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Yayi Wei

chinese academy of sciences

16H指数
267论文数
1.2K被引数
收录论文 36
发表时间
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Study on the imaging of bright-field and dark-field for contact holes in extreme ultraviolet lithography considering stage vibration effects考虑台面振动效应的极紫外光刻中接触孔明场与暗场成像研究
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
IF1.2
err2026-05-01
err0
PREAI
errShen, Hao; Zhang, Libin; Wang, Jiashuo; Rui, Dinghai; Su, Yajuan; Wei, Yayi
err分享
err收藏
Molecular dynamics study of silicon nitride thin film growth on nanoscale structures by plasma enhanced chemical vapor deposition
errVACUUM
IF3.9
err2026-01-21
err0
PREAI
errYu, Jie; Shao, Hua; Li, Junjie; Feng, Zemeng; Xia, Longrui; Ge, Rui; Bai, Guobin; He, Xiaobin; Sun, Dianming; Li, Zhiqiang; Chen, Rui; Wei, Yayi
err分享
err收藏
Region selective imaging method based on super-resolution lithography基于超分辨光刻的区域选择性成像方法
errOptics & Laser Technology
IF0
err2025-12-10
err0
PREAI
errDinghai Rui; Libin Zhang; Yajuan Su; Yayi Wei
err分享
err收藏
Effective intra-field overlay compensation in lithography via mask-level thermal and mechanical control通过掩模级热与机械控制实现光刻中有效的场内叠层补偿
errNanotechnology
IF4.1
err2025-10-23
err0
PREAI
errDinghai Rui; Libin Zhang; Yayi Wei; Hao Shen; Zitao Wei; Jiangshan Bie; Yajuan Su
err分享
err收藏
Method of high-order advanced lithography overlay correction to enhance the manufacturing performance of integrated circuits高阶先进光刻套刻误差校正方法以提升集成电路制造性能
errNanoscale Adv.
IF4.6
err2025-09-22
err0
errOAAI
errDinghai Rui; Libin Zhang; Yayi Wei; Yajuan Su
err分享
err收藏
Extremely confined photons within a gap-mode plasmonic nanocavity for multifunctional applications: nanoimaging and refractive index sensing极端受限的间隙模等离激元纳米腔及其在多功能应用中的研究：纳米成像和折射率传感
erroptics and laser technology
IF0
err2025-09-20
err0
PREAI
errDandan Han; Sen Deng; Yihua Zhu; Wei Zhao; Yayi Wei
err分享
err收藏
A Post-Routing Layout Optimization Framework for Lithography Process Window Enlargement一种用于光刻工艺窗口扩大的后布线布局优化框架
errIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
IF2.9
err2025-08-07
err0
PREAI
errYajuan Su; Zixi Liu; Yibo Lin; Xiaojing Su; Yuqin Wang; Xin Hong; Yujie Jiang; Pengyu Ren; Yayi Wei
err分享
err收藏
Enhancing lithographic accuracy by mitigating overlay errors via mask-induced thermal and mechanical optimization通过掩模诱导的热和机械优化来缓解套刻误差，以提高光刻精度
errnanotechnology
IF2.8
err2025-04-24
err0
PREAI
errRui, Dinghai; Zhang, Libin; Wei, Yayi; Su, Yajuan
err分享
err收藏
Probability distribution-based method for aberration budgeting in EUV lithography
errOPTICS EXPRESS
IF3.3
err2024-11-21
err0
errOAAI
errWang, Jiashuo; Su, Xiaojing; Su, Yajuan; Wei, Yayi
err分享
err收藏
LIC-CGAN: fast lithography latent images calculation method for large-area masks using deep learning
errOPTICS EXPRESS
IF3.3
err2024-10-25
err1
errOAAI
errZhao, Yihan; Dong, Lisong; Li, Ziqi; Wei, Yayi
err分享
err收藏
Loading Effect during SiGe/Si Stack Selective Isotropic Etching for Gate-All-Around Transistors全包围栅晶体管SiGe/Si叠层选择性各向同性刻蚀中的负载效应
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2024-10-14
err1
PREAI
errShao, Hua; Reiter, Tobias; Chen, Rui; Li, Junjie; Hu, Ziyi; Wei, Yayi; Li, Ling; Filipovic, Lado
err分享
err收藏
A Two-Step Dry Etching Model for Non-Uniform Etching Profile in Gate-All-Around Field-Effect Transistor Manufacturing
errSMALL
IF12.1
err2024-10-11
err0
errOAAI
errHu, Ziyi; Li, Junjie; Chen, Rui; Shang, Dashan; Wei, Yayi; Wang, Zhongrui; Li, Ling; Filipovic, Lado
err分享
err收藏
Source and mask optimization for stability of reticle and wafer stages
errOPTICS EXPRESS
IF3.3
err2024-09-03
err0
errOAAI
errShen, Hao; Zhang, Libin; Rui, Dinghai; Liu, Ge; Su, Yajuan; Wei, Yayi; Fang, Ming
err分享
err收藏
Mask structure optimization for beyond EUV lithography
errOPTICS LETTERS
IF3.3
err2024-06-18
err1
PREAI
errLi, Ziqi; Dong, Lisong; Xu, Ma; Wei, Yayi
err分享
err收藏
Cluster sampling and scalable Bayesian optimization with constraints for negative tone development resist model calibration
errOPTICS EXPRESS
IF3.3
err2024-04-16
err0
errOAAI
errMa, Le; Ma, Xingyu; Hao, Shaogang; Dong, Lisong; Wei, Yayi; Tian, Zhengguo
err分享
err收藏
Machine Learning Applied to Electron Beam Lithography to Accelerate Process Optimization of a Contact Hole Layer
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2024-04-16
err0
PREAI
errZhao, Rongbo; Wang, Xiaolin; Wei, Yayi; He, Xiangming; Xu, Hong
err分享
err收藏
Dynamic budget analysis of multiple parameters in a lithography system based on the superposition of light intensity fluctuations
errOPTICS EXPRESS
IF3.3
err2024-01-30
err0
errOAAI
errWang, Jiashuo; Su, Xiaojing; Dong, Lisong; Fan, Taian; Wei, Yayi
err分享
err收藏
Fast source mask co-optimization method for high-NA EUV lithography高NA EUV光刻快速源掩模协同优化方法
errOPTO-ELECTRONIC ADVANCES
IF22.4
err2024-01-01
err0
errOAAI
errLi, Ziqi; Dong, Lisong; Ma, Xu; Wei, Yayi
err分享
err收藏
Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning
errNANOSCALE
IF5.1
err2024-01-01
err3
PREAI
errZhao, Rongbo; Wang, Xiaolin; Xu, Hong; Wei, Yayi; He, Xiangming
err分享
err收藏
Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithography
errOPTICS EXPRESS
IF3.3
err2023-10-12
err2
errOAAI
errDing, Huwen; Fan, Taian; Zhang, Libin; Wei, Yayi; Ye, Tianchun
err分享
err收藏

研究方向

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合作学者
合作期刊
何
何向明 (Xiangming He)
H 指数: 96 · 论文数: 820
Z
Zhenhua Wu
H 指数: 89 · 论文数: 1.9K
闫
闫江 (Yan Jiang)
H 指数: 70 · 论文数: 701
李俊杰 封面图
李俊杰 (Junjie Li)
H 指数: 69 · 论文数: 602
方明 封面图
方明 (Ming Fang)
H 指数: 62 · 论文数: 454
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