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M

M. J. Kim

Purdue University
H指数:15
被引数:658
浏览量:0

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Reduced-order aging and safety analytics of Li-ion batteries

锂离子电池降阶老化与安全分析

Energy Storage Materials
IF20.2
2026-08-110
PRE
Saptaparna Patra; Arpan Kumar Sharma; Moonseong Kim; Bairav S. Vishnugopi; Deepti Tewari; Avijit Karmakar; Vinay Premnath; Wan Si Tang; Judith A. Jeevarajan; Partha P. Mukherjee
Synergistic integration of multimode applications in Gd2WO6:RE (RE = Eu3+ or Tb3+)

Gd₂WO₆:RE (RE = Eu³⁺或Tb³⁺)中多模式应用的非加和性集成

Ceramics International
IF5.6
2025-12-010
PRE
S.W. Wi; M.J. Kim; N.D. Ton; S.W. Kim; H.J. Kim; B.W. Lee; Y.S. Lee
Mechanistic Understanding of Fast Charging in Silicon-Graphite Composite Anodes

硅-石墨复合负极中快速充电的机制理解

Energy Storage Materials
IF20.2
2025-11-270
PRE
Moonseong Kim; Abhinand Ayyaswamy; Md Toukir Hasan; Bairav S. Vishnugopi; Sobana P. Rangarajan; Partha P. Mukherjee
Utilization of natural opal-CT-bearing mudstone as a precursor of zeolite-geopolymer composites: Synthesis and characterization

天然含opal-CT泥岩作为沸石-地聚合物复合材料前驱体的利用：合成与表征

Case Studies in Construction Materials
IF6.6
2025-10-240
OAAI
Minkyeong Kim; Sunhwa Bang; Yoon Ji; Hyo-Im Kim
Utilising Polyester and Steel Slag-Derived Metal/Carbon Composites as Catalysts in Biodiesel Production
INTERNATIONAL JOURNAL OF ENERGY RESEARCH
IF4.2
2024-11-050
OA
Lee, Sangyoon; Kim, Minyoung; Kim, Jee Young; Song, Hocheol; Nam, In-Hyun; Kwon, Eilhann E.
Mechanically Tunable Hollow Silica Ultrathin Nanoshells for Ultrasound Contrast Agents
ADVANCED FUNCTIONAL MATERIALS
IF19
2015-05-2155
OAAI
Liberman, A.; Wang, James; Lu, N.; Viveros, Robert D.; Allen, C. A.; Mattrey, R. F.; Blair, S. L.; Trogler, W. C.; Kim, M. J.; Kummel, A. C.
Synthesis of Isotopically-Labeled Graphite Films by Cold-Wall Chemical Vapor Deposition and Electronic Properties of Graphene Obtained from Such Films
NANO RESEARCH
IF9
2009-11-1158
OAAI
Cai, Weiwei; Piner, Richard D.; Zhu, Yanwu; Li, Xuesong; Tan, Zhenbing; Floresca, Herman Carlo; Yang, Changli; Lu, Li; Kim, M. J.; Ruoff, Rodney S.
Mobility and charge trapping comparison for crystalline and amorphous HfON and HfSiON gate dielectrics
APPLIED PHYSICS LETTERS
IF3.6
2006-12-1324
PREAI
Kirsch, P. D.; Quevedo-Lopez, M. A.; Krishnan, S. A.; Lee, B. H.; Pant, G.; Kim, M. J.; Wallace, R. M.; Gnade, B. E.
Thermal stability of lanthanum scandate dielectrics on Si(100)
APPLIED PHYSICS LETTERS
IF3.6
2006-12-1214
PREAI
Sivasubramani, P.; Lee, T. H.; Kim, M. J.; Kim, J.; Gnade, B. E.; Wallace, R. M.; Edge, L. F.; Schlom, D. G.; Stevie, F. A.; Garcia, R.; Zhu, Z.; Griffis, D. P.
Probing nanoscale local lattice strains in advanced Si complementary metal-oxide-semiconductor devices
APPLIED PHYSICS LETTERS
IF3.6
2006-08-0931
PREAI
Huang, J.; Kim, M. J.; Chidambaram, P. R.; Irwin, R. B.; Jones, P. J.; Weijtmans, J. W.; Koontz, E. M.; Wang, Y. G.; Tang, S.; Wise, R.
Thermal stability of amorphous LaScO3 films on silicon
APPLIED PHYSICS LETTERS
IF3.6
2006-08-0720
OAAI
Edge, L. F.; Schlom, D. G.; Rivillon, S.; Chabal, Y. J.; Agustin, M. P.; Stemmer, S.; Lee, T.; Kim, M. J.; Craft, H. S.; Maria, J. -P.; Hawley, M. E.; Hollaender, B.; Schubert, J.; Eisenbeiser, K.
Comparison of electrical and chemical characteristics of ultrathin HfON versus HfSiON dielectrics
APPLIED PHYSICS LETTERS
IF3.6
2006-07-1937
PREAI
Pant, G.; Gnade, A.; Kim, M. J.; Wallace, R. M.; Gnade, B. E.; Quevedo-Lopez, M. A.; Kirsch, P. D.; Krishnan, S.
Interaction of HfO2/SiO2/Si structures with deuterium gas - art. no. 041918
APPLIED PHYSICS LETTERS
IF3.6
2006-01-2711
PREAI
Driemeier, C; Miotti, L; Baumvol, IJR; Radtke, C; Gusev, EP; Kim, MJ; Wallace, RM
Effect of thickness on the crystallization of ultrathin HfSiON gate dielectrics
APPLIED PHYSICS LETTERS
IF3.6
2006-01-1752
PREAI
Pant, G; Gnade, A; Kim, MJ; Wallace, RM; Gnade, BE; Quevedo-Lopez, MA; Kirsch, PD

研究方向

暂未获取到该数据
R
Robert M. Wallace
H 指数:91论文数:622被引数:4.6万
B
Bruce E. Gnade
H 指数:41论文数:329被引数:9,748
P
P. D. Kirsch
H 指数:33论文数:205被引数:4,639
G
G. Pant
H 指数:14论文数:32被引数:510
S
Sitaraman Krishnan
H 指数:33论文数:146被引数:4,530
M
Manuel Quevedo-López
H 指数:41论文数:342被引数:7,019
B
Bairav S. Vishnugopi
H 指数:26论文数:177被引数:2,490
P
Partha P. Mukherjee
H 指数:63论文数:843被引数:1.2万
D
Darrell G. Schlom
H 指数:110论文数:1,257被引数:6.0万
L
L. F. Edge
H 指数:28论文数:138被引数:2,261