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C
Changhwan Shin
korea university
33
H指数
256
论文数
4.0K
被引数
0
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52
发表时间
发表时间
IF
被引数
Origin of Dark Current Robustness in Photomultiplication Organic Photodetectors Enabled by Ionic Conjugated Electron-Blocking Layers
通过离子共轭电子阻挡层实现的倍增有机光电探测器的暗电流鲁棒性起源
Advanced Materials
IF
26.8
2026-07-31
0
OA
AI
Yelim Kang; Min Hun Jee; Shuai Zhang; Sang Heon Lee; Jung Min Ha; Xingchao Zhao; Xiaoling Ma; Huiseong Shin; Changhwan Shin; Soonyong Lee; Fujun Zhang; Jae Won Shim; Han Young Woo
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Access-Induced Pass-Gate Bias Stress in Oxide-Semiconductor SRAM: Stress-Aware SPICE Analysis and SU-8 Passivation
氧化物半导体SRAM中的访问诱导传输门偏压应力:应力感知SPICE分析与SU-8钝化
IEEE Transactions on Electron Devices
IF
3.2
2026-07-28
0
PRE
AI
Changwoo Han; Hyeonjung Park; Yejoo Choi; Junseok Kim; Jaehyuk Lim; Myeongjae Choi; Huiseong Shin; Seungjoon Jeong; Changhwan Shin
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Impact of Metal-Gate-Induced Stress on Device- and Circuit-Level Performance of GAAFET CMOS Inverters
金属栅极诱导应力对GAAFET CMOS反相器器件级和电路级性能的影响
Electronics
IF
2.6
2026-07-10
0
OA
AI
Subin Lim; Jaehyuk Lim; Donghwan Han; Myongjin Kim; Changhwan Shin
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Reduced Leakage and Enhanced Endurance via an ITO Oxygen Reservoir Layer in HZO Ferroelectric Capacitors
通过ITO氧储备层降低泄漏并增强HZO铁电电容器的耐久性
IEEE Electron Device Letters
IF
4.5
2026-04-01
0
PRE
AI
Choi, Haevin; Park, Hyeonjung; Han, Changwoo; Choi, Myeongjae; Choi, Yejoo; Shin, Changhwan
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All-Oxide ITO/HZO/WOx Ferroelectric Tunnel Junctions with Oxygen-Engineered Interfaces for Highly Endurable Neuromorphic Computing
全氧化物ITO/HZO/WOx铁电隧穿结及其氧工程化界面,用于高耐久性神经形态计算
ACS Applied Materials & Interfaces
IF
0
2026-03-31
0
PRE
AI
Seungjoon Jeong; Huiseong Shin; Myeongjae Choi; Changwoo Han; Hyeonjung Park; Junseok Kim; Yejoo Choi; Changhwan Shin
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Asymmetric Polarization in FE/AFE Bilayer HZO Memcapacitors via Composition-Induced Built-in Bias
铁电/反铁电双层HZO忆容器的组分诱导内建偏压不对称极化
ACS Applied Materials & Interfaces
IF
0
2026-03-10
0
PRE
AI
Junseok Kim; Huiseong Shin; Hyeonjung Park; Changwoo Han; Myeongjae Choi; Changhwan Shin
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Correction to “Hf/Zr Superlattice-Based High-κ Gate Dielectrics with Dipole Layer Engineering for Advanced CMOS”
对“Hf/Zr超晶格基高-κ栅介质及其偶极层工程在先进CMOS中的应用”的更正
ACS Nano
IF
16
2026-02-16
0
OA
AI
Taeyoung Song; Sanghyun Kang; Yu-Hsin Kuo; Jiayi Chen; Lance Fernandes; Nashrah Afroze; Mengkun Tian; Hyoung Won Baac; Changhwan Shin; Asif Islam Khan
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Hybrid Convolutional Neural Network-Analytical Model for Prediction of Line Edge Roughness-Induced Performance Variations in Fin-Shaped Field-Effect Transistor Devices and SRAM
混合卷积神经网络-分析模型,用于预测鳍形场效应晶体管器件和SRAM中由线边缘粗糙度引起的性能变化
ADVANCED INTELLIGENT SYSTEMS
IF
6.1
2025-12-01
0
OA
AI
Lim, Jaehyuk; Kim, Myongjin; Han, Changwoo; Baac, Hyoung Won; Shin, Changhwan
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Wide-Range Threshold Voltage Control of Dual-Inner-Gate Gate-All-Around Field-Effect Transistor
双内栅全环绕栅场效应晶体管的大范围阈值电压控制
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY
IF
2.3
2025-12-01
0
PRE
AI
Jeong, Seungjoon; Shin, Changhwan
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First Demonstration of Hysteresis-Free IGZO/SnO-Based Complementary Circuits and SRAM with Long-Term Reliability Using SU-8 Passivation
首次演示无迟滞IGZO/SnO基互补电路和具有长期可靠性的SRAM,使用SU-8钝化层
Nano Convergence
IF
11
2025-10-31
0
OA
AI
Changwoo Han; Hyeonjung Park; Yejoo Choi; Myeongjae Choi; Jaehyuk Lim; Huiseong Shin; Seungjoon Moon; Changhwan Shin
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Comprehensive Understanding of Fatigue; Breakdown; and Recovery Mechanism by Thickness Scaling in Hf0.5Zr0.5O2/Ge MF(I)S Capacitors for Low Writing Voltages
通过厚度缩放对Hf0.5Zr0.5O2/Ge MF(I)S电容器在低写入电压下的疲劳、击穿及恢复机制的全面理解
ACS Applied Electronic Materials
IF
4.7
2025-07-18
0
PRE
AI
Jai-Youn Jeong; Kyeol Ko; Changhwan Shin; Jae-Hoon Han
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Learning hidden relationship between environment and control variables for direct control of automated greenhouse using Transformer-based model
利用基于Transformer的模型学习环境与控制变量之间的隐藏关系,以实现自动化温室的直接控制
COMPUTERS AND ELECTRONICS IN AGRICULTURE
IF
8.9
2025-06-04
0
OA
AI
Lee, Junseo; Im, Seongil; Jeong, Jae-Seung; Lee, Taek Sung; Park, Soo Hyun; Shin, Changhwan; Ju, Hyunsu; Kim, Hyung-Jun
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Investigation of the Switching Mechanism in the Bipolar and Complementary Resistive Switching of HfO x -Based Resistive Random-Access Memory through Rapid-Thermal-Annealing-Induced Grain Boundary Engineering
ACS APPLIED ELECTRONIC MATERIALS
IF
4.7
2025-04-01
0
PRE
AI
Kim, Gwon; Sung, Juho; Kang, Sanghyun; Lim, Jaehyuk; Shin, Changhwan
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Study of 3-D Line Edge Roughness (LER) in Vertical Channel Array Transistor for DRAM
垂直通道阵列晶体管中3-D线边缘粗糙度(LER)的研究
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
IF
2.9
2025-01-01
0
PRE
AI
Jaehyuk Lim; Seokchan Yoon; Juho Sung; Sanghyun Kang; Gwon Kim; Hyoung Won Baac; Changhwan Shin
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Device Design Guidelines to Boost Up AC Performance of CFET (Complementary Field-Effect-Transistor)-Based Inverter
基于CFET(互补场效应晶体管)反相器的AC性能提升设备设计指南
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
IF
2.9
2025-01-01
0
PRE
AI
Jaehyuk Lim; Donghwan Han; Juho Sung; Seokchan Yoon; Sanghyun Kang; Gwon Kim; Hyoung Won Baac; Changhwan Shin
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Oxygen reservoir effect of Tungsten trioxide electrode on endurance performance of ferroelectric capacitors for FeRAM applications
SCIENTIFIC REPORTS
IF
3.9
2024-11-21
1
OA
AI
Choi, Yejoo; Shin, Jaemin; Min, Jinhong; Moon, Seungjun; Chu, Daeyoung; Han, Donghwan; Shin, Changhwan
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Sub-Boltzmann Switching, Hysteresis-Free Charge Modulated Negative Differential Resistance FinFET
ACS NANO
IF
16
2024-09-16
0
PRE
AI
Sung, Juho; Kang, Sanghyun; Han, Donghwan; Kim, Gwon; Lim, Jaehyuk; Son, Myoungsu; Shin, Changhwan
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First integration of Ni barrier layer for enhanced threshold switching characteristics in Ag/HfO 2-based TS device
MATERIALS TODAY ADVANCES
IF
8
2024-06-01
0
OA
AI
Chu, Daeyoung; Kang, Sanghyun; Kim, Gwon; Sung, Juho; Lim, Jaehyuk; Choi, Yejoo; Han, Donghwan; Shin, Changhwan
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Comparative Study of Novel u-Shaped SOI FinFET Against Multiple-Fin Bulk/SOI FinFET
新型u形SOI FinFET与多鳍体/SOI FinFET的比较研究
IEEE ACCESS
IF
3.6
2023-01-01
6
OA
AI
Son, Myoungsu; Sung, Juho; Baac, Hyoung Won; Shin, Changhwan
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Improved remnant polarization of Zr-doped HfO2 ferroelectric film by CF4/O2 plasma passivation
SCIENTIFIC REPORTS
IF
3.9
2022-10-06
15
OA
AI
Choi, Yejoo; Park, Hyeonjung; Han, Changwoo; Min, Jinhong; Shin, Changhwan
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研究方向
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合作学者
合作期刊
J
Jae Wook Lee
H 指数: 93 · 论文数: 2.3K
H
Han Young Woo
H 指数: 86 · 论文数: 735
T
Tae‐il Kim
H 指数: 65 · 论文数: 300
B
Byoung Koun Min
H 指数: 63 · 论文数: 269
J
Jin‐Hong Park
H 指数: 63 · 论文数: 456
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