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J

Junyoung Park

hanyang university

4H指数
9论文数
43被引数
收录论文 5
发表时间
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Realizing Vertical Etch Profiles in Fluorine-Rich Ar/CF4 Plasma在富氟Ar/CF4等离子体中实现垂直刻蚀形貌
errAdvanced Materials Interfaces
IF4.4
err2025-12-08
err0
errOAAI
errJunyoung Park; Nayeon Kim; Jung-Eun Choi; Yujin Yeo; Min-Seok Kim; Beom-Jun Seo; Chin-Wook Chung
err分享
err收藏
Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature Plasma利用超低电子温度等离子体对SiO2进行原子层刻蚀
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2025-05-05
err0
PREAI
errPark, J; Kim, N; Choi, JE; Yeo, Y; Kim, MS; Lim, CM; Seo, BJ; Chung, CW
err分享
err收藏
Charge-free plasma processing using ultra-low electron temperature plasma for atomic-scale semiconductor devices
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2025-04-01
err0
PREAI
errKim, Min-Seok; Kim, Na Yeon; Park, Junyoung; Chung, Chin-Wook
err分享
err收藏
Damage-Free Plasma Source for Atomic-Scale Processing
errNANO LETTERS
IF9.1
err2024-09-06
err1
PREAI
errPark, Junyoung; Jung, Jiwon; Kim, Min-Seok; Lim, Chang-Min; Choi, Jung-Eun; Kim, Nayeon; Kim, Ju-Ho; Chung, Chin-Wook
err分享
err收藏
Abnormal behavior of the plasma potential in an inductively coupled plasma with a DC-biased grid具有直流偏置栅极的感应耦合等离子体中等离子体电位的异常行为
errPLASMA SOURCES SCIENCE & TECHNOLOGY
IF3.3
err2024-08-27
err2
PREAI
errKim, Min-Seok; Jung, Jiwon; Park, Junyoung; Chung, Chin-Wook
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
C
Chin‐Wook Chung
H 指数: 28 · 论文数: 382
N
Nayeon Kim
H 指数: 19 · 论文数: 114
Y
Y. K. Yeo
H 指数: 19 · 论文数: 152
N
Na Yeon Kim
H 指数: 17 · 论文数: 87
J
Ju-Ho Kim
H 指数: 14 · 论文数: 114
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