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T

Timo Hatanpää

university of helsinki

31H指数
132论文数
2.7K被引数
收录论文 52
发表时间
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Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin FilmsAgX (X = Cl，Br，I) 薄膜的原子层沉积
errACS OMEGA
IF4.3
err2025-11-01
err0
PREAI
errHeidari, Aida; Popov, Georgi; Hatanpaa, Timo; Weiss, Alexander; Chundak, Mykhailo; Mizohata, Kenichiro; Ritala, Mikko; Kemell, Marianna
err分享
err收藏
Pinacolborane as a Reducing Agent in the Atomic Layer Deposition of Copper and Bismuth三乙二醇硼烷作为铜和铋原子层沉积中的还原剂
errACS Omega
IF4.3
err2025-10-26
err0
errOAAI
errAnton Vihervaara; Timo Hatanpää; Kenichiro Mizohata; Mykhailo Chundak; Mikko Ritala
err分享
err收藏
Atomic layer deposition of nickel sulfide thin films and their thermal and electrochemical stability硫化镍薄膜的原子层沉积及其热稳定性和电化学稳定性
errJ. Mater. Chem. A
IF9.5
err2025-08-05
err0
errOAAI
errMiika Mattinen; Johanna Schröder ‡; Timo Hatanpää; Georgi Popov; Kenichiro Mizohata; Markku Leskelä; Thomas F. Jaramillo; Michaela Burke Stevens; Stacey F. Bent; Mikko Ritala
err分享
err收藏
Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct新型可循环氯化钯加合物对Pd和Pd2Ge的还原热ALD
errADVANCED MATERIALS INTERFACES
IF4.4
err2024-10-09
err1
errOAAI
errVihervaara, Anton; Hatanpaeae, Timo; Selaenne, Mikko-Ilmari; Mizohata, Kenichiro; Ritala, Mikko
err分享
err收藏
Atomic Layer Deposition of Molybdenum Carbide Thin Films碳化钼薄膜的原子层沉积
errADVANCED MATERIALS INTERFACES
IF4.4
err2024-07-01
err0
errOAAI
errKarkkainen, Paloma Ruiz; Popov, Georgi; Hatanpaa, Timo; Kemppinen, Antti; Kohopaa, Katja; Bagheri, Mohammad; Komsa, Hannu-Pekka; Heikkila, Mikko; Mizohata, Kenichiro; Chundak, Mykhailo; Deminskyi, Petro; Vihervaara, Anton; Ribeiro, Mario; Hatinen, Joel; Govenius, Joonas; Putkonen, Matti; Ritala, Mikko
err分享
err收藏
3D-printed sensor electric circuits using atomic layer deposition使用原子层沉积的3d印刷传感器电路
errSENSORS AND ACTUATORS A-PHYSICAL
IF4.9
err2024-05-01
err1
PREAI
errKestila, Antti; Vehkamaki, Marko; Nyman, Leo; Salmi, Mika; Lohilahti, Jarkko; Hatanpaa, Timo; Lafont, Ugo; Ritala, Mikko
err分享
err收藏
Electroblown titanium dioxide and titanium dioxide/silicon dioxide submicron fibers with and without titania nanorod layer for strontium (II) uptake具有和不具有二氧化钛纳米棒层的电吹二氧化钛和二氧化钛/二氧化硅亚微米纤维，用于吸收锶 (II)
errCHEMICAL ENGINEERING JOURNAL ADVANCES
IF7.1
err2023-03-01
err6
errOAAI
errPaajanen, Johanna; Pettila, Lauri; Lonnrot, Satu; Heikkila, Mikko; Hatanpa, Timo; Ritala, Mikko; Koivula, Risto
err分享
err收藏
Reductive Thermal Atomic Layer Deposition Process for Gold金的还原热原子层沉积工艺
erracs nanoscience au
IF6.5
err2023-01-11
err6
errOAAI
errVihervaara, Anton; Hatanpaa, Timo; Nieminen, Heta-Elisa; Mizohata, Kenichiro; Chundak, Mykhailo; Ritala, Mikko
err分享
err收藏
Atomic layer deposition of CoF2, NiF2 and HoF3 thin films
errDALTON TRANSACTIONS
IF3.3
err2023-01-01
err4
errOAAI
errAtosuo, Elisa; Maentymaeki, Miia; Pesonen, Leevi; Mizohata, Kenichiro; Hatanpaa, Timo; Leskelae, Markku; Ritala, Mikko
err分享
err收藏
Conversion of ALD CuO Thin Films into Transparent Conductive p-Type CuI Thin FilmsALD CuO薄膜转化为透明导电p型CuI薄膜
errADVANCED MATERIALS INTERFACES
IF4.4
err2022-12-04
err9
errOAAI
errWeiss, Alexander; Goldmann, Jacqueline; Kettunen, Sakari; Popov, Georgi; Iivonen, Tomi; Mattinen, Miika; Jalkanen, Pasi; Hatanpaa, Timo; Leskela, Markku; Ritala, Mikko; Kemell, Marianna
err分享
err收藏
Molecular Layer Deposition of Thermally Stable Polybenzimidazole-Like Thin Films and Nanostructures热稳定的聚苯并咪唑类薄膜和纳米结构的分子层沉积
errADVANCED MATERIALS INTERFACES
IF4.4
err2022-04-07
err2
errOAAI
errGhafourisaleh, Saba; Hatanpaa, Timo; Vihervaara, Anton; Mizohata, Kenichiro; Vehkamaki, Marko; Leskela, Markku; Putkonen, Matti; Ritala, Mikko
err分享
err收藏
Gut microbiota can utilize prebiotic birch glucuronoxylan in production of short-chain fatty acids in rats (vol 13, pg 3746, 2022)
errFOOD & FUNCTION
IF5.4
err2022-01-01
err1
errOAAI
errKynkaanniemi, Emma; Lahtinen, Maarit H.; Jian, Ching; Salonen, Anne; Hatanpaa, Timo; Mikkonen, Kirsi S.; Pajari, Anne-Maria
err分享
err收藏
A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(ii) and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine利用二氯双 (三乙基膦) 镍 (ii) 和1，4-双 (三甲基锗基)-1，4-二氢吡嗪进行镍的低温热ALD工艺
errDALTON TRANSACTIONS
IF3.3
err2022-01-01
err12
errOAAI
errVihervaara, Anton; Hatanpaa, Timo; Mizohata, Kenichiro; Chundak, Mykhailo; Popov, Georgi; Ritala, Mikko
err分享
err收藏
Gut microbiota can utilize prebiotic birch glucuronoxylan in production of short-chain fatty acids in rats
errFOOD & FUNCTION
IF5.4
err2022-01-01
err20
errOAAI
errKynkaanniemi, Emma; Lahtinen, Maarit H.; Jian, Ching; Salonen, Anne; Hatanpaa, Timo; Mikkonen, Kirsi S.; Pajari, Anne-Maria
err分享
err收藏
Highly Material Selective and Self-Aligned Photo-assisted Atomic Layer Deposition of Copper on Oxide Materials氧化物材料上铜的高材料选择性和自对准光辅助原子层沉积
errADVANCED MATERIALS INTERFACES
IF4.4
err2021-05-06
err6
errOAAI
errMiikkulainen, Ville; Vehkamaki, Marko; Mizohata, Kenichiro; Hatanpaa, Timo; Ritala, Mikko
err分享
err收藏
Highly conductive and stable Co9S8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth通过原子层沉积实现高导电和稳定的Co9S8薄膜: 从工艺开发和薄膜表征到选择性和外延生长
errDALTON TRANSACTIONS
IF3.3
err2021-01-01
err0
errOAAI
errMattinen, Miika; Hatanpaa, Timo; Mizohata, Kenichiro; Raisanen, Jyrki; Leskela, Markku; Ritala, Mikko
err分享
err收藏
Nickel Germanide Thin Films by Atomic Layer Deposition原子层沉积法锗化镍薄膜
errCHEMISTRY OF MATERIALS
IF7
err2019-06-27
err9
errOAAI
errVayrynen, Katja; Vihervaara, Anton; Hatanpaa, Timo; Mattinen, Miika; Heikkila, Mikko J.; Mizohata, Kenichiro; Raisanen, Jyrki; Ritala, Mikko; Leskela, Markku
err分享
err收藏
Atomic Layer Deposition of PbI2 Thin Films
errCHEMISTRY OF MATERIALS
IF7
err2019-01-16
err55
errOAAI
errPopov, Georgi; Mattinen, Miika; Hatanpaa, Timo; Vehkamaki, Marko; Kemell, Marianna; Mizohata, Kenichiro; Raisanen, Jyrki; Ritala, Mikko; Leskela, Markku
err分享
err收藏
Atomic layer deposition of cobalt(II) oxide thin films from Co(BTSA)2(THF) and H2O
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2019-01-02
err2
PREAI
errIivonen, Tomi; Kaipio, Mikko; Hatanpaa, Timo; Mizohata, Kenichiro; Meinander, Kristoffer; Raisanen, Jyrki; Kim, Jiyeon; Ritala, Mikko; Leskela, Markku
err分享
err收藏
Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Films
errADVANCED MATERIALS INTERFACES
IF4.4
err2018-10-16
err19
PREAI
errVayrynen, Katja; Hatanpaa, Timo; Mattinen, Miika; Mizohata, Kenichiro; Meinander, Kristoffer; Raisanen, Jyrki; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskela, Markku
err分享
err收藏

研究方向

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合作学者
合作期刊
T
Thomas F. Jaramillo
H 指数: 111 · 论文数: 582
K
Koen Binnemans
H 指数: 102 · 论文数: 1.1K
M
Markku Leskelä
H 指数: 89 · 论文数: 1.2K
M
Mikko Ritala
H 指数: 84 · 论文数: 740
S
Stacey F. Bent
H 指数: 81 · 论文数: 431
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