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Marko Vehkamäki

University of Helsinki

29H指数
105论文数
2.2K被引数
收录论文 37
发表时间
Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High-k Rutile Capacitors金属二氧化钼薄膜的原子层沉积技术实现高介电常数金红石电容器
err2026-04-01
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errGanzhinov, Alexey; Mattinen, Miika; Vehkamaki, Marko; Mizohata, Kenichiro; Chundak, Mykhailo; Popov, Georgi; Porri, Paavo; Ritala, Mikko; Putkonen, Matti
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Hollow-core wood hemicellulose-based microcapsules entrap probiotics within protective walls
err2026-02-19
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errThao M. Ho; Marko Vehkamäki; Lisbeth G. Thygesen; Heikki Suhonen; Per E.J. Saris; Kirsi S. Mikkonen
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Atomic layer etching of molybdenum with O2 and NbCl5使用O2和NbCl5对钼进行的原子层刻蚀
err2025-12-01
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PREAI
errOjala, Juha; Chundak, Mykhailo; Vihervaara, Anton; Vehkamaki, Marko; Ritala, Mikko
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Selective gas phase pulsed etching of oxides with NbCl5用NbCl5对氧化物进行选择性气相脉冲蚀刻
err2025-01-01
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errOjala, Juha; Vehkamaeki, Marko; Chundak, Mykhailo; Vihervaara, Anton; Mizohata, Kenichiro; Ritala, Mikko
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3D-printed sensor electric circuits using atomic layer deposition使用原子层沉积的3d印刷传感器电路
err2024-05-01
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PREAI
errKestila, Antti; Vehkamaki, Marko; Nyman, Leo; Salmi, Mika; Lohilahti, Jarkko; Hatanpaa, Timo; Lafont, Ugo; Ritala, Mikko
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Atomic Layer Deposition of Boron-Doped Al2O3 Dielectric Films硼掺杂Al2O3介电薄膜的原子层沉积
err2023-05-28
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errLi, Xinzhi; Vehkamaki, Marko; Chundak, Mykhailo; Mizohata, Kenichiro; Vihervaara, Anton; Leskela, Markku; Putkonen, Matti; Ritala, Mikko
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Molecular Layer Deposition of Pyrrone Thin Films by Oxidative Polymerization氧化聚合法制备吡喃酮薄膜的分子层沉积
err2023-01-22
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errGhafourisaleh, Saba; Vehkamaki, Marko; Vihervaara, Anton; Zhang, Chao; Heikkila, Mikko J.; Leskela, Markku; Putkonen, Matti; Ritala, Mikko
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Inherent area-selective atomic layer deposition of ZnSZnS的固有面积选择性原子层沉积
err2023-01-01
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errZhang, Chao; Vehkamaki, Marko; Leskela, Markku; Ritala, Mikko
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Atomic Layer Deposition of CsI and CsPbI3CsI和CsPbI3的原子层沉积
err2022-06-27
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errWeiss, Alexander; Popov, Georgi; Atosuo, Elisa; Vihervaara, Anton; Jalkanen, Pasi; Vehkamaki, Marko; Leskela, Markku; Ritala, Mikko; Kemell, Marianna
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Molecular Layer Deposition of Thermally Stable Polybenzimidazole-Like Thin Films and Nanostructures热稳定的聚苯并咪唑类薄膜和纳米结构的分子层沉积
err2022-04-07
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errGhafourisaleh, Saba; Hatanpaa, Timo; Vihervaara, Anton; Mizohata, Kenichiro; Vehkamaki, Marko; Leskela, Markku; Putkonen, Matti; Ritala, Mikko
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Atomic Layer Deposition of PbS Thin Films at Low Temperatures低温下PbS薄膜的原子层沉积
err2020-09-16
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errPopov, Georgi; Bacic, Goran; Mattinen, Miika; Manner, Toni; Lindstrom, Hannu; Seppanen, Heli; Suihkonen, Sami; Vehkamaki, Marko; Kemell, Marianna; Jalkanen, Pasi; Mizohata, Kenichiro; Raisanen, Jyrki; Leskela, Markku; Koivula, Hanna Maarit; Barry, Sean T.; Ritala, Mikko
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Hydrogen release from liquid organic hydrogen carriers catalysed by platinum on rutile-anatase structured titania
err2020-01-01
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errAakko-Saksa, P. T.; Vehkamaki, M.; Kemell, M.; Keskivali, L.; Simell, P.; Reinikainen, M.; Tapper, U.; Repo, T.
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Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics用于光电子的新兴2D半导体HfS2和ZrS2的原子层沉积
err2019-08-02
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errMattinen, Miika; Popov, Georgi; Vehkamaki, Marko; King, Peter J.; Mizohata, Kenichiro; Jalkanen, Pasi; Raisanen, Jyrki; Leskela, Markku; Ritala, Mikko
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Studies on solid state reactions of atomic layer deposited thin films of lithium carbonate with hafnia and zirconia
err2019-02-28
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PREAI
errMantymaki, Miia; Atosuo, Elisa; Heikkila, Mikko J.; Vehkamaki, Marko; Mattinen, Miika; Mizohata, Kenichiro; Raisanen, Jyrki; Ritala, Mikko; Leskela, Markku
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