Substrates Pretreated Using a Y Precursor with and without Subsequent Oxidant Pulsing
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2023-02-01
err0
PREAI
errLee, Woohui; Lee, Jehoon; Eom, Deokjoon; Oh, Joohee; Park, Changyu; Kim, Jinyong; Shin, Hyungchul; Kim, Hyoungsub
err分享
err收藏
Combined effects of the deposition temperature and metal electrodes on ferroelectric properties of atomic-layer-deposited Hf0.5Zr0.5O2 films
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2023-01-12
err2
PREAI
errEom, Deokjoon; Lee, Jehoon; Lee, Woohui; Oh, Joohee; Park, Changyu; Kim, Jinyong; Lee, Hyangsook; Lee, Eunha; Kim, Hyoungsub
err分享
err收藏
Sublayer thickness dependence of nanolaminated HfO2-Al2O3 films for ferroelectric phase stabilization
errAPPLIED PHYSICS LETTERS
IF3.6
err2022-06-02
err9
PREAI
errLee, Jehoon; Eom, Deokjoon; Lee, Changmin; Lee, Woohui; Oh, Joohee; Park, Changyu; Kim, Jinyong; Lee, Hyangsook; Lee, Sangjun; Lee, Eunha; Kim, Hyoungsub
err分享
err收藏
Thermal stability of MgO film on Si grown by atomic layer deposition using Mg(EtCp)2 and H2O
errCERAMICS INTERNATIONAL
IF5.6
err2021-11-01
err4
PREAI
errPark, Changyu; Lee, Changmin; Lee, Woohui; Lee, Jehoon; Kim, Jinyong; Eom, Deokjoon; Oh, Joohee; Lee, Sung-Hae; Kim, Hyoungsub
err分享
err收藏
Ferroelectric switching in GeTe through rotation of lone-pair electrons by Electric field-driven phase transition通过电场驱动的相变通过孤对电子的旋转在GeTe中进行铁电切换
errAPPLIED MATERIALS TODAY
IF6.9
err2021-09-01
err9
PREAI
errJeong, Kwangsik; Lee, Hyangsook; Lee, Changwoo; Wook, Lim Hyeon; Kim, Hyoungsub; Lee, Eunha; Cho, Mann-Ho
err分享
err收藏
Unveiling the Origin of Robust Ferroelectricity in Sub-2 nm Hafnium Zirconium Oxide Films揭示亚2纳米铪锆氧化物薄膜中稳健铁电性的起源
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2021-07-26
err29
PREAI
errLee, Hyangsook; Choe, Duk-Hyun; Jo, Sanghyun; Kim, Jung-Hwa; Lee, Hyun Hwi; Shin, Hyun-Joon; Park, Yeehyun; Kang, Seunghun; Cho, Yeonchoo; Park, Seontae; Moon, Taehwan; Eom, Deokjoon; Leem, Mirine; Kim, Yunseok; Heo, Jinseong; Lee, Eunha; Kim, Hyoungsub
err分享
err收藏
Sulfidation characteristics of amorphous nonstoichiometric Mo-oxides for MoS2 synthesis
errAPPLIED SURFACE SCIENCE
IF6.9
err2021-01-01
err6
PREAI
errKim, Hoijoon; Park, Taejin; Leem, Mirine; Lee, Hyangsook; Ahn, Wonsik; Lee, Eunha; Kim, Hyoungsub
err分享
err收藏
Effect of H2S pre-annealing treatment on interfacial and electrical properties of HfO2/Si1-xGex (x=0-0.3)
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2021-01-01
err4
PREAI
errLee, Woohui; Lee, Changmin; Kim, Jinyong; Lee, Jehoon; Eom, Deokjoon; Park, Jae Chan; Park, Tae Joo; Kim, Hyoungsub
err分享
err收藏
Effect of Al2O3/Alucone nanolayered composite overcoating on reliability of Ag nanowire electrodes under bending fatigue
errJOURNAL OF ALLOYS AND COMPOUNDS
IF6.3
err2020-12-01
err6
PREAI
errHwang, Byungil; Qaiser, Nadeem; Lee, Changmin; Matteini, Paolo; Yoo, Seung Jo; Kim, Hyoungsub
err分享
err收藏
Resistive switching and synaptic behaviors of an HfO2/Al2O3 stack on ITO for neuromorphic systems
errJOURNAL OF ALLOYS AND COMPOUNDS
IF6.3
err2020-06-01
err66
PREAI
errMahata, Chandreswar; Lee, Changmin; An, Youngseo; Kim, Min-Hwi; Bang, Suhyun; Kim, Chae Soo; Ryu, Ji-Ho; Kim, Sungjun; Kim, Hyoungsub; Park, Byung-Gook
err分享
err收藏
Intriguing morphological evolution during chemical vapor deposition of HfS2 using HfCl4 and S on sapphire substrate
errAPPLIED SURFACE SCIENCE
IF6.9
err2020-04-01
err5
PREAI
errLeem, Mirine; Lee, Hyangsook; Park, Taejin; Ahn, Wonsik; Kim, Hoijoon; Lee, Eunha; Kim, Hyoungsub
err分享
err收藏
Characteristics of an Amorphous Carbon Layer as a Diffusion Barrier for an Advanced Copper Interconnect
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2019-12-17
err26
PREAI
errAn, Byeong-Seon; Kwon, Yena; Oh, Jin-Su; Lee, Changmin; Choi, Seongheum; Kim, Hyoungsub; Lee, Miji; Pae, Sangwoo; Yang, Cheol-Woong
err分享
err收藏
Trap-assisted high responsivity of a phototransistor using bi-layer MoSe2 grown by molecular beam epitaxy使用分子束外延生长的双层MoSe2的陷阱辅助光电晶体管的高响应度
errAPPLIED SURFACE SCIENCE
IF6.9
err2019-11-01
err9
PREAI
errChoi, Yoon-Ho; Kwon, Gi-Hyeon; Jeong, Jae-Hun; Jeong, Kwang-Sik; Kwon, Hyeokjae; An, Youngseo; Kim, Minju; Kim, Hyoungsub; Yi, Yeonjin; Im, Seongil; Cho, Mann-Ho
err分享
err收藏

研究方向

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