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C

Chin‐Wook Chung

hanyang university

28H指数
382论文数
3.0K被引数
收录论文 79
发表时间
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Transparent electrical–optical probe for noninvasive plasma diagnostics透明电光探头用于无创等离子体诊断
errPlasma Sources Science and Technology
IF3.3
err2026-03-02
err0
PREAI
errBeom-Jun Seo; Kyung-Hyun Kim; Se-hun Ahn; Deok-Hwan Kim; Un Jae Jung; Chin-Wook Chung
err分享
err收藏
Low-energy electron beam control via magnetic confinement and acceleration voltage: implications for photoresist etching通过磁场约束和加速电压的低能电子束控制：对光刻胶刻蚀的影响
errPlasma Sources Science and Technology
IF3.3
err2026-03-02
err0
PREAI
errJu-Ho Kim; Yi-Lang Jiang; Yeong Jae Jeong; Jae-Hwi Kim; Chin-Wook Chung
err分享
err收藏
Precise control of low-energy electron beam for selective radical density control低能电子束的精确控制以实现对自由基密度的选择性控制
errPlasma Sources Science and Technology
IF3.3
err2026-02-12
err0
PREAI
errMin-Seok Kim; Changmin Lim; Hyunho Nahm; Chin-Wook Chung
err分享
err收藏
Anomalous electron density of helium; neon; and argon plasmas in high-pressure E-mode inductively coupled plasma氦、氖和氩等离子体在高气压E模感应耦合等离子体中的异常电子密度
errPlasma Sources Science and Technology
IF3.3
err2026-02-10
err0
PREAI
errMin-Seok Kim; Young Hun-Hong; Chin-Wook Chung
err分享
err收藏
Simultaneous ion and electron beam etching for charge-free and low-damage silicon processing
errPlasma Sources Science and Technology
IF3.3
err2026-01-29
err0
PREAI
errGaae Kim; Min-Seok Kim; Chin-Wook Chung
err分享
err收藏
The impact of accelerated electrons on electronegativity in an inductively coupled oxygen plasma with a DC-biased grid在直流偏置栅极的感应耦合氧等离子体中，加速电子对电负性的影响
errPlasma Sources Science and Technology
IF3.3
err2025-12-24
err0
PREAI
errNayeon Kim; Min-Seok Kim; Jiwon Jung; Chin-Wook Chung
err分享
err收藏
Realizing Vertical Etch Profiles in Fluorine-Rich Ar/CF4 Plasma在富氟Ar/CF4等离子体中实现垂直刻蚀形貌
errAdvanced Materials Interfaces
IF4.4
err2025-12-08
err0
errOAAI
errJunyoung Park; Nayeon Kim; Jung-Eun Choi; Yujin Yeo; Min-Seok Kim; Beom-Jun Seo; Chin-Wook Chung
err分享
err收藏
Investigation of the interactions of NF3-based plasma with Y2O3 and YF3 coatings: Focus on contamination particle generation and wall redepositionNF3基等离子体与Y2O3和YF3涂层的相互作用研究：聚焦于污染物颗粒生成和壁面再沉积
errJournal of the European Ceramic Society
IF6.2
err2025-11-01
err0
PREAI
errJongho So; Inseok Jeong; Seonjeong Maeng; Eunmi Choi; Minjoong Kim; Chin-Wook Chung; Ju-Young Yun
err分享
err收藏
Enhanced anisotropy in advanced semiconductor nanofabrication via ultralow electron temperature plasma for cryogenic etching通过超低电子温度等离子体实现低温刻蚀，在先进半导体纳米制造中增强各向异性
errMaterials Science in Semiconductor Processing
IF4.6
err2025-10-17
err0
PREAI
errMin-Seok Kim; Jong Ha Ahn; Deok Hwan Kim; Seok Hyeon Ha; Chin-Wook Chung
err分享
err收藏
Experimental observation of enhanced electron cyclotron resonance heating and nonlocal electron kinetics induced by Ramsauer-Townsend effect in ultralow electron temperature plasmas实验观测到由拉姆赛-汤森德效应引起的增强型电子回旋共振加热和非局域电子动力学现象，发生在超低电子温度等离子体中。
errPHYSICAL REVIEW E
IF2.4
err2025-10-14
err0
PREAI
errKim, Min-Seok; Lee, Jeong-Hyun; Choi, Jung-Eun; Chung, Chin-Wook
err分享
err收藏
Control of photoresist etch rate via a gradient magnetic field in biased inductively coupled plasma通过偏置感应耦合等离子体中的梯度磁场控制光刻胶刻蚀速率
errplasma sources science technology
IF0
err2025-07-23
err0
PREAI
errYi-Lang Jiang; Yeong Jae Jeong; Jae-Hwi Kim; Min-Seok Kim; Myoung-Jae Lee; Ju-Ho Kim; Chin-Wook Chung
err分享
err收藏
Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature Plasma利用超低电子温度等离子体对SiO2进行原子层刻蚀
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2025-05-05
err0
PREAI
errPark, J; Kim, N; Choi, JE; Yeo, Y; Kim, MS; Lim, CM; Seo, BJ; Chung, CW
err分享
err收藏
Charge-free plasma processing using ultra-low electron temperature plasma for atomic-scale semiconductor devices
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2025-04-01
err0
PREAI
errKim, Min-Seok; Kim, Na Yeon; Park, Junyoung; Chung, Chin-Wook
err分享
err收藏
Control of the photoresist etch uniformity in inductive discharge with magnetic resonance wireless power transfer
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2025-02-27
err0
PREAI
errPark, Junyoung; Hong, Young-Hun; Kang, Gil-Ho; Kim, Min-Seok; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook
err分享
err收藏
Control of axial direction electron temperature distribution by gradient DC magnetic field in inductively coupled plasma梯度直流磁场对感应耦合等离子体轴向电子温度分布的控制
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2025-02-26
err0
PREAI
errJiang, Yi-Lang; He, You; Seo, Beom-Jun; Lee, Myoung-Jae; Kim, Ju-Ho; Chung, Chin-Wook
err分享
err收藏
A method for measuring individual ion density in an Ar/He mixture inductively coupled plasma一种测量Ar/他混合物电感耦合等离子体中单个离子密度的方法
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2025-02-07
err0
PREAI
errSon, Jin-Ung; Lee, Moo-Hyun; Kim, Min-Seok; Jung, Jiwon; Seo, Beom-Jun; Kim, Ju-Ho; Chung, Chin-Wook
err分享
err收藏
Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films Using Ultralow Electron Temperature Plasma利用超低电子温度等离子体增强原子层沉积法制备TiN薄膜
errACS APPLIED MATERIALS & INTERFACES
IF0
err2025-02-07
err1
PREAI
errKim, MS; Lim, CM; Kim, SH; Kim, D; Jeon, H; Chung, CW
err分享
err收藏
Effect of controlling residual moisture in atmospheric plasma spray-Y2O3 coatings on random defect generation by halogen-based plasma
errJOURNAL OF THE EUROPEAN CERAMIC SOCIETY
IF6.2
err2025-02-01
err1
PREAI
errSo, Jongho; Choi, Eunmi; Kim, Minjoong; Lee, Dongjin; Seo, Jungpil; Maeng, Seonjeong; Chung, Chin-Wook; Yun, Ju-Young; Suh, Song-Moon
err分享
err收藏
Low-damage etching of poly-Si and SiO2 via a low-energy electron beam in inductively coupled CF4 plasma在感应耦合CF4等离子体中通过低能电子束对多晶硅和SiO2进行低损伤蚀刻
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-10-11
err0
PREAI
errJung, Jiwon; Kim, Jae-Hwi; Lim, Chang-Min; Choi, Jung-Eun; Bae, Junil; Kim, Hyung-Dong; Chung, Chin-Wook
err分享
err收藏
Damage-Free Plasma Source for Atomic-Scale Processing
errNANO LETTERS
IF9.1
err2024-09-06
err1
PREAI
errPark, Junyoung; Jung, Jiwon; Kim, Min-Seok; Lim, Chang-Min; Choi, Jung-Eun; Kim, Nayeon; Kim, Ju-Ho; Chung, Chin-Wook
err分享
err收藏

研究方向

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合作学者
合作期刊
H
Hyoun Woo Kim
H 指数: 70 · 论文数: 560
M
M. H. Lee
H 指数: 50 · 论文数: 453
V
Valery Godyak
H 指数: 47 · 论文数: 222
J
Jae-Min Myoung
H 指数: 46 · 论文数: 283
N
Nam Ho Kim
H 指数: 43 · 论文数: 362
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