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Qimeng Jiang

qilu university of technology
H指数:27
被引数:3,126

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Improved Interface Quality and Stability of AlGaN/GaN Metal–Insulator–Semiconductor High-Electron-Mobility Transistors Using N2-Annealed Atomic-Layer-Deposited SiNx Gate Dielectrics

采用N2退火原子层沉积SiNx栅介质提高AlGaN/GaN金属-绝缘体-半导体高电子迁移率晶体管的界面质量和稳定性

2026-02-100
PRE
Insight into the suppression mechanism of bulk traps in Al2O3 gate dielectric and its effect on threshold voltage instability in Al2O3/AlGaN/GaN metal-oxide-semiconductor high electron mobility transistors

Al2O3栅介质体陷阱的抑制机理及其对Al2O3/AlGaN/GaN金属氧化物半导体高电子迁移率晶体管阈值电压不稳定性的影响

2023-11-0112
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Effective Suppression of Amorphous Ga2O and Related Deep Levels on the GaN Surface by High-Temperature Remote Plasma Pretreatments in GaN-Based Metal-Insulator-Semiconductor Electronic Devices

在GaN基金属-绝缘体-半导体电子器件中通过高温远程等离子体预处理有效抑制GaN表面上的非晶Ga2O和相关深能级

2023-05-1014
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Effective suppression of deep interface states and dielectric trapping in SiNx/GaN metal-insulator-semiconductor structures by a SiOxNy interfacial layer grown by plasma-enhanced atomic layer deposition

通过等离子体增强原子层沉积生长的SiOxNy界面层有效抑制SiNx/GaN金属-绝缘体-半导体结构中的深界面态和介电俘获

2023-01-019
PRE