Jung-Hyung Kim

Korea Research Institute of Standards and Science

H指数:15

被引数:1,013

个人简介

暂无内容

教育背景

暂无内容

工作经历

暂无内容

荣誉奖项

暂无内容

Laboratory-scale dual-pulse laser-produced plasma extreme ultraviolet source with continuous target replenishment using a tin-coated rotating disk

实验室规模双脉冲激光产生等离子体极紫外光源，采用锡涂层旋转盘实现连续靶材补充

Vacuum

IF3.9

2026-09-120

PRE

Exploring MgO polycrystalline ceramics as plasma etching resistant materials for semiconductor manufacturing processes under CF4/Ar/O2 atmosphere

探索MgO多晶陶瓷作为CF4/Ar/O2气氛下半导体制造工艺中的等离子体刻蚀抗性材料

Journal of the Korean Ceramic Society

IF3.8

2026-05-040

PRE

Measurement of sheath width on the surface using flat-cutoff probe

使用平面截止探头测量表面鞘层宽度

Plasma Sources Science and Technology

IF3.3

2025-12-170

PRE

Control of silver nanoparticle size and shape in RF-biased inductively coupled plasma systems

在射频偏压感应耦合等离子体系统中对银纳米粒子尺寸和形状的控制

Surfaces and Interfaces

IF6.3

2025-10-290

PRE

Contamination on Extreme Ultraviolet Optics Induced by Xenon-Based Electrodeless Z-Pinch Plasma

基于氙气无电极Z箍缩等离子体对极紫外光学元件的污染

Advanced Engineering Materials

IF3.3

2025-08-280

PRE

Effect of SiH4 fragments and H radicals on nc-Si:H film deposition in an inductively coupled plasma PECVD

SURFACES AND INTERFACES

IF6.3

2025-03-010

OAAI

Evaluation of H2 Plasma-Induced Damage in Materials for EUV Lithography (vol 11, 2300867, 2024)

ADVANCED MATERIALS INTERFACES

IF4.4

2024-12-100

Analysis of uncertainty in measurement of electron temperature in low-pressure inductively coupled plasmas using microwave cutoff probe

微波截止探头测量低压电感耦合等离子体电子温度的不确定度分析

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2024-11-190

PRE

Development of a flat cutoff probe covered with a dielectric layer for non-invasive plasma diagnostics

开发覆盖有介电层的平面截止探针，用于非侵入性等离子体诊断

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2024-11-050

PRE

Plasma etching resistance and mechanical properties of polymorph Gd2O3-MgO nanocomposite with Zr phase stabilizer incorporation

掺入Zr相稳定剂的多晶型Gd2O3-MgO纳米复合材料的耐等离子体蚀刻性和力学性能

APPLIED SURFACE SCIENCE

IF6.9

2024-11-011

PRE

Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3-Y4Al2O9 composite under CF4/Ar/O2 mixed gas conditions

SCIENTIFIC REPORTS

IF3.9

2024-03-253

OAAI

Grain size effect on the plasma etching behavior of spark plasma sintered yttria-stabilized zirconia ceramics

CERAMICS INTERNATIONAL

IF5.6

2024-01-012

PRE

Evaluation of H2 Plasma-Induced Damage in Materials for EUV Lithography

EUV光刻材料中H2等离子体引起的损伤评估

ADVANCED MATERIALS INTERFACES

IF4.4

2023-12-143

Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres

不同CF4/Ar/O2等离子体气氛下Y2O3-MgO纳米复合材料的理化腐蚀特性及表面分析

APPLIED SURFACE SCIENCE

IF6.9

2023-12-019

PRE

Experimental validation of particle-in-cell/Monte Carlo collisions simulations in low-pressure neon capacitively coupled plasmas

低压氖电容耦合等离子体中单元内粒子/蒙特卡罗碰撞模拟的实验验证

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2023-11-023

Plasma low-energy ion flux induced vertical graphene synthesis

等离子体低能离子流诱导垂直石墨烯合成

APPLIED SURFACE SCIENCE

IF6.9

2023-11-015

OAAI

Influence of plasma parameters on low-k SiCOH film grown by plasma-enhanced chemical vapor deposition using dimethyldimethoxysilane

等离子体参数对使用二甲基二甲氧基硅烷通过等离子体增强化学气相沉积生长的低k SiCOH膜的影响

VACUUM

IF3.9

2023-11-011

OAAI

Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching

氧在非晶碳硬掩模等离子体刻蚀中的作用

ACS OMEGA

IF4.3

2023-08-312

OAAI

Real-time monitoring of the plasma density distribution in low-pressure plasmas using a flat-cutoff array sensor

使用平面截止阵列传感器实时监测低压等离子体中的等离子体密度分布

APPLIED PHYSICS LETTERS

IF3.6

2023-03-169

Effect of electron energy distributions on the electron density in nitrogen inductively coupled plasmas

氮电感耦合等离子体中电子能量分布对电子密度的影响

PLASMA SOURCES SCIENCE & TECHNOLOGY

IF3.3

2022-10-136

PRE

Jung-Hyung Kim

个人简介

教育背景

工作经历

荣誉奖项

研究方向