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J

J. Franco

IMEC

38H-index
341Paper Count
5.7KCitation Count
Published Papers 10
Publication Date
Band Tail State Broadening in IGZO TFTs After pBTI-Induced Negative VT Shift Revealed via DC and 1/f Noise Measurements
err2026-03-19
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PREAI
errR. Asanovski; P. Rinaudo; A. Chasin; Y. Zhao; H. F. W. Dekkers; M. J. van Setten; D. Matsubayashi; N. Rassoul; A. Belmonte; G. S. Kar; B. Kaczer; J. Franco
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Low-frequency noise characteristics of waveguide-integrated lateral and vertical Ge-on-Si p-i-n photodiodes
err2025-10-21
err0
PREAI
errMusibau, Solomon; Arnold, Kellen P.; Veluri, Anurag R.; Franco, Jacopo; Tsiara, Artemisia; Croes, Kristof; Van Campenhout, Joris; Schrimpf, Ronald D.; Reed, Robert A.; De Wolf, Ingrid; Fleetwood, Daniel M.
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Unified Analysis of Time-Dependent Dielectric Breakdown to Extend Reliability Margins
err2025-10-06
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PREAI
errA. Vici; L. Pantisano; P. J. Roussel; A. Chasin; J. Franco; B. Kaczer; I. Meric; S. M. Ramey; R. Degraeve; J. Hicks
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Markov model describing progressive degradation of local percolation path in thin oxides
err2025-10-01
err1
PREAI
errSacchi, Sara; Varanasi, Anirudh; Degraeve, Robin; Vici, Andrea; Molinaro, Giorgio; Franco, Jacopo; Roussel, Philippe; Kaczer, Ben; Merckling, Clement
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A Pragmatic Model to Predict Future Device Aging
err2023-01-01
err0
errOAAI
errBrown, James; Tok, Kean Hong; Gao, Rui; Ji, Zhigang; Zhang, Weidong; Marsland, John S.; Chiarella, Thomas; Franco, Jacopo; Kaczer, Ben; Linten, Dimitri; Zhang, Jian Fu
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Systematic study of interfacial reactions induced by metal electrodes in high-k/InGaAs gate stacks
err2016-10-24
err10
PREAI
errYoshida, S.; Lin, D.; Vais, A.; Alian, A.; Franco, J.; El Kazzi, S.; Mols, Y.; Miyanami, Y.; Nakazawa, M.; Collaert, N.; Watanabe, H.; Thean, A.
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Correlation of interface states/border traps and threshold voltage shift on AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors
err2015-09-02
err54
errOAAI
errWu, Tian-Li; Marcon, Denis; Bakeroot, Benoit; De Jaeger, Brice; Lin, H. C.; Franco, Jacopo; Stoffels, Steve; Van Hove, Marleen; Roelofs, Robin; Groeseneken, Guido; Decoutere, Stefaan
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Depth localization of positive charge trapped in silicon oxynitride field effect transistors after positive and negative gate bias temperature stress
err2011-05-05
err18
PREAI
errToledano-Luque, M.; Kaczer, B.; Roussel, Ph J.; Franco, J.; Ragnarsson, L. A.; Grasser, T.; Groeseneken, G.
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