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C

Chang-Min Lim

myongji university

5H指数
13论文数
55被引数
收录论文 6
发表时间
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Precise control of low-energy electron beam for selective radical density control低能电子束的精确控制以实现对自由基密度的选择性控制
errPlasma Sources Science and Technology
IF3.3
err2026-02-12
err0
PREAI
errMin-Seok Kim; Changmin Lim; Hyunho Nahm; Chin-Wook Chung
err分享
err收藏
22 kW LCC-CCL wireless charging system for 800 V electric vehicles with integrated PFC-buck-IPT control22 kW LCC-CCL无线充电系统，用于800 V电动汽车，并集成PFC-降压-IPT控制
errJournal of Power Electronics
IF1.3
err2026-02-01
err0
PREAI
errLim, Chang-Min; Yeom, Jeong-Won; Chung, Seung-Min; Lee, Il-Oun
err分享
err收藏
Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature Plasma利用超低电子温度等离子体对SiO2进行原子层刻蚀
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2025-05-05
err0
PREAI
errPark, J; Kim, N; Choi, JE; Yeo, Y; Kim, MS; Lim, CM; Seo, BJ; Chung, CW
err分享
err收藏
Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films Using Ultralow Electron Temperature Plasma利用超低电子温度等离子体增强原子层沉积法制备TiN薄膜
errACS APPLIED MATERIALS & INTERFACES
IF0
err2025-02-07
err1
PREAI
errKim, MS; Lim, CM; Kim, SH; Kim, D; Jeon, H; Chung, CW
err分享
err收藏
Low-damage etching of poly-Si and SiO2 via a low-energy electron beam in inductively coupled CF4 plasma在感应耦合CF4等离子体中通过低能电子束对多晶硅和SiO2进行低损伤蚀刻
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-10-11
err0
PREAI
errJung, Jiwon; Kim, Jae-Hwi; Lim, Chang-Min; Choi, Jung-Eun; Bae, Junil; Kim, Hyung-Dong; Chung, Chin-Wook
err分享
err收藏
Damage-Free Plasma Source for Atomic-Scale Processing
errNANO LETTERS
IF9.1
err2024-09-06
err1
PREAI
errPark, Junyoung; Jung, Jiwon; Kim, Min-Seok; Lim, Chang-Min; Choi, Jung-Eun; Kim, Nayeon; Kim, Ju-Ho; Chung, Chin-Wook
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
H
Hyeongtag Jeon
H 指数: 39 · 论文数: 385
S
Sung Hoon Kim
H 指数: 33 · 论文数: 201
C
Chin‐Wook Chung
H 指数: 28 · 论文数: 382
D
Dong‐Min Kim
H 指数: 20 · 论文数: 61
N
Nayeon Kim
H 指数: 19 · 论文数: 114
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